Abstract: The present invention relates to a system and method for the recycling of sulfur hexafluoride (SF6), from a waste gas of a manufacturing process, such as a semiconductor processing method. In particular, the present invention provides a simplified system and method that utilizes additional SF6 as a purge gas for the system pump and allows relatively easy separation of the SF6 from the other waste gas components.

Abstract: The present invention provides generally a method and apparatus for purifying a liquid. More particularly, purification of a bulk liquid is performed by introducing a liquid stream to a purification vessel, which comprises both a distillation chamber for forming a purified vapor and an annular chamber for collecting a purified liquid that is condensed from the purified vapor. A refrigerant system provides thermodynamic efficiency in the purification method by directing waste heat generated in one part of the refrigerant system for heating duty in another part of the refrigerant system. The method and apparatus can be applied to producing purified carbon dioxide, nitrous oxide, ammonia and fluorocarbons.

Abstract: An apparatus for generating a high pressure fluid from a low pressure gas source, includes a low pressure gas source for supplying a low pressure gas, a vessel for receiving the low pressure gas, cooling means for cooling the low pressure gas within the vessel to a condensation temperature sufficient to condense a desired portion of the low pressure gas into a liquid and for maintaining the temperature of the liquid during pressurization thereof; pressurizing means for pressurizing the liquid to yield a high pressure liquid, and optionally, treating means for treating the high pressure liquid to form a corresponding high pressure gas. The present invention is further directed to methods of generating a high pressure fluid.

Abstract: A method and apparatus is disclosed for producing fluorine by providing a contained fluorine precursor source located proximate to or remotely from an adsorbent bed, optionally in a replaceable unit that may be a replaceable module comprising both the fluorine source and the adsorbent bed. Fluorine derived preferably from a nitrogen trifluoride source and used to remove deposited silicon-containing impurities in reaction chambers is reclaimed from an adsorbent bed, and made available to the reaction chamber as a supplemental fluorine source to reduce the total required amount of nitrogen trifluoride source gas. The separation column adsorbent is regenerated in cyclical intervals using a reverse flow of inert gas.

Abstract: The present invention provides generally a method and apparatus for purifying a liquid. More particularly, purification of a bulk liquid is performed by introducing a liquid stream to a purification vessel, which comprises both a distillation chamber for forming a purified vapor and an annular chamber for collecting a purified liquid that is condensed from the purified vapor. A refrigerant system provides thermodynamic efficiency in the purification method by directing waste heat generated in one part of the refrigerant system for heating duty in another part of the refrigerant system. The method and apparatus can be applied to producing purified carbon dioxide, nitrous oxide, ammonia and fluorocarbons.

Abstract: A process for cleaning the surface of a semiconductor wafer. The process has the following steps: a) conveying a component selected from the group consisting of a dense gas component, a liquid component and a mixture thereof to a bellows accumulator having a bellows therein; b) applying an elevated pressure to said bellows sufficient to discharge the component from the bellows onto said surface of the wafer; and c) contacting the component with the surface of the wafer. There is also a system for cleaning the surface of a semiconductor wafer and for mixing a dense gas component and a liquid component.