Abstract: The present disclosure relates to sealed isocyanate resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing, the resin comprising: a blocked isocyanate; at least one monomer or oligomer; and a multifunctional nucleophile.

Abstract: The present disclosure relates to sealed isocyanate resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing, the resin comprising: a blocked isocyanate; at least one monomer or oligomer; and a multifunctional nucleophile.

Abstract: The present disclosure relates to sealed isocyanate resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing, the resin comprising: a blocked isocyanate; at least one monomer or oligomer; and a multifunctional nucleophile.

Abstract: A method of three-dimensional stereolithography printing a thiourethane polymer part using the vat resin. Adding a resin to a vat of a three-dimensional stereolithography printer, the resin a liquid mixture including: a first type of monomer including two or more thiol functional groups, a second type of monomer including two or more isocyanate functional groups, a photolatent base, an anionic step-growth polymerization reaction inhibitor and a light absorber. The photolatent base is decomposable upon exposure to a light to form a non-nucleophillic base catalyst having a pKa greater than 7. The anionic step-growth polymerization reaction inhibitor has an acidic group configured to form an acid-base pair with the non-nucleophillic base. The light absorber has an absorbance in the liquid mixture that is greater than an absorbance of the photolatent base at a wavelength of the light used for the exposure.

Abstract: Bio-electronic devices including a substrate layer composed of a thiol-ene shape memory polymer, the polymer including, a sequential chain of a first type of monomer covalently bonded to a second type of monomer via thiol-ene linkages that form a backbone of the polymer, and. at least one patterned gold interconnect line adhered to the substrate layer.

Abstract: A wellbore isolation device includes a mandrel, a sealing element disposed around at least a portion of the mandrel, and a delay coating disposed on at least a portion of an outer surface of the sealing element. The sealing element includes a swellable material and the delay coating covers a cross-linked polymer. The delay coating is configured to swell or degrade in a wellbore fluid.

Abstract: A vat resin for three-dimensional stereolithography printing of a thiourethane polymer part comprising a liquid mixture including a first type of monomer, a second type of monomer, a photolatent base decomposable upon exposure to a light to form a non-nucleophillic base catalyst having a pKa greater than 7, an anionic step-growth polymerization reaction inhibitor having an acidic group configured to form an acid-base pair with the non-nucleophillic base and a light absorber having an absorbance in the liquid mixture that is greater than an absorbance of the photolatent base at a wavelength of the light used for the exposure. Methods of preparing the vat resin and three-dimensional stereolithography printing a thiourethane polymer part using the vat resin are also disclosed.

Abstract: A method of three-dimensional stereolithography printing a thiourethane polymer part using the vat resin. Adding a resin to a vat of a three-dimensional stereolithography printer, the resin a liquid mixture including: a first type of monomer including two or more thiol functional groups, a second type of monomer including two or more isocyanate functional groups, a photolatent base, an anionic step-growth polymerization reaction inhibitor and a light absorber. The photolatent base is decomposable upon exposure to a light to form a non-nucleophillic base catalyst having a pKa greater than 7. The anionic step-growth polymerization reaction inhibitor has an acidic group configured to form an acid-base pair with the non-nucleophillic base. The light absorber has an absorbance in the liquid mixture that is greater than an absorbance of the photolatent base at a wavelength of the light used for the exposure.

Abstract: Bio-electronic devices including a substrate layer composed of a thiol-ene shape memory polymer, the polymer including, a sequential chain of a first type of monomer covalently bonded to a second type of monomer via thiol-ene linkages that form a backbone of the polymer, and. at least one patterned gold interconnect line adhered to the substrate layer.

Abstract: A system for producing a three-dimensional object from a fluid medium includes image processing units. The fluid medium is configured to solidify when subjected to a prescribed light stimulation. Each image processing unit includes at least one light emitting source configured to emit light, and at least one minor system configured to reflect the light emitted by the light emitting source. The minor system includes a manipulating system for adjusting the direction of the emitted light, a control system for controlling the manipulating system, and at least one optical element configured to manipulate the emitted light and to project the emitted light onto an area of a surface of the fluid medium to form an image on the surface. The image processing units are configured to form corresponding images on the surface, and are configured to be movable at least in a lateral direction relative to the surface.

Abstract: A thiol-ene shape memory polymer including a sequential chain of a first type of monomer covalently bonded to a second type of monomer via thiol-ene linkages that form a backbone of the polymer. The first type of monomer includes two or more thiol functional groups and the second type of monomer includes two or more alkene functional groups. The sequential chain of the covalently bonded first and second types of monomers forming the polymer backbone is free of ester groups. Also disclosed in a method of synthesizing the thiol-ene shape memory polymer, a bio-electronic device including a substrate layer composed of the thiol-ene shape memory polymer, and a method of manufacturing the bio-electronic device.

Abstract: An amorphous thermoset thiourethane polymer, comprising a sequential chain of a first type of monomer covalently bonded to a second type of monomer via thiourethane linkages, wherein the first type of monomer includes two or more thiol functional groups and the second type of monomer includes two or more isocyanate functional groups. Methods of synthesizing the polymer, bio-electronic devices comprising the polymer and methods of manufacturing such devices are disclosed.

Abstract: Provided are methods and systems for manufacturing and using heat-shrink elastomeric. An example method of manufacturing a heat-shrink elastomeric element comprises providing a thermoplastic elastomeric element having a first shape; modifying the thermoplastic elastomeric element to produce a thermoset elastomeric element having the first shape; heating the thermoset elastomeric element to a temperature of at least the glass transition temperature of the thermoset elastomeric element; adjusting the first shape of the thermoset elastomeric element to produce a second shape with at least one dimension greater than that of the first shape; and cooling the thermoset elastomeric element to a temperature below that of the glass transition temperature of the thermoset elastomeric element to produce the heat-shrink elastomeric element.

Abstract: The invention discloses a method for adhering a metal layer to a polymer substrate and device manufacture therefrom. The metal layer is deposited on a sacrificial substrate of a mold to form part of an interior surface of the mold, and a solution of monomers is deposited on the metal layer. The monomers are then polymerized together to form the polymer substrate on the metal layer. Then the polymer substrate is removed from the mold such that the metal layer is removed from the mold and adhered to the polymer substrate.

Abstract: Provided are methods and systems for manufacturing and using heat-shrink elastomeric. An example method of manufacturing a heat-shrink elastomeric element comprises providing a thermoplastic elastomeric element having a first shape; modifying the thermoplastic elastomeric element to produce a thermoset elastomeric element having the first shape; heating the thermoset elastomeric element to a temperature of at least the glass transition temperature of the thermoset elastomeric element; adjusting the first shape of the thermoset elastomeric element to produce a second shape with at least one dimension greater than that of the first shape; and cooling the thermoset elastomeric element to a temperature below that of the glass transition temperature of the thermoset elastomeric element to produce the heat-shrink elastomeric element.

Abstract: The present disclosure relates to sealed isocyanate resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing, the resin comprising: a blocked isocyanate; at least one monomer or oligomer; and a multifunctional nucleophile.

Abstract: A semi-crystalline thiourethane polymer. The semi-crystalline thiourethane polymer comprises a sequential chain of a first type of monomer covalently bonded to a second type of monomer via thiourethane linkages. Each of the first type of monomer includes two or more thiol functional groups and each of the second type of monomer includes two or more isocyanate functional groups. The first and second types of monomers are polymerized together in an anionic step-growth polymerization reaction that is catalyzed by a non-nucleophillic base having a pKa greater than 7, produced by photo-initiated decomposition of a photolatent base. A method of synthesizing, and polymer jetting and stereolithography methods of manufacturing a polymer part, are also disclosed.

Abstract: A wellbore isolation device includes a mandrel, a sealing element disposed around at least a portion of the mandrel, and a delay coating disposed on at least a portion of an outer surface of the sealing element. The sealing element includes a swellable material and the delay coating covers a cross-linked polymer. The delay coating is configured to swell or degrade in a wellbore fluid.

Abstract: The invention discloses a method for adhering a metal layer to a polymer substrate. The metal layer is deposited on a sacrificial substrate of a mold to form part of an interior surface of the mold, and a solution of monomers is deposited on the metal layer. The monomers are then polymerized together to form the polymer substrate on the metal layer. Then the polymer substrate is removed from the mold such that the metal layer is removed from the mold and adhered to the polymer substrate.

Abstract: The present disclosure relates to sealed isocyanate resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing, the resin comprising: a blocked isocyanate; at least one monomer or oligomer; and a multifunctional nucleophile.