Patents by Inventor Walter Hub

Walter Hub has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Production of ready-to-use solutions
    Patent number: 6271188
    Abstract: The process for the direct preparation of cleaning solutions for semiconductor manufacture comprises producing the cleaning solutions directly at the site of use by mixing a gas with high-purity water, with a static mixer system being used. At least one of the gases NH3, HCl, ozone or HF is added.
    Type: Grant
    Filed: August 10, 1999
    Date of Patent: August 7, 2001
    Assignees: Messer Griesheim GmbH, Infineon Technologies Aktiengesellschaft
    Inventors: Manfred Eschwey, Gerd Mainka, Walter Hub
  • Aqueous solution for cleaning a semiconductor substrate
    Patent number: 6066609
    Abstract: Aqueous solutions for cleaning semiconductor substrates are formed primarily of a base, hydrogen peroxide and a complexing agent. The complexing agent is a heterocyclic hydrocarbon having a ring size of at least 9 and at most 18 atoms and at least 3 heteroatoms, for example nitrogen, oxygen or sulfur. In the case of nitrogen-containing cryptands, these may additionally be formed with functional reactive groups and/or aliphatic bridges between the nitrogen atoms (cage structures).
    Type: Grant
    Filed: February 2, 1999
    Date of Patent: May 23, 2000
    Assignee: Siemens Aktiengesellschaft
    Inventors: Andreas Martin, Walter Hub, Bernd Kolbesen