Patents by Inventor Walter Whitlock

Walter Whitlock has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080034970
    Abstract: The present invention relates to a system and method for the recycling of sulfur hexafluoride (SF6), from a waste gas of a manufacturing process, such as a semiconductor processing method. In particular, the present invention provides a simplified system and method that utilizes additional SF6 as a purge gas for the system pump and allows relatively easy separation of the SF6 from the other waste gas components.
    Type: Application
    Filed: August 10, 2006
    Publication date: February 14, 2008
    Inventors: Frank Jansen, Walter Whitlock
  • Patent number: 7263858
    Abstract: The present invention provides generally a method and apparatus for purifying a liquid. More particularly, purification of a bulk liquid is performed by introducing a liquid stream to a purification vessel, which comprises both a distillation chamber for forming a purified vapor and an annular chamber for collecting a purified liquid that is condensed from the purified vapor. A refrigerant system provides thermodynamic efficiency in the purification method by directing waste heat generated in one part of the refrigerant system for heating duty in another part of the refrigerant system. The method and apparatus can be applied to producing purified carbon dioxide, nitrous oxide, ammonia and fluorocarbons.
    Type: Grant
    Filed: May 20, 2005
    Date of Patent: September 4, 2007
    Assignee: The BOC Group, Inc.
    Inventor: Walter Whitlock
  • Publication number: 20060213221
    Abstract: An apparatus for generating a high pressure fluid from a low pressure gas source, includes a low pressure gas source for supplying a low pressure gas, a vessel for receiving the low pressure gas, cooling means for cooling the low pressure gas within the vessel to a condensation temperature sufficient to condense a desired portion of the low pressure gas into a liquid and for maintaining the temperature of the liquid during pressurization thereof; pressurizing means for pressurizing the liquid to yield a high pressure liquid, and optionally, treating means for treating the high pressure liquid to form a corresponding high pressure gas. The present invention is further directed to methods of generating a high pressure fluid.
    Type: Application
    Filed: March 23, 2005
    Publication date: September 28, 2006
    Inventors: Ron Lee, Walter Whitlock
  • Publication number: 20060042462
    Abstract: A method and apparatus is disclosed for producing fluorine by providing a contained fluorine precursor source located proximate to or remotely from an adsorbent bed, optionally in a replaceable unit that may be a replaceable module comprising both the fluorine source and the adsorbent bed. Fluorine derived preferably from a nitrogen trifluoride source and used to remove deposited silicon-containing impurities in reaction chambers is reclaimed from an adsorbent bed, and made available to the reaction chamber as a supplemental fluorine source to reduce the total required amount of nitrogen trifluoride source gas. The separation column adsorbent is regenerated in cyclical intervals using a reverse flow of inert gas.
    Type: Application
    Filed: October 14, 2005
    Publication date: March 2, 2006
    Inventors: Edward Ezell, Richard Hogle, Walter Whitlock, Graham McFarlane
  • Publication number: 20050217315
    Abstract: The present invention provides generally a method and apparatus for purifying a liquid. More particularly, purification of a bulk liquid is performed by introducing a liquid stream to a purification vessel, which comprises both a distillation chamber for forming a purified vapor and an annular chamber for collecting a purified liquid that is condensed from the purified vapor. A refrigerant system provides thermodynamic efficiency in the purification method by directing waste heat generated in one part of the refrigerant system for heating duty in another part of the refrigerant system. The method and apparatus can be applied to producing purified carbon dioxide, nitrous oxide, ammonia and fluorocarbons.
    Type: Application
    Filed: May 20, 2005
    Publication date: October 6, 2005
    Inventor: Walter Whitlock
  • Publication number: 20050039775
    Abstract: A process for cleaning the surface of a semiconductor wafer. The process has the following steps: a) conveying a component selected from the group consisting of a dense gas component, a liquid component and a mixture thereof to a bellows accumulator having a bellows therein; b) applying an elevated pressure to said bellows sufficient to discharge the component from the bellows onto said surface of the wafer; and c) contacting the component with the surface of the wafer. There is also a system for cleaning the surface of a semiconductor wafer and for mixing a dense gas component and a liquid component.
    Type: Application
    Filed: August 19, 2003
    Publication date: February 24, 2005
    Inventor: Walter Whitlock