Patents by Inventor Wang-An Hu

Wang-An Hu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOMASK HAVING HAZE REDUCTION LAYER
    Publication number: 20080044740
    Abstract: A photomask is fabricated to have a patterned surface and a transparent layer formed on the patterned surface.
    Type: Application
    Filed: August 21, 2006
    Publication date: February 21, 2008
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Jiin-Hong Lin, Chin-Wang Hu, Ming-Tao Ho
  • Cleaning process for phase shift masks
    Patent number: 6841311
    Abstract: A new sequence and chemical composition for cleaning the surface of a halftone shift masks that use MoSiON as shifter material is provided. For purposes of repair or rework, the pellicle is removed from the mask so that the mask can be accessed. After the rework or repair has been completed, a new clean process is performed, for the new clean process the sequence of steps that is conventionally performed has been modified. After the new clean process has been completed, the pellicle is reinstalled over the surface of the mask.
    Type: Grant
    Filed: March 15, 2002
    Date of Patent: January 11, 2005
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Same-Ting Chen, Cheng-Shien Lee, Chin-Wang Hu, Chieh-Yuan Cheng, Hsiang-Chien Hsu, Tzy-Ying Lin, Wen-Rong Huang
  • Whole new mask repair method
    Publication number: 20040224237
    Abstract: A method for repairing a defective photomask having contained therein a minimum of one defect first provides forming a masking layer upon the defective photomask such as to leave exposed the minimum of one defect. Within the invention the minimum of one defect within the defective photomask may be repaired while employing the masking layer as a defect repair masking layer, to thus form a repaired photomask from the defective photomask. The method provides for efficient repairing of the defective photomask, absent transparent substrate damage.
    Type: Application
    Filed: May 8, 2003
    Publication date: November 11, 2004
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tzy-Ying Lin, Chue-San Yoo, Chin-Wang Hu, Ming-Chih Hsieh, Ming-Feng Ho, Cheng-Hung Kung