Patents by Inventor Walter E. Mlyriko

Walter E. Mlyriko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method to reduce plasma etch fluting
    Patent number: 6303416
    Abstract: The present invention is directed to a method and process to reduce plasma etch fluting during etching of a pattern on a semiconductor substrate by modifying the resist profile. The present invention forms a resist structure profile having an overhang or undercut, which is not in contact with the surface of the substrate. The overhang results in a shadowed region on the substrate from the primary etch direction adjacent to the base of the resist structure. Since the overhang is not in direct contact with the substrate surface, the resist pattern does not transfer into the surface of the substrate during etching and fluting is reduced or eliminated.
    Type: Grant
    Filed: October 7, 1999
    Date of Patent: October 16, 2001
    Assignee: International Business Machines Corporation
    Inventors: James A. Bruce, Mary C. Bushey, Premlatha J. Jagannathan, Walter E. Mlyriko, Dianne L. Sundling