Abstract: The present disclosure relates to a device for holding workpieces in a process chamber. The present disclosure additionally relates to a coating system and to a method for coating a workpiece. In order to allow for precise adjustment of the height of the position of workpieces while supporting same in a secure and stable manner, the holding device includes a platform for the workpieces, a height-adjustable first support element and a height-adjustable second support element for the platform, wherein each of the support elements has at least one first and one second limb element, wherein the respective first and the respective second limb element are coupled so as to be pivotable relative to one another about a pivot axis, and wherein the pivot axis of the first support element is arranged at an angle to the pivot axis of the second support element.

Abstract: A control device includes a housing having a base portion and an extension portion. The base portion of the housing has an inward facing side and an outward facing side. The control device includes a lever coupled to and pivotable relative to the housing, and a master cylinder portion supported by the housing. The master cylinder portion has a hollow fluid cylinder. The control device also includes a piston assembly supported by the housing. The piston assembly is movable relative to the master cylinder portion. At least part of the piston assembly is disposed within the master cylinder portion. The master cylinder portion is angled relative to the outward facing side of the base portion of the housing, such that the first end of the fluid cylinder is closer to the outward facing side than the second end of the fluid cylinder is relative to the outward facing side.

Abstract: A control device includes a housing having a base portion and an extension portion. The base portion of the housing has an inward facing side and an outward facing side. The control device includes a lever coupled to and pivotable relative to the housing, and a master cylinder portion supported by the housing. The master cylinder portion has a hollow fluid cylinder. The control device also includes a piston assembly supported by the housing. The piston assembly is movable relative to the master cylinder portion. At least part of the piston assembly is disposed within the master cylinder portion. The master cylinder portion is angled relative to the outward facing side of the base portion of the housing, such that the first end of the fluid cylinder is closer to the outward facing side than the second end of the fluid cylinder is relative to the outward facing side.

Abstract: The invention relates to a coating method and to a coating device for coating a body. A magnetron cathode having a target is arranged in the vacuum chamber. Electrical power is supplied to the magnetron cathode such that a plasma is generated and the target is sputtered in order to deposit a coating on the body. The electrical power is periodically supplied within a period duration T according to the HIPIMS method as cathode pulses, wherein each cathode pulse comprises at least two cathode sub-pulses and an intervening cathode sub-pulse break. In order to be able to deposit coatings having favorable properties in a particularly favorable manner by using the chopped HIPIMS method, a bias voltage is applied to the substrate to be coated with bias voltage pulses, wherein each bias voltage pulse comprises at least two bias sub-pulses and an intervening bias sub-pulse break.

Abstract: A control device includes a housing having a base portion and an extension portion. The base portion of the housing has an inward facing side and an outward facing side. The control device includes a lever coupled to and pivotable relative to the housing, and a master cylinder portion supported by the housing. The master cylinder portion has a hollow fluid cylinder. The control device also includes a piston assembly supported by the housing. The piston assembly is movable relative to the master cylinder portion. At least part of the piston assembly is disposed within the master cylinder portion. The master cylinder portion is angled relative to the outward facing side of the base portion of the housing, such that the first end of the fluid cylinder is closer to the outward facing side than the second end of the fluid cylinder is relative to the outward facing side.

Abstract: A control device includes a housing having a base portion and an extension portion. The base portion of the housing has an inward facing side and an outward facing side. The control device includes a lever coupled to and pivotable relative to the housing, and a master cylinder portion supported by the housing. The master cylinder portion has a hollow fluid cylinder. The control device also includes a piston assembly supported by the housing. The piston assembly is movable relative to the master cylinder portion. At least part of the piston assembly is disposed within the master cylinder portion. The master cylinder portion is angled relative to the outward facing side of the base portion of the housing, such that the first end of the fluid cylinder is closer to the outward facing side than the second end of the fluid cylinder is relative to the outward facing side.

Abstract: The invention relates to a coating method and to a coating device for coating a body. A magnetron cathode having a target is arranged in the vacuum chamber. Electrical power is supplied to the magnetron cathode such that a plasma is generated and the target is sputtered in order to deposit a coating on the body. The electrical power is periodically supplied within a period duration T according to the HIPIMS method as cathode pulses, wherein each cathode pulse comprises at least two cathode sub-pulses and an intervening cathode sub-pulse break. In order to be able to deposit coatings having favorable properties in a particularly favorable manner by using the chopped HIPIMS method, a bias voltage is applied to the substrate to be coated with bias voltage pulses, wherein each bias voltage pulse comprises at least two bias sub-pulses and an intervening bias sub-pulse break.

Abstract: A control device includes a housing having a base portion and an extension portion. The base portion of the housing has an inward facing side and an outward facing side. The control device includes a lever coupled to and pivotable relative to the housing, and a master cylinder portion supported by the housing. The master cylinder portion has a hollow fluid cylinder. The control device also includes a piston assembly supported by the housing. The piston assembly is movable relative to the master cylinder portion. At least part of the piston assembly is disposed within the master cylinder portion. The master cylinder portion is angled relative to the outward facing side of the base portion of the housing, such that the first end of the fluid cylinder is closer to the outward facing side than the second end of the fluid cylinder is relative to the outward facing side.

Abstract: The invention relates to a device 10 for holding workpieces 30 in a process chamber. The invention additionally relates to a coating system 20 and to a method for coating a workpiece 30. In order to allow for precise adjustment of the height of the position of workpieces 30 while supporting same in a secure and stable manner, the holding device 10 comprises a tray 72 for the workpieces 30, a height-adjustable first support element 22 and a height-adjustable second support element 48 for the tray 72, wherein each of the support elements 22, 48 comprises at least one first and one second limb element 26, 56, wherein the respective first and the respective second limb element 26, 56 are coupled so as to be pivotable relative to one another about a pivot axis X, Y, and wherein the pivot axis X of the first support element 22 is arranged at an angle to the pivot axis Y of the second support element 48.

Abstract: A bulbous cap for a container, and a method of opening or closing the container using the bulbous cap. The bulbous cap includes an enlarged radius about an axis thereof, such that an individual is able to increase an applied torque when opening or closing the container to more easily remove the bulbous cap from, or attach it to, the container, respectively. The bulbous cap includes a cylindrical cavity on a lower portion thereof which extends toward an interior of the bulbous cap, which is sized to fit over a mouth of the container, and includes a threading thereon that is complementary to a threading of the mouth of the container.

Abstract: The invention relates to a loading device for workpieces (16) in a coating system (10) and a method for loading the workpieces (16). An upright stand (22) has a number of openings (24) arranged above one another in an outward-facing surface (44). A number of insertion sleeves (30) are provided for accommodation in the openings (24), with the insertion sleeves (30) each having a shaft (32) and a retaining structure (24) as well as a borehole (26) to accommodate a workpiece (16). The openings (24) and the shafts (32) of the insertion sleeves (30) are designed such that the insertion sleeves (30) are insertable through the openings (24). The openings (24) and the retaining structures (34) are designed such that holding engagement occurs between the insertion sleeves (30) and the openings (24).

Abstract: The invention relates to an apparatus and a method for pretreating and coating bodies by means of magnetron sputtering. In a vacuum chamber having a metallic chamber wall (26), magnetrons with sputter targets are arranged, at least one of which is an HPPMS magnetron to which electric pulses are fed by connecting a capacitive element (6) with the sputter target of the HPPMS magnetron via a switching element (5). To achieve effective pretreatment and coating of substrates it is provided according to a first aspect to arrange the switching element on the chamber wall. According to a second aspect, an electrode pair is provided, wherein a first electrode is an HPPMS magnetron (1) and the first and second electrodes are arranged in such a manner that a body (11) supported on a substrate table (4) is arranged between the active surfaces of the electrode pair or is moved through the space between the active surfaces of the electrode pair.

Abstract: A device and method for generating an electrical discharge are described. A first electrode (30) is operated to be a cathode relative to a second electrode (16). A gas is introduced into the chamber (14) by the first electrode (30). The first electrode (30) has a closed antechamber (32) with a metal wall (34). A tube (36) consisting of a different material than the wall (34) is provided through which the gas from the antechamber (32) is conducted into the chamber (14). A front portion of the tube (36) is embedded in the wall (34) of the antechamber (32). In its rear portion, the tube (36) has a free end projecting into the antechamber (32). A stable electrical discharge can be generated thereby in a particularly easy manner.

Abstract: A device and method for generating an electrical discharge are described. A first electrode (30) is operated to be a cathode relative to a second electrode (16). A gas is introduced into the chamber (14) by the first electrode (30). The first electrode (30) has a closed antechamber (32) with a metal wall (34). A tube (36) consisting of a different material than the wall (34) is provided through which the gas from the antechamber (32) is conducted into the chamber (14). A front portion of the tube (36) is embedded in the wall (34) of the antechamber (32). In its rear portion, the tube (36) has a free end projecting into the antechamber (32). A stable electrical discharge can be generated thereby in a particularly easy manner.

Abstract: The invention relates to an apparatus and a method for pretreating and coating bodies by means of magnetron sputtering. In a vacuum chamber having a metallic chamber wall (26), magnetrons with sputter targets are arranged, at least one of which is an HPPMS magnetron to which electric pulses are fed by connecting a capacitive element (6) with the sputter target of the HPPMS magnetron via a switching element (5). To achieve effective pretreatment and coating of substrates it is provided according to a first aspect to arrange the switching element on the chamber wall. According to a second aspect, an electrode pair is provided, wherein a first electrode is an HPPMS magnetron (1) and the first and second electrodes are arranged in such a manner that a body (11) supported on a substrate table (4) is arranged between the active surfaces of the electrode pair or is moved through the space between the active surfaces of the electrode pair.

Abstract: A sensor system and method comprising employing a window comprising a material with a bulk resistivity that is substantially uniform throughout the window and sensing electromagnetic radiation through the window.