Patents by Inventor Waltherus Van Den Hoogenhof

Waltherus Van Den Hoogenhof has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9851313
    Abstract: A method of X-ray analysis measures X-ray diffraction in transmission. In order to carry out quantitative measurements, a background measurement is taken slightly away from the diffraction peak and the ratio of measured intensities used to correct for variations in sample composition.
    Type: Grant
    Filed: March 3, 2015
    Date of Patent: December 26, 2017
    Assignee: PANALYTICAL B.V.
    Inventors: Waltherus Van Den Hoogenhof, Charalampos Zarkadas
  • Patent number: 9784699
    Abstract: Quantitative X-ray analysis is carried out by making X-ray fluorescence measurements to determine the elemental composition of a sample and a correction measurement by measuring the transmitted intensity of X-rays at an energy E transmitted directly through the sample without deviation. An X-ray diffraction measurement is made in transmission by directing X-rays from an X-ray source at the energy E onto a sample at an incident angle ?1 to the surface of the sample and measuring a measured intensity Id(?fl) of the diffracted X-rays at the energy E with an X-ray detector at an exit angle ?2 corresponding to an X-ray diffraction peak of a predetermined component. A matrix corrected X-ray intensity is obtained using the measured X-ray intensity in the X-ray diffraction measurement, the correction measurement and the mass attenuation coefficient of the sample calculated from the elemental composition and the mass attenuation coefficients of the elements.
    Type: Grant
    Filed: March 3, 2015
    Date of Patent: October 10, 2017
    Assignee: PANALYTICAL B.V.
    Inventors: Charalampos Zarkadas, Milen Gateshki, Alexander Kharchenko, Waltherus Van Den Hoogenhof, Petronella Emerentiana Hegeman, Dick Kuiper
  • Patent number: 9739730
    Abstract: Apparatus includes an X-ray source 10, a wavelength dispersive X-ray detector for measuring X-ray fluorescence (XRF) and an energy dispersive X-ray detector 14 again for measuring X-ray fluorescence. Selected elements are measured using the wavelength dispersive process to reduce the overall measurement time compared with using only one of the two detectors or compared to a simple approach of measuring low atomic number elements with the wavelength dispersive detector and high atomic number elements with the energy dispersive detector. The selection can take place dynamically, in particular on the basis of the results of the energy-dispersive detector.
    Type: Grant
    Filed: March 4, 2015
    Date of Patent: August 22, 2017
    Assignee: PANALYTICAL B.V.
    Inventors: Petronella Emerentiana Hegeman, Gustaaf Christian Brons, Aleksandr Komelkov, Bruno A. R. Vrebos, Waltherus Van Den Hoogenhof, Charalampos Zarkadas
  • Publication number: 20160258892
    Abstract: Apparatus includes an X-ray source 10, a wavelength dispersive X-ray detector for measuring X-ray fluorescence (XRF) and an energy dispersive X-ray detector 14 again for measuring X-ray fluoresence. Selected elements are measured using the wavelength dispersive process to reduce the overall measurement time compared with using only one of the two detectors or compared to a simple approach of measuring low atomic number elements with the wavelength dispersive detector and high atomic number elements with the energy dispersive detector. The selection can take place dynamically, in particular on the basis of the results of the energy-dispersive detector.
    Type: Application
    Filed: March 4, 2015
    Publication date: September 8, 2016
    Inventors: Petronella Emerentiana Hegeman, Gustaaf Christian Brons, Aleksandr Komelkov, Bruno A.R. Vrebos, Waltherus Van Den Hoogenhof, Charalampos Zarkadas
  • Publication number: 20160258889
    Abstract: A method of X-ray analysis measures X-ray diffraction in transmission. In order to carry out quantitative measurements, a background measurement is taken slightly away from the diffraction peak and the ratio of measured intensities used to correct for variations in sample composition.
    Type: Application
    Filed: March 3, 2015
    Publication date: September 8, 2016
    Inventors: Waltherus Van Den Hoogenhof, Charalampos Zarkadas
  • Publication number: 20160258890
    Abstract: Quantitative X-ray analysis is carried out by making X-ray fluorescence measurements to determine the elemental composition of a sample and a correction measurement by measuring the transmitted intensity of X-rays at an energy E transmitted directly through the sample without deviation. An X-ray diffraction measurement is made in transmission by directing X-rays from an X-ray source at the energy E onto a sample at an incident angle ?1 to the surface of the sample and measuring a measured intensity Id(?fl) of the diffracted X-rays at the energy E with an X-ray detector at an exit angle ?2 corresponding to an X-ray diffraction peak of a predetermined component. A matrix corrected X-ray intensity is obtained using the measured X-ray intensity in the X-ray diffraction measurement, the correction measurement and the mass attenuation coefficient of the sample calculated from the elemental composition and the mass attenuation coefficients of the elements.
    Type: Application
    Filed: March 3, 2015
    Publication date: September 8, 2016
    Inventors: Charalampos Zarkadas, Milen Gateshki, Alexander Kharchenko, Waltherus Van Den Hoogenhof, Petronella Emerentiana Hegeman, Dick Kuiper