Patents by Inventor Walter Dale Gillespie
Walter Dale Gillespie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11949202Abstract: A gas recycle system includes a gas purifier system; a gas analysis system; a gas blending system that prepares a recycled gas mixture; and a control system configured to: determine whether a measured amount of at least one intended gas component is within a first range of acceptable values; and determine whether a measured amount of the at least one impurity gas component is within a second range of acceptable values. If the measured amount of the at least one intended gas component is not within the first range of acceptable values, the control system causes the gas blending system to add an additional gas component to the purified gas mixture to prepare the recycled gas mixture; and if the measured amount of the at least one impurity gas is not within the second range of acceptable values, the control system generates an error signal.Type: GrantFiled: February 15, 2018Date of Patent: April 2, 2024Assignee: Cymer, LLCInventors: Yzzer Roman Gutierrez, Walter Dale Gillespie, Edward Siqi Luo, Dinesh Adinath Kanawade
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Patent number: 11949203Abstract: A gas chamber supply system includes a gas source configured to fluidly connect to a gas chamber and to supply a gas mixture to the gas chamber, the gas source including: a pre-prepared gas supply including a gas mixture, the gas mixture including a plurality of gas components and lacking a halogen; a recycled gas supply including the gas mixture; and a fluid flow switch connected to the pre-prepared gas supply and to the recycled gas supply. The gas chamber supply also includes a control system configured to: determine if the relative concentration between the gas components within the recycled gas supply is within an acceptable range; and provide a signal to the fluid flow switch to thereby select one of the pre-prepared gas supply and the recycled gas supply to as the gas source based on the determination.Type: GrantFiled: January 10, 2019Date of Patent: April 2, 2024Assignee: Cymer, LLCInventors: Yzzer Roman Gutierrez, Walter Dale Gillespie, Edward Siqi Luo, Dinesh Adinath Kanawade
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Patent number: 11777271Abstract: Disclosed are methods of and apparatus for extending a useful lifetime of a laser discharge chamber in which a polarity of an electrode positioned at a fixed position within the chamber is caused to be positive with respect to the polarity of a second electrode defining a discharge gap with the first electrode and the first electrode is made of a material that forms an erosion resistant surface when the first electrode is used and an anode. Also disclosed is an arrangement in which a first electrode is positionable with respect a second electrode defining a discharge gap with the second electrode and the position of the first electrode controlled to maintain the width of the gap within a predetermined range.Type: GrantFiled: October 9, 2018Date of Patent: October 3, 2023Assignee: Cymer, LLCInventors: Thomas Patrick Duffey, Paul Christopher Melcher, Walter Dale Gillespie
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Patent number: 11614012Abstract: A system for removing particulate matter from the gas in a gas discharge laser includes one or more nonwoven screens which are optimized for, among others, manufacturability and feature integration. The nonwoven screens are configured for precisely directing the flow to optimize the separation of particles from the gas flow and provide sufficient surface area for improved dust adherence.Type: GrantFiled: November 21, 2018Date of Patent: March 28, 2023Assignee: Cymer, LLCInventors: Ulrich Niemann, Walter Dale Gillespie
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Publication number: 20230017337Abstract: Systems, apparatuses, methods, and computer program products are provided for controlling a laser source that includes two laser discharge chambers. An example laser control system can include a first pulsed powertrain including a first independent circuit configured to generate a first resonant charging supply (RCS) output voltage. The first RCS output voltage can be configured to drive a first laser discharge chamber. The example laser control system can further include a second pulsed powertrain including a second independent circuit configured to generate a second RCS output voltage independent from the first RCS output voltage. The second RCS output voltage can be configured to drive a second laser discharge chamber independent from the first laser discharge chamber.Type: ApplicationFiled: December 11, 2020Publication date: January 19, 2023Inventors: Paul Christopher Melcher, Thomas Patrick Duffey, Walter Dale Gillespie
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Publication number: 20230008480Abstract: A light source apparatus (200) includes a gas discharge stage (210) and a metal fluoride trap (300). The gas discharge stage includes an optical amplifier (206) and a set of optical elements (250, 260). The optical amplifier includes a chamber (211) configured to hold a gas discharge medium (213), the gas discharge medium outputting a light beam. The set of optical elements is configured to form an optical resonator around the optical amplifier. The metal fluoride trap is configured to trap metal fluoride dust generated from the gas discharge stage. The metal fluoride trap includes an electrostatic precipitator (320) and a packed-bed filter (400, 402, 404) disposed around the electrostatic precipitator. The packed-bed filter includes a plurality of beads configured (406, 408) to absorb metal fluoride dust (208).Type: ApplicationFiled: December 10, 2020Publication date: January 12, 2023Inventors: Ulrich Niemann, Walter Dale Gillespie
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Publication number: 20220255288Abstract: Apparatus for and method of generating multiple laser beams using multiple laser chambers. The relative timing of the beams is controllable so they may, for example, be interleaved, may overlap, or be prevented from overlapping, or may occur in rapid sequence. The beams may have different spectral and power characteristics such as different wavelengths. Also disclosed is a system in which at least one of the multiple laser chambers is configured to generate radiation of two different wavelengths.Type: ApplicationFiled: May 15, 2020Publication date: August 11, 2022Inventors: Walter Dale Gillespie, Joshua Jon Thornes, Thomas Patrick Duffey, Eric Anders Mason, Rabin Paudel
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Publication number: 20220255286Abstract: A deep ultraviolet (DUV) optical system includes: an optical source system including: a plurality of optical oscillators; a beam combiner; and a beam control apparatus between the optical oscillators and the beam combiner. The beam combiner is configured to receive and direct light emitted from any of the optical oscillators toward a scanner apparatus as an exposure light beam, and the beam control apparatus is configured to determine whether the beam combiner receives light from a particular one of the optical oscillators. The DUV optical lithography system also includes a control system coupled to the optical source system, the control system configured to: determine whether a condition exists in the DUV optical system, and based on a determination that the condition exists, perform a calibration action in a subset of the optical oscillators.Type: ApplicationFiled: May 15, 2020Publication date: August 11, 2022Inventors: Yingbo Zhao, Walter Dale Gillespie, Joshua Jon Thornes, Thomas Patrick Duffey, Eric Anders Mason
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Publication number: 20210194202Abstract: A light source apparatus includes a gas discharge stage including a three-dimensional body defining a cavity that is configured to interact with an energy source, the body including at least two ports that are transmissive to a light beam having a wavelength in the ultraviolet range; a sensor system comprising a plurality of sensors, each sensor is configured to measure a physical aspect of a respective distinct region of the body of the gas discharge stage relative to that sensor; and a control apparatus in communication with the sensor system. The control apparatus is configured to analyze the measured physical aspects from the sensors to thereby determine a position of the body of the gas discharge stage in an XYZ coordinate system defined by an X axis, wherein the X axis is defined by the geometry of the gas discharge stage.Type: ApplicationFiled: August 15, 2019Publication date: June 24, 2021Inventors: Andrei Dorobantu, Jacob Arthur Cohen, Kumar Raja Guvindan Raju, Walter Dale Gillespie, Eric Shaun Gross, Richard Carl Ujazdowski
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Publication number: 20210111529Abstract: Disclosed are methods of and apparatus for extending a useful lifetime of a laser discharge chamber in which a polarity of an electrode positioned at a fixed position within the chamber is caused to be positive with respect to the polarity of a second electrode defining a discharge gap with the first electrode and the first electrode is made of a material that forms an erosion resistant surface when the first electrode is used and an anode. Also disclosed is an arrangement in which a first electrode is positionable with respect a second electrode defining a discharge gap with the second electrode and the position of the first electrode controlled to maintain the width of the gap within a predetermined range.Type: ApplicationFiled: October 9, 2018Publication date: April 15, 2021Inventors: Thomas Patrick Duffey, Paul Christopher Melcher, Walter Dale Gillespie
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Publication number: 20200358241Abstract: A gas chamber supply system includes a gas source configured to fluidly connect to a gas chamber and to supply a gas mixture to the gas chamber, the gas source including: a pre-prepared gas supply including a gas mixture, the gas mixture including a plurality of gas components and lacking a halogen; a recycled gas supply including the gas mixture; and a fluid flow switch connected to the pre-prepared gas supply and to the recycled gas supply. The gas chamber supply also includes a control system configured to: determine if the relative concentration between the gas components within the recycled gas supply is within an acceptable range; and provide a signal to the fluid flow switch to thereby select one of the pre-prepared gas supply and the recycled gas supply to as the gas source based on the determination.Type: ApplicationFiled: January 10, 2019Publication date: November 12, 2020Inventors: Yzzer Roman Gutierrez, Walter Dale Gillespie, Edward Siqi Luo, Dinesh Adinath Kanawade
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Publication number: 20200358240Abstract: A gas recycle system includes a gas purifier system; a gas analysis system; a gas blending system that prepares a recycled gas mixture; and a control system configured to: determine whether a measured amount of at least one intended gas component is within a first range of acceptable values; and determine whether a measured amount of the at least one impurity gas component is within a second range of acceptable values. If the measured amount of the at least one intended gas component is not within the first range of acceptable values, the control system causes the gas blending system to add an additional gas component to the purified gas mixture to prepare the recycled gas mixture; and if the measured amount of the at least one impurity gas is not within the second range of acceptable values, the control system generates an error signal.Type: ApplicationFiled: February 15, 2018Publication date: November 12, 2020Inventors: Yzzer Roman Gutierrez, Walter Dale Gillespie, Edward Siqi Luo, Dinesh Adinath Kanawade
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Publication number: 20200332689Abstract: A system for removing particulate matter from the gas in a gas discharge laser includes one or more nonwoven screens which are optimized for, among others, manufacturability and feature integration. The nonwoven screens are configured for precisely directing the flow to optimize the separation of particles from the gas flow and provide sufficient surface area for improved dust adherence.Type: ApplicationFiled: November 21, 2018Publication date: October 22, 2020Inventors: Ulrich Niemann, Walter Dale Gillespie
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Patent number: 10074953Abstract: Anodes and cathodes for use in generating gas discharge laser light are disclosed. The improved anode has a transition portion that includes a substantially vertical sidewall to transition between the active portion and the end portion to reduce erosion-related issues. The improved cathode has thickened spine portions in enhanced erosion locations. The spine portions are thickened by removing material from the shoulder of the cathode stepped cross-section profile in those locations in order to improve the longevity of the cathode.Type: GrantFiled: September 30, 2015Date of Patent: September 11, 2018Assignee: Cymer, LLCInventors: Siqi Luo, Richard Carl Ujazdowski, Walter Dale Gillespie, Thomas Patrick Duffey
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Publication number: 20170093112Abstract: Anodes and cathodes for use in generating gas discharge laser light are disclosed. The improved anode has a transition portion that includes a substantially vertical sidewall to transition between the active portion and the end portion to reduce erosion-related issues. The improved cathode has thickened spine portions in enhanced erosion locations. The spine portions are thickened by removing material from the shoulder of the cathode stepped cross-section profile in those locations in order to improve the longevity of the cathode.Type: ApplicationFiled: September 30, 2015Publication date: March 30, 2017Inventors: Siqi Luo, Richard Carl Ujazdowski, Walter Dale Gillespie, Thomas Patrick Duffey