Patents by Inventor Wan-Jung Teng

Wan-Jung Teng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240093024
    Abstract: A polymer is formed by capping a copolymer-graft-polylactone with an alcohol, wherein the copolymer is copolymerized from an anhydride monomer with a double bond, a monomer with a double bond, and an initiator. The polymer can be mixed with an organic solvent and pigment powder to form a dispersion. The dispersion can be mixed with a binder to form a paint.
    Type: Application
    Filed: November 23, 2022
    Publication date: March 21, 2024
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Cha-Wen CHANG, Jen-Yu CHEN, Wan-Jung TENG, Wen-Pin CHUANG, Ruo-Han YU
  • Patent number: 10213758
    Abstract: A polymer is disclosed, which includes a structure of Formula 1 or Formula 2. R1 is a C2-18 alkylene group or a C6-18 arylene group, R2 is a C1-18 alkyl group, and R3 is a functional group of Formula 3. Each of X1, X2, X3, X4, X5, and X6, being the same or different, is H or methyl. Each of p, q, and r, being the same or different, is an integer of 1 to 60. R4 is —C2H4—, —C3H6—, Each of m and n, being the same or different, is an integer of 0 to 50, and m+n?0.
    Type: Grant
    Filed: October 31, 2016
    Date of Patent: February 26, 2019
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Cha-Wen Chang, Ching-Mao Huang, Shinn-Jen Chang, Yu-Hui Chen, Wan-Jung Teng, Shu-Ya Tsai, Jen-Yu Chen
  • Publication number: 20170128899
    Abstract: A polymer is disclosed, which includes a structure of Formula 1 or Formula 2. R1 is a C2-18 alkylene group or a C6-18 arylene group, R2 is a C1-18 alkyl group, and R3 is a functional group of Formula 3. Each of X1, X2, X3, X4, X5, and X6, being the same or different, is H or methyl. Each of p, q, and r, being the same or different, is an integer of 1 to 60. R4 is —C2H4—, —C3H6—, Each of m and n, being the same or different, is an integer of 0 to 50, and m+n?0.
    Type: Application
    Filed: October 31, 2016
    Publication date: May 11, 2017
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Cha-Wen CHANG, Ching-Mao HUANG, Shinn-Jen CHANG, Yu-Hui CHEN, Wan-Jung TENG, Shu-Ya TSAI, Jen-Yu CHEN
  • Publication number: 20120043555
    Abstract: The invention provides a liquid fluorescent composition. The liquid fluorescent composition includes at least (a) 0.001-2 parts by weight of a fluorescent material; and (b) 100 parts by weight of a cyclic solvent having a boiling point above 100° C. The invention also provides a light emitting device containing the above liquid fluorescent composition.
    Type: Application
    Filed: March 19, 2010
    Publication date: February 23, 2012
    Inventors: Chi-Shen Tuan, Wan-Jung Teng, Mei-Ling Chou, Yu Hsuan Wang, Ching-Cheng Sun, Tsung-Hsun Yang
  • Publication number: 20090142876
    Abstract: An ink composition of a color conversion film is disclosed. The ink composition includes a fluorescent polymer (Formula I, II, III), an aromatic transparent unsaturated resin containing a phenyl or fluorene functional group (Formula IV, V), and a solvent of a cyclic compound, wherein the molecular structure of the aromatic transparent unsaturated resin is compatible to that of the fluorescent polymer. The invention further provides a fabrication method of a color conversion film including dispensing the disclosed ink composition on a substrate, and curing the ink composition to form the color conversion film.
    Type: Application
    Filed: September 4, 2008
    Publication date: June 4, 2009
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chi-Shen Tuan, Wan-Jung Teng, Feng-Mei Wu, Mei-Ling Chou
  • Patent number: 7026275
    Abstract: A method of reducing the photoelectric device leakage current caused by residual metal ions in conjugated polymer. A chelating agent is added to a conjugated polymer material, thereby the conductivity and mobility of metal ions under an electric field are reduced due to the chelation of metal ions by the chelating agent; therefore, the leakage current is reduced and the stability of devices is improved. Furthermore, the activity of metal ions is reduced after the metal ions are chelated by the chelating agent, improving the stability of the material and the devices. A conjugated polymer composition is also provided.
    Type: Grant
    Filed: August 5, 2003
    Date of Patent: April 11, 2006
    Assignee: Industrial Technology Research Institute
    Inventors: Kuo-Yu Chen, Chi-Shen Tuan, Wan-Jung Teng, Shinn-Jen Chang
  • Publication number: 20040250849
    Abstract: A method of reducing the photoelectric device leakage current caused by residual metal ions in conjugated polymer. A chelating agent is added to a conjugated polymer material, thereby the conductivity and mobility of metal ions under an electric field are reduced due to the chelation of metal ions by the chelating agent; therefore, the leakage current is reduced and the stability of devices is improved. Furthermore, the activity of metal ions is reduced after the metal ions are chelated by the chelating agent, improving the stability of the material and the devices. A conjugated polymer composition is also provided.
    Type: Application
    Filed: August 5, 2003
    Publication date: December 16, 2004
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Kuo-Yu Chen, Chi-Shen Tuan, Wan-Jung Teng, Shinn-Jen Chang
  • Patent number: 6566483
    Abstract: This invention discloses a photosensitive phosphorylated phenol-formaldehyde resin, characterized by containing in its molecule at least two phosphate groups, each phosphate group coupled with at least one photo-sensitive group. The photosensitive resin of the present invention is prepared by reacting a phenol-formaldehyde resin with phosphorus oxychloride to form a phosphorylated phenol-formaldehyde resin; then reacting the resin with a compound having one hydroxyl group and at least one ethylenically unsaturated bond, thereby esterifying some of the phosphorochloridate groups to produce a resin having ethylenically unsaturated bonds and unreacted phosphorochloridate groups; and hydrolyzing the unreacted phosphorochloridate groups into phosphoric groups. The photosensitive resin according to the invention is UV-curable and alkaline-soluble as traditional photosensitive resins are; moreover, it exhibits good flame retardant and adhesive properties.
    Type: Grant
    Filed: September 27, 2001
    Date of Patent: May 20, 2003
    Assignee: Industrial Technology Research Institute
    Inventors: Ching-Sheng Cho, Shinn-Jen Chang, Wan-Jung Teng, Jiun-Ji Chen
  • Publication number: 20020111454
    Abstract: This invention discloses a photosensitive phosphorylated phenol-formaldehyde resin, characterized by containing in its molecule at least two phosphate groups, each phosphate group coupled with at least one photo-sensitive group. The photosensitive resin of the present invention is prepared by reacting a phenol-formaldehyde resin with phosphorus oxychloride to form a phosphorylated phenol-formaldehyde resin; then reacting the resin with a compound having one hydroxyl group and at least one ethylenically unsaturated bond, thereby esterifying some of the phosphorochloridate groups to produce a resin having ethylenically unsaturated bonds and unreacted phosphorochloridate groups; and hydrolyzing the unreacted phosphorochloridate groups into phosphoric groups. The photosensitive resin according to the invention is UV-curable and alkaline-soluble as traditional photosensitive resins are; moreover, it exhibits good flame retardant and adhesive properties.
    Type: Application
    Filed: September 27, 2001
    Publication date: August 15, 2002
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ching-Sheng Cho, Shinn-Jen Chang, Wan-Jung Teng, Jiun-Ji Chen
  • Patent number: 6121382
    Abstract: Disclosed is a surface treatment agent for aqueous ink receiving media such as ink jet recording paper, printing sheets, coating materials and so on. The surface treatment agent according to the invention comprises a water-based resin and a carboxylic acid-containing hydrophilic sulfopolyester which provides superior adhesion and water resistance. With the superior adhesion properties, the surface treatment agent can be directly coated on substrates without the inconvenience of primer coating. The surface treatment agent of the invention is suitable for aqueous ink jet printing, coating, or recording media, particularly those of ink jet printers and ink jet plotters.
    Type: Grant
    Filed: April 16, 1998
    Date of Patent: September 19, 2000
    Assignee: Industrial Technology Research Institute
    Inventors: Shinn-Jen Chang, Yih-Her Chang, Rong-Shuh Chang, Wan-Jung Teng, Yuan-Tung Hung