Abstract: A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

Abstract: A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

Abstract: A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

Abstract: Fastening device (1) for an armature lamella stack (2) of a DC motor, characterized in that the fastening device (1) is disposed between the armature lamella stack (2) and a shaft (3) of the DC motor and is designed as a torsionally soft connection of said armature lamella stack (2) to the shaft (3).

Abstract: A method for producing one or more coating on a displaccable substrate in a vacuum chamber with the aid of a residual gas, by means of a sputtering device said coating being formed from at least two constituents, whereby a sputtering material of the sputtering device constitutes at least one first constituent and a reactive component of the residual gas constitutes a second constituent.

Abstract: The electric motor, especially a permanently excited direct current motor, has a housing (16) carrying a magnetic pole (15) and a grounding ring (17) made from magnetically conductive material and mounted on the housing. In order to reduce the noise generation of the motor the grounding ring (17) is a knit article made from a thread-form or wire-form magnetically conductive material.

Abstract: Test-glass changer for measuring layer properties optically in vacuum coating installations. A holding device (10) that accommodates several test glasses (12) is rotatably supported on a substrate holder (4), which serves to transport substrates (5) through a stream (22) of coating material. A control mechanism (16) serves to introduce in each case one test glass (12) into a path of rays (A-A) of a measuring device (7,8) and into the stream (22) of coating material. The control mechanism (16) is an incremental motor, by means of which in each case one test glass (12) can be changed over into a position, stationary relative to the substrate holder (4), in which position it can be passed alternately with the substrates (5) through the path of rays (A-A) of the measuring device (8,8) and through the stream (22) of coating material.