Patents by Inventor Wan-Ting Lo

Wan-Ting Lo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11616273
    Abstract: The disclosure provides a method for manufacturing a separator, comprising the steps of: providing a nonporous precursor substrate; coating a heat-resistant slurry on a surface of the nonporous precursor substrate to form a heat-resistant coating layer, wherein the heat-resistant slurry comprises a binder and a plurality of inorganic particles; and stretching the nonporous precursor substrate with the heat-resistant coating layer formed thereon to generate a separator comprising a porous substrate and a heat-resistant layer; wherein the heat-resistant layer is disposed on the surface of the porous substrate in the range of 10% to 90% of the total surface area of the porous substrate.
    Type: Grant
    Filed: March 25, 2022
    Date of Patent: March 28, 2023
    Assignee: BenQ Materials Corporation
    Inventors: Wei-Ting Yeh, Yi-Fang Huang, Kai-Wei Cheng, Yu-Ruei Li, Wan-Ting Lo
  • Patent number: 11575180
    Abstract: The disclosure provides a separator comprising a porous substrate and a heat-resistant layer disposed on a surface of the substrate. The heat-resistant layer comprises a binder and a plurality of inorganic particles, wherein the heat-resistant layer is disposed on the surface of the porous substrate in the range of 10% to 90% of the total surface area of the porous substrate.
    Type: Grant
    Filed: January 28, 2021
    Date of Patent: February 7, 2023
    Assignee: BenQ Materials Corporation
    Inventors: Wei-Ting Yeh, Yi-Fang Huang, Kai-Wei Cheng, Yu-Ruei Li, Wan-Ting Lo
  • Publication number: 20220216571
    Abstract: The disclosure provides a method for manufacturing a separator, comprising the steps of: providing a nonporous precursor substrate; coating a heat-resistant slurry on a surface of the nonporous precursor substrate to form a heat-resistant coating layer, wherein the heat-resistant slurry comprises a binder and a plurality of inorganic particles; and stretching the nonporous precursor substrate with the heat-resistant coating layer formed thereon to generate a separator comprising a porous substrate and a heat-resistant layer; wherein the heat-resistant layer is disposed on the surface of the porous substrate in the range of 10% to 90% of the total surface area of the porous substrate.
    Type: Application
    Filed: March 25, 2022
    Publication date: July 7, 2022
    Applicant: BenQ Materials Corporation
    Inventors: WEI-TING YEH, YI-FANG HUANG, KAI-WEI CHENG, YU-RUEI LI, WAN-TING LO
  • Publication number: 20210296734
    Abstract: The disclosure provides a separator comprising a porous substrate and a heat-resistant layer disposed on a surface of the substrate. The heat-resistant layer comprises a binder and a plurality of inorganic particles, wherein the heat-resistant layer is disposed on the surface of the porous substrate in the range of 10% to 90% of the total surface area of the porous substrate.
    Type: Application
    Filed: January 28, 2021
    Publication date: September 23, 2021
    Inventors: WEI-TING YEH, YI-FANG HUANG, KAI-WEI CHENG, YU-RUEI LI, WAN-TING LO
  • Patent number: 10922464
    Abstract: Fabricating a first semiconductor device cell using a first process based on a first process parameter or material comprises extracting semiconductor device parameters from the first process parameters to obtain extracted semiconductor device parameters of a first semiconductor device cell. The fabrication process includes training an artificial intelligence to obtain a predictive artificial intelligence using training data as input, the training data comprising the extracted semiconductor device cell parameters and the first process parameter or material. A proposed process modification is provided to the predictive artificial intelligence to generate a predicted cell delay by the predictive artificial intelligence. The predicted cell delay is evaluated against a cell delay threshold. When the predicted cell delay satisfies the cell delay threshold, a new semiconductor device cell is fabricated using a modified process incorporating the proposed process modification.
    Type: Grant
    Filed: December 10, 2019
    Date of Patent: February 16, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Hui-I Wu, Ke-Ying Su, Wan-Ting Lo, Niranjan Vepuri, Hsiang-Ho Chang
  • Publication number: 20200110913
    Abstract: Fabricating a first semiconductor device cell using a first process based on a first process parameter or material comprises extracting semiconductor device parameters from the first process parameters to obtain extracted semiconductor device parameters of a first semiconductor device cell. The fabrication process includes training an artificial intelligence to obtain a predictive artificial intelligence using training data as input, the training data comprising the extracted semiconductor device cell parameters and the first process parameter or material. A proposed process modification is provided to the predictive artificial intelligence to generate a predicted cell delay by the predictive artificial intelligence. The predicted cell delay is evaluated against a cell delay threshold. When the predicted cell delay satisfies the cell delay threshold, a new semiconductor device cell is fabricated using a modified process incorporating the proposed process modification.
    Type: Application
    Filed: December 10, 2019
    Publication date: April 9, 2020
    Inventors: Hui-I Wu, Ke-Ying Su, Wan-Ting Lo, Niranjan Vepuri, Hsiang-Ho Chang
  • Patent number: 10515172
    Abstract: Fabricating a first semiconductor device cell using a first process based on a first process parameter or material comprises extracting semiconductor device parameters from the first process parameters to obtain extracted semiconductor device parameters of a first semiconductor device cell. The fabrication process includes training an artificial intelligence to obtain a predictive artificial intelligence using training data as input, the training data comprising the extracted semiconductor device cell parameters and the first process parameter or material. A proposed process modification is provided to the predictive artificial intelligence to generate a predicted cell delay by the predictive artificial intelligence. The predicted cell delay is evaluated against a cell delay threshold. When the predicted cell delay satisfies the cell delay threshold, a new semiconductor device cell is fabricated using a modified process incorporating the proposed process modification.
    Type: Grant
    Filed: October 15, 2018
    Date of Patent: December 24, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Hui-I Wu, Ke-Ying Su, Wan-Ting Lo, Niranjan Vepuri, Hsiang-Ho Chang
  • Publication number: 20190121928
    Abstract: Fabricating a first semiconductor device cell using a first process based on a first process parameter or material comprises extracting semiconductor device parameters from the first process parameters to obtain extracted semiconductor device parameters of a first semiconductor device cell. The fabrication process includes training an artificial intelligence to obtain a predictive artificial intelligence using training data as input, the training data comprising the extracted semiconductor device cell parameters and the first process parameter or material. A proposed process modification is provided to the predictive artificial intelligence to generate a predicted cell delay by the predictive artificial intelligence. The predicted cell delay is evaluated against a cell delay threshold. When the predicted cell delay satisfies the cell delay threshold, a new semiconductor device cell is fabricated using a modified process incorporating the proposed process modification.
    Type: Application
    Filed: October 15, 2018
    Publication date: April 25, 2019
    Inventors: Hui-I Wu, Ke-Ying Su, Wan-Ting Lo, Niranjan Vepuri, Hsiang-Ho Chang
  • Patent number: 6762926
    Abstract: The energy content of supercapacitor is determined by its capacitance value and working voltage. To attain a high capacitance and a high voltage, several pieces of electrodes and separators are spirally wound with edge sealing to form a bipolar supercapacitor in cylindrical, oval or square configuration. While the winding operation effectively provides a large surface area for high capacitance, the bipolar packaging instantly imparts a unitary roll a minimum working voltage of 5V on using an organic electrolyte. The bipolar roll is a powerful building block for facilitating the assembly of supercapacitor modules. Using containers with multiple compartments, as many bipolar rolls can be connected in series, in parallel or in a combination of the two connections to fabricate integrated supercapacitors with high energy density as required by applications.
    Type: Grant
    Filed: May 20, 2003
    Date of Patent: July 13, 2004
    Assignee: Luxon Energy Devices Corporation
    Inventors: Lih-Ren Shiue, Chun-Shen Cheng, Jsung-His Chang, Li-Ping Li, Wan-Ting Lo, Kun-Fu Huang
  • Patent number: 6680548
    Abstract: A concise electronic timer is composed of an adjustable resistor, a supercapacitor and an electromagnetic relay. After a main power is turned off, electricity supplied from the capacitor to the relay will extend or actuate the operation of a load until the discharge of the capacitor is over. Incorporating the resistor with the other two elements, the discharge time of the capacitor can be altered linearly by the resistor, therefore, a linear arrangement of delay extension and time of activation is attained. The simple, compact and economical timer can be used for indoor and outdoor illumination, monitoring security systems, as well as actuating systems.
    Type: Grant
    Filed: November 20, 2001
    Date of Patent: January 20, 2004
    Assignee: Luxon Energy Devices Corporation
    Inventors: Lin-Ren Shiue, Dien-Shi Wu, Ching-Wen Chao, Li-Ping Li, Ming-Fang Hsieh, Hsing-Chen Chung, Wan-Ting Lo
  • Patent number: 6579327
    Abstract: A method of manufacturing a cylindrical high voltage supercapacitor. An anode and a cathode are provided. At least one bipolar electrode is interposed between the anode and the cathode, and a separator is intervened in each pair of the above electrodes. The anode, the cathode, the bipolar electrode and the separator, as placed in the above order, are wound concentrically into a roll, so as to form the cylindrical high voltage supercapacitor.
    Type: Grant
    Filed: September 6, 2002
    Date of Patent: June 17, 2003
    Assignee: Luxon Energy Devices Corporation
    Inventors: Lih-Ren Shiue, Li-Ping Li, Hsing-Chen Chung, Wan-Ting Lo
  • Publication number: 20030094858
    Abstract: A concise electronic timer is composed of an adjustable resistor, a supercapacitor and an electromagnetic relay. After a main power is turned off, electricity supplied from the capacitor to the relay will extend or actuate the operation of a load until the discharge of the capacitor is over. Incorporating the resistor with the other two elements, the discharge time of the capacitor can be altered linearly by the resistor, therefore, a linear arrangement of delay extension and time of activation is attained. The simple, compact and economical timer can be used for indoor and outdoor illumination, monitoring security systems, as well as actuating systems.
    Type: Application
    Filed: November 20, 2001
    Publication date: May 22, 2003
    Inventors: LIH-REN Shiue, Dien-Shi Wu, Ching-Wen Chao, Li-Ping Li, Ming-Fang Hsieh, Hsing-Chen Chung, Wan-Ting Lo
  • Patent number: 6510043
    Abstract: A method of manufacturing a cylindrical high voltage supercapacitor. An anode and a cathode are provided. At least one bipolar electrode is interposed between the anode and the cathode, and a separator is intervened in each pair of the above electrodes. The anode, the cathode, the bipolar electrode and the separator, as placed in the above order, are wound concentrically into a roll, so as to form the cylindrical high voltage supercapacitor.
    Type: Grant
    Filed: February 7, 2002
    Date of Patent: January 21, 2003
    Assignee: Luxon Energy Devices Corporation
    Inventors: Lin-Ren Shiue, Dien-Shi Wu, Ching-Wen Chao, Li-Ping Li, Ming-Fang Hsieh, Hsing-Chen Chung, Wan-Ting Lo
  • Patent number: 6462935
    Abstract: A free-standing flow-through capacitor (FTC) is constructed by concentrically winding two electrodes and two dividers into a hollow-center roll. A liquid-feeding pipe is inserted to the central opening for delivering fluids to the FTC. Nanoparticles of hydrated iron compound with Fe3O4 as the main component or its composite powders are used as the active materials for the electrodes. With channels crated by the dividers assembled in the roll, fluids injected from the feed pipe are confined inside the FTC, and flow outwardly and transversely through the entire length of the electrodes. Under an application of a low DC voltage to the electrodes, charged species are adsorbed and removed from the treated liquids as soon as they are in contact with the electrodes. Capacitive deionization using FTC of the present invention is applicable to waste-streams reduction, water purification and desalination at low costs and easy operation.
    Type: Grant
    Filed: September 7, 2001
    Date of Patent: October 8, 2002
    Assignee: Lih-Ren Shiue
    Inventors: Lih-Ren Shiue, Chia-Chann Shiue, S-Yen Wang, Fei-Chen Hsieh, Chin-Hui Lee, Wan-Ting Lo, Yu-His Hsieh