Abstract: A calibrating device including a pixel unit array and a pattern is provided. The pixel unit array comprises parallel warp lines and parallel weft lines. Each warp line crosses each weft line to define pixel units all over the pixel unit array. The pattern comprises some pixel units having a gray level different from a gray level of remainder pixel units in the pixel unit array. The pattern comprises spaced bars parallel to one another and not parallel to the warp lines and the weft lines. A characteristic of the pattern is utilized to define target pixel units and comparison pixel units, and the comparison procedure is implemented with the characteristic of the pattern. Positions and gap sizes of gaps between image sensors are mapped out by comparing the target pixel units with the comparison pixel units. The quality of a scanned image is improved with compensation for the gaps.

Abstract: A calibrating device including a pixel unit array and a pattern is provided. The pixel unit array comprises parallel warp lines and parallel weft lines. Each warp line crosses each weft line to define pixel units all over the pixel unit array. The pattern comprises some pixel units having a gray level different from a gray level of remainder pixel units in the pixel unit array. The pattern comprises spaced bars parallel to one another and not parallel to the warp lines and the weft lines. A characteristic of the pattern is utilized to define target pixel units and comparison pixel units, and the comparison procedure is implemented with the characteristic of the pattern. Positions and gap sizes of gaps between image sensors are mapped out by comparing the target pixel units with the comparison pixel units. The quality of a scanned image is improved with compensation for the gaps.