Patents by Inventor Walter Riley Buchanan
Walter Riley Buchanan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230328869Abstract: A dielectric assembly for a plasma reactor includes a first dielectric layer having a first surface, and a second surface opposite the first surface, a second dielectric layer, thinner than the first dielectric layer, have a third surface, and a fourth surface opposite the third surface, and an electrode disposed between the second surface and the third surface. The electrode may be ring shaped and/or disposed on a spherical surface. A non-reactive coating may be disposed on a surface of the dielectric assembly exposed to a plasma chamber of the plasma reactor. The coating may be disposed in the form of rings with a gap between each ring.Type: ApplicationFiled: March 28, 2023Publication date: October 12, 2023Inventors: Walter Riley Buchanan, John Peter Shaughnessy
-
Patent number: 11452982Abstract: A system and method for performing plasma reactions creating a plasma area in a gas adjacent to a liquid. An embodiment of the plasma reactor includes a housing with an internal reaction chamber, first and second inlet paths to the reaction chamber, and electrodes for producing an electric field. The system may optionally further include a pre-ionization electrode and pre-ionization electric field for pre-ionizing a feed gas prior to entry into a reaction chamber. The reactor uses plasma to ionize gas adjacent with the liquid. The ionized gas reacts with the liquid to form an effluent. Exemplary uses of the plasma reactor include ionic injection, gas dissociation, liquid re-formation, and liquid dissociation. An alternative embodiment provides a system and method for infusion of gaseous particles into liquid by applying an electric field at power levels lower than the voltage required to form a plasma to gas adjacent to liquid.Type: GrantFiled: November 30, 2018Date of Patent: September 27, 2022Assignee: Milton Roy, LLCInventors: Walter Riley Buchanan, Grant William Forsee
-
Publication number: 20210178355Abstract: A system and method for formulating a medical treatment effluent by performing plasma reactions creating a plasma area in a gas adjacent to a liquid. An embodiment of the plasma reactor includes a housing with an internal reaction chamber, first and second inlet paths to the reaction chamber, and electrodes for producing an electric field. The system may optionally further include a pre-ionization electrode and pre-ionization electric field for pre-ionizing a feed gas prior to entry into a reaction chamber. The reactor uses plasma to ionize gas adjacent with the liquid. The ionized gas reacts with the liquid to form an effluent. Exemplary medical treatments include: immunization (immuno) therapy; wound treatment; cancer treatment; and disinfectant applications.Type: ApplicationFiled: February 22, 2021Publication date: June 17, 2021Inventors: Walter Riley Buchanan, Grant William Forsee
-
Patent number: 10882021Abstract: A system and method for performing plasma reactions creating a plasma area in a gas adjacent to a liquid. An embodiment of the plasma reactor includes a housing with an internal reaction chamber, first and second inlet paths to the reaction chamber, and electrodes for producing an electric field. The system may optionally further include a pre-ionization electrode and pre-ionization electric field for pre-ionizing a feed gas prior to entry into a reaction chamber. The reactor uses plasma to ionize gas adjacent with the liquid. The ionized gas reacts with the liquid to form an effluent. Exemplary uses of the plasma reactor include ionic injection, gas dissociation, liquid re-formation, and liquid dissociation.Type: GrantFiled: July 3, 2018Date of Patent: January 5, 2021Assignee: Ion Inject Technology LLCInventors: Walter Riley Buchanan, Grant William Forsee
-
Publication number: 20190099732Abstract: A system and method for performing plasma reactions creating a plasma area in a gas adjacent to a liquid. An embodiment of the plasma reactor includes a housing with an internal reaction chamber, first and second inlet paths to the reaction chamber, and electrodes for producing an electric field. The system may optionally further include a pre-ionization electrode and pre-ionization electric field for pre-ionizing a feed gas prior to entry into a reaction chamber. The reactor uses plasma to ionize gas adjacent with the liquid. The ionized gas reacts with the liquid to form an effluent. Exemplary uses of the plasma reactor include ionic injection, gas dissociation, liquid re-formation, and liquid dissociation. An alternative embodiment provides a system and method for infusion of gaseous particles into liquid by applying an electric field at power levels lower than the voltage required to form a plasma to gas adjacent to liquid.Type: ApplicationFiled: November 30, 2018Publication date: April 4, 2019Inventors: Walter Riley Buchanan, Grant William Forsee
-
Patent number: 10187968Abstract: Traditional plasma voltage generator circuits consist mainly of fly-back or pulse forming networks. These systems tend supply plasma generating pulses to plasma reactors at frequencies less than 30 kHz with most being less than 5 kHz. In addition these traditional plasma voltage generators are limited in the ability to adjust to dynamic reactor conditions, are energy inefficient and are limited in the amount of material ionized. An innovative drive system is presented herein that is energy efficient, can operate at frequencies below and well above 30 kHz, and can react to dynamic conditions in the plasma reactor allowing much greater flexibility and enhanced operating capabilities.Type: GrantFiled: October 7, 2016Date of Patent: January 22, 2019Assignee: Ion Inject Technology LLCInventors: Walter Riley Buchanan, Grant William Forsee
-
Publication number: 20180311639Abstract: A system and method for performing plasma reactions creating a plasma area in a gas adjacent to a liquid. An embodiment of the plasma reactor includes a housing with an internal reaction chamber, first and second inlet paths to the reaction chamber, and electrodes for producing an electric field. The system may optionally further include a pre-ionization electrode and pre-ionization electric field for pre-ionizing a feed gas prior to entry into a reaction chamber. The reactor uses plasma to ionize gas adjacent with the liquid. The ionized gas reacts with the liquid to form an effluent. Exemplary uses of the plasma reactor include ionic injection, gas dissociation, liquid re-formation, and liquid dissociation.Type: ApplicationFiled: July 3, 2018Publication date: November 1, 2018Inventors: Walter Riley Buchanan, Grant William Forsee
-
Patent number: 10046300Abstract: A system for performing liquid treatment using ionized gas comprises a plasma membrane reactor. The plasma membrane reactor includes a gas zone, and ion membrane along with electrodes to create a plasma. The membrane allows ions to pass through and contact the liquid thereby treating the liquid.Type: GrantFiled: December 7, 2016Date of Patent: August 14, 2018Assignee: Ion Inject Technology LLCInventor: Walter Riley Buchanan
-
Patent number: 10010854Abstract: A system for performing treatment of a liquid by ionized gas comprises a laminar flow liquid gas plasma reactor. The plasma reactor includes electrodes, an upper and lower flow spreader, and a housing. The reactor uses gas to form a gas zone above the liquid where the gas is ionized directly above and in direct contact with the liquid. The ionized gas reacts with the liquid to form an effluent.Type: GrantFiled: September 27, 2016Date of Patent: July 3, 2018Assignee: Ion Inject Technology LLCInventor: Walter Riley Buchanan
-
Publication number: 20180014398Abstract: Traditional plasma voltage generator circuits consist mainly of fly-back or pulse forming networks. These systems tend supply plasma generating pulses to plasma reactors at frequencies less than 30 kHz with most being less than 5 kHz. In addition these traditional plasma voltage generators are limited in the ability to adjust to dynamic reactor conditions, are energy inefficient and are limited in the amount of material ionized. An innovative drive system is presented herein that is energy efficient, can operate at frequencies below and well above 30 kHz, and can react to dynamic conditions in the plasma reactor allowing much greater flexibility and enhanced operating capabilities.Type: ApplicationFiled: October 7, 2016Publication date: January 11, 2018Inventors: Walter Riley Buchanan, Grant William Forsee
-
Publication number: 20170165630Abstract: A system for performing liquid treatment using ionized gas comprises a plasma membrane reactor. The plasma membrane reactor includes a gas zone, and ion membrane along with electrodes to create a plasma. The membrane allows ions to pass through and contact the liquid thereby treating said liquid.Type: ApplicationFiled: December 7, 2016Publication date: June 15, 2017Inventor: Walter Riley Buchanan
-
Publication number: 20170095788Abstract: A system for performing treatment of a liquid by ionized gas comprises a laminar flow liquid gas plasma reactor. The plasma reactor includes electrodes, an upper and lower flow spreader, and a housing. The reactor uses gas to form a gas zone above the liquid where the gas is ionized directly above and in direct contact with the liquid. The ionized gas reacts with the liquid to form an effluent.Type: ApplicationFiled: September 27, 2016Publication date: April 6, 2017Inventor: Walter Riley Buchanan
-
Patent number: 9120073Abstract: A plasma reactor consisting of a plurality of elements placed between two or more plasma generating electrodes is presented. Said elements consisting of surfaces, conducting, and/or dielectric which allow for the dielectric isolation of the electrodes from each other and creating a plurality of dielectrically isolated spaces for plasma generation. This plasma reactor achieves a high surface area, with low capacitance allowing simplified construction and is suitable for high frequency operation.Type: GrantFiled: June 5, 2009Date of Patent: September 1, 2015Assignee: EON LABS, LLCInventors: Walter Riley Buchanan, Christopher Daniel Hruska
-
Publication number: 20140246381Abstract: A system for performing ozone water treatment comprises a voltage supply circuit and a plasma eductor reactor. The voltage supply circuit includes an H-bridge controller and driver, a transformer, and an output port. The H-bridge controller and driver are configured to switch the electrical polarity of a pair of terminals. A primary of the transformer is connected to the H-bridge driver and controller. A secondary of the transformer connects in parallel with a first capacitor and in series with an inductor and a second capacitor. The output port connects in parallel with the second capacitor. The plasma eductor reactor includes an electric field generator, a flow spreader, and a diffuser. The electric field generator includes a pair of electrodes that generate an electric field. The flow spreader supplies a stream of oxygen. The diffuser supplies a stream of water. The streams of water and oxygen pass through the electric field.Type: ApplicationFiled: February 24, 2014Publication date: September 4, 2014Applicant: EON LABS,LLCInventors: Walter Riley Buchanan, Christopher Daniel Hruska, David Forsee
-
Publication number: 20100310434Abstract: A plasma reactor consisting of a plurality of elements placed between two or more plasma generating electrodes is presented. Said elements consisting of surfaces, conducting, and/or dielectric which allow for the dielectric isolation of the electrodes from each other and creating a plurality of dielectrically isolated spaces for plasma generation. This plasma reactor achieves a high surface area, with low capacitance allowing simplified construction and is suitable for high frequency operation.Type: ApplicationFiled: June 5, 2009Publication date: December 9, 2010Applicant: EON LABS, LLCInventors: Walter Riley Buchanan, Christopher Daniel Hruska