Patents by Inventor Wan-Seob Kim

Wan-Seob Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Structures for measuring misalignment of patterns
    Patent number: 8278759
    Abstract: A structure for measuring misalignment of patterns may include a first wiring and a second wiring. The first wiring may include a first lower pattern and a first upper pattern. The first upper pattern may extend in a y-direction, and a first end portion of the first upper pattern that is relatively further toward (proximal to) a negative y-direction may contact the first lower pattern. The second wiring may include a second lower pattern and a second upper pattern. The second upper pattern may extend in the y-direction, a second end portion of the second upper pattern that is relatively further toward (proximal to) a positive y-direction may contact the second lower pattern. The second wiring may be spaced apart from the first wiring along the negative y-direction.
    Type: Grant
    Filed: February 3, 2010
    Date of Patent: October 2, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Wan-Seob Kim
  • Structures for measuring misalignment of patterns
    Publication number: 20100193786
    Abstract: A structure for measuring misalignment of patterns may include a first wiring and a second wiring. The first wiring may include a first lower pattern and a first upper pattern. The first upper pattern may extend in a y-direction, and a first end portion of the first upper pattern that is relatively further toward (proximal to) a negative y-direction may contact the first lower pattern. The second wiring may include a second lower pattern and a second upper pattern. The second upper pattern may extend in the y-direction, a second end portion of the second upper pattern that is relatively further toward (proximal to) a positive y-direction may contact the second lower pattern. The second wiring may be spaced apart from the first wiring along the negative y-direction.
    Type: Application
    Filed: February 3, 2010
    Publication date: August 5, 2010
    Inventor: Wan-Seob Kim