Abstract: A method for preparing high resolution wash-off polyimide images is described having the sequential steps of (a) providing a non-photosensitive layer containing a substantially non-crystalline poly(amic acid) polymer or salt thereof on a substrate; (b) applying an aqueous ink imagewise to the non-photosensitive layer to change the solubility in the ink-applied areas, the aqueous ink containing a solubility altering agent; (c) washing the non-photosensitive layer with an aqueous solution to remove the soluble areas; and (d) converting the poly(amic acid) polymer to a polyimide.

Abstract: Aqueous dispersions having improved stability and which are particularly well suited for use as aqueous ink jet ink compositions comprise an aqueous carrier medium which comprises water or a mixture of water and at least one organic component; a particulate solid, preferably a pigment; and an ABC triblock polymer comprising an A block which is a hydrophilic polymer, a B block which is a polymer capable of binding to the particulate solid, a C block, different from the A and B block, which is a hydrophobic or hydrophilic polymer; and wherein the A and C blocks are end blocks.

Abstract: The present invention concerns a phototackifiable composition useful as a coating on a substrate consisting of an optically clear blend of two or more polymers and a photosensitive compound that forms a strong acid on exposure to actinic radiation. The invention also relates to a process for coating such a composition on a support and toning the image-wise exposed composition on the support.

Abstract: Method for patterning organic polymer layers comprising the sequential steps:A. Applying to a substrate an unpatterned layer of solid acid labile polymer;B. Applying to the unpatterned layer a patterned second layer comprising a liquid solution of organic acid and volatile solvent;C. Heating the patterned layer to effect removal of the volatile solvent from the layer and diffusion of the organic acid into the underlying areas of the first layer; andD. Washing the layers with aqueous base solution to remove the solubilized acid labile polymer from the patterned areas of the layers.

Abstract: An aqueous ink jet ink composition having improved dispersion stability comprises an aqueous carrier medium, a pigment having a pH value below 7.0, and an AB block polymer consisting of an A block comprising a hydrophobic polymer having at least one basic amine functional groups, and a B block comprising a hydrophilic polymer selected from the group consisting of nonionic polymers and polymers containing acidic functional groups.

Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of a substance that is an acid generator upon exposure to actinic radiation.

Abstract: The present invention concerns a phototackifiable composition useful as a coating on a substrate consisting of an optically clear blend of two or more polymers and a photosensitive compound that forms a strong acid on exposure to actinic radiation. The invention also relates to a process for coating such a composition on a support and toning the image-wise exposed composition on the support.

Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of an acid generator comprising a novel diazonium salt.

Abstract: This application discloses linear methacrylic ABC triblock polymers in which the composition of each of the three blocks is different and wherein at least one of the blocks is hydrophobic and at least one of the blocks is hydrophilic.

Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester moieties in the presence of an acid generator activated by actinic radiation such as UV-visible, deep ultraviolet, e-beam and x-ray radiation.

Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester moieties in the presence of an acid generator activated by actinic radiation such as UV-visible, deep ultraviolet, e-beam and x-ray radiation.

Abstract: This invention relates to positive working resist compositions having utility in dry film photoresists and to fully aqueous methods for developing and stripping them.

Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of a substance that is an acid generator upon exposure to actinic radiation.

Abstract: A photosensitive element adapted for the preparation of colored images is disclosed. The photosensitive element comprises: a photosolubilizable layer consisting essentially of an acid-labile polymer and a photosolubilizing agent; an elastomeric layer; and a support. It can be processed by aqueous solvents, preferably ordinary tap water.

Abstract: This invention relates to positive working resist compositions having utility in dry film photoresists and to fully aqueous methods for developing and stripping them.

Abstract: A photosensitive element adapted for the preparation of colored images is disclosed. The photosensitive element comprises: a photosolubilizable layer consisting essentially of an acid-labile polymer and a photosolubilizing agent; an elastomeric layer; and a support. It can be processed by aqueous solvents, preferably ordinary tap water.

Abstract: The present invention relates to a process for the reaction of carboxylic acids with vinyl ethers using a non-polymeric pyridine hydrochloride and/or polymeric vinylpyridine hydrochloride as a catalyst.

Abstract: This invention relates to a polymerization process initiated by selected organo-silicon, -germanium and -tin compounds, and to "living" polymers therefrom.

Abstract: Group Transfer Polymerization (GTP) process for preparing a "living" polymer, the process comprising contacting under polymerizing conditions in a polymerization medium, at least one acrylic or maleimide monomer with an initiator which is a tetracoordinate organosilicon, organotin or organogermanium compound having at least one GTP initiating site and a catalyst which is or is a source of an anion selected from the group consisting of bifluoride, fluoride, cyanide, azide or a selected oxyanion, or a selected Lewis acid or Lewis base, the process further characterized in that the initiator or the anion or Lewis acid catalyst is chemically attached (grafted) to a solid support that is insoluble in the polymerization medium.

Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of an acid generator comprising a novel diazonium salt.