Patents by Inventor Wang Cheng

Wang Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250180984
    Abstract: A method includes: performing a first inspection on a reticle in a reticle pod, the reticle pod including a sealed space to accommodate the reticle, and the reticle pod further comprising an inspection window, wherein the first inspection is performed through the inspection window with the sealed space keeping sealed; and moving the reticle out of the reticle pod for performing a first operation of a semiconductor device using the reticle in response to determining no defect found on the reticle.
    Type: Application
    Filed: February 4, 2025
    Publication date: June 5, 2025
    Inventors: WANG CHENG SHIH, HAO-MING CHANG, CHUNG-YANG HUANG, CHENG-MING LIN
  • Patent number: 12248245
    Abstract: A method includes: inspecting a reticle in a reticle pod, the reticle pod including a sealed space to accommodate the reticle, and the reticle pod further comprising a window arranged on an upper surface of the reticle pod, wherein the inspecting is performed through the window; and moving the reticle out of the reticle pod for performing a lithography operation using the reticle.
    Type: Grant
    Filed: July 30, 2023
    Date of Patent: March 11, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Wang Cheng Shih, Hao-Ming Chang, Chung-Yang Huang, Cheng-Ming Lin
  • Patent number: 12087579
    Abstract: A method for forming a semiconductor device includes receiving a substrate having a first opening and a second opening formed thereon, wherein the first opening has a first width, and the second opening has a second width less than the first width; forming a protecting layer to cover the first opening and expose the second opening; performing a wet etching to widen the second opening with an etchant, wherein the second opening has a third width after the performing of the wet etching, and the third width of the second opening is substantially equal to the first width of the first opening; and performing a photolithography to transfer the first opening and the second opening to a target layer.
    Type: Grant
    Filed: May 4, 2021
    Date of Patent: September 10, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chung-Yang Huang, Hao-Ming Chang, Ming Che Li, Yu-Hsin Hsu, Po-Cheng Lai, Kuan-Shien Lee, Wei-Hsin Lin, Yi-Hsuan Lin, Wang Cheng Shih, Cheng-Ming Lin
  • Patent number: 12073413
    Abstract: The present technology pertains to keeping track of a purchase status of a product and delivering pre-purchase product experiences prior to the purchase of the product and a post-purchase product experience after the purchase of the product. The present technology provides for a device to identify a product and to request a purchase experience that is both informative and useful based on the purchase status of the product.
    Type: Grant
    Filed: April 19, 2018
    Date of Patent: August 27, 2024
    Assignee: Apple Inc.
    Inventors: Jamie Wang Cheng, Christopher Matthew Webb, Trevor Jordan Sheridan, Ken Tunkhian Loh
  • Publication number: 20240128379
    Abstract: An electronic device includes: a substrate; and a transistor disposed on the substrate, wherein the transistor includes: a gate electrode; a semiconductor layer at least partially overlapping the gate electrode, wherein the semiconductor layer includes a first sub-semiconductor layer and a second sub-semiconductor layer disposed on the first sub-semiconductor layer, and the second sub-semiconductor layer includes indium, gallium and zinc; a drain electrode electrically connected to the semiconductor layer; and a source electrode electrically connected to the semiconductor layer, wherein in the second sub-semiconductor layer, an atomic percentage of indium is less than an atomic percentage of gallium, and the atomic percentage of gallium is less than an atomic percentage of zinc.
    Type: Application
    Filed: September 15, 2023
    Publication date: April 18, 2024
    Inventor: Wang-Cheng CHUNG
  • Publication number: 20230367207
    Abstract: A method includes: inspecting a reticle in a reticle pod, the reticle pod including a sealed space to accommodate the reticle, and the reticle pod further comprising a window arranged on an upper surface of the reticle pod, wherein the inspecting is performed through the window; and moving the reticle out of the reticle pod for performing a lithography operation using the reticle.
    Type: Application
    Filed: July 30, 2023
    Publication date: November 16, 2023
    Inventors: WANG CHENG SHIH, HAO-MING CHANG, CHUNG-YANG HUANG, CHENG-MING LIN
  • Patent number: 11796909
    Abstract: A method of manufacturing a reticle includes: disposing the reticle in a reticle pod, the reticle pod forming a sealed space to accommodate the reticle, and the reticle pod comprising a window arranged on an upper surface of the reticle pod and configured to allow a radiation at a predetermined wavelength to pass through; and performing an inspection operation on the reticle through the window.
    Type: Grant
    Filed: April 25, 2022
    Date of Patent: October 24, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Wang Cheng Shih, Hao-Ming Chang, Chung-Yang Huang, Cheng-Ming Lin
  • Publication number: 20230176384
    Abstract: A pair of projection glasses, a wearable projection apparatus, and a foldable optical engine are provided. The foldable optical engine includes a projection mechanism and a light emitting mechanism. A light input portion of the projection mechanism corresponds in position to a light output portion of the light emitting mechanism. The projection mechanism and the light emitting mechanism are pivotally connected to each other along a rotation axis so as to be rotatable relative to each other along the rotation axis. When the projection mechanism and the light emitting mechanism are rotated relative to each other to cause the light output portion to face toward the light input portion, the light emitting mechanism is configured to emit a light beam from the light output portion toward the light input portion, so as to allow the projection mechanism to receive the light beam for projecting an image light.
    Type: Application
    Filed: September 15, 2022
    Publication date: June 8, 2023
    Inventors: CHIH-HAN YEN, YU-YI CHIEN, KEN-WANG CHENG
  • Publication number: 20220260903
    Abstract: A method of manufacturing a reticle includes: disposing the reticle in a reticle pod, the reticle pod forming a sealed space to accommodate the reticle, and the reticle pod comprising a window arranged on an upper surface of the reticle pod and configured to allow a radiation at a predetermined wavelength to pass through; and performing an inspection operation on the reticle through the window.
    Type: Application
    Filed: April 25, 2022
    Publication date: August 18, 2022
    Inventors: WANG CHENG SHIH, HAO-MING CHANG, CHUNG-YANG HUANG, CHENG-MING LIN
  • Patent number: 11314164
    Abstract: The structure and methods of a reticle pod are provided. A reticle pod includes a base configured to support a reticle and a cover detachably coupled to the base. The cover includes a window that allows radiation at a wavelength between about 400 nm and about 700 nm to pass through with a transmittance of greater than 70%.
    Type: Grant
    Filed: December 31, 2019
    Date of Patent: April 26, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Wang Cheng Shih, Hao-Ming Chang, Chung-Yang Huang, Cheng-Ming Lin
  • Patent number: 11281278
    Abstract: A battery backup system includes a battery pack, a charger, a discharger, a voltage detection and control circuit, a first protection switch, a second protection switch and a third protection switch. The battery pack provides a backup power to a DC bus. The charger, connected to the battery pack, receives an external power. The discharger has an input end and an output end. The voltage detection and control circuit detects whether the voltage of the DC bus is greater than first or second voltage drop point. The first, the second and the third protection switches respectively are connected between the battery pack and the input end, between the DC bus and the output end, and between the charger and the input end. The first protection switch is turned on/off according to whether the voltage of the DC bus is less than or greater than the first voltage drop point.
    Type: Grant
    Filed: November 3, 2020
    Date of Patent: March 22, 2022
    Inventors: Ming-Wang Cheng, Yi-Pin Lee, Ching Hsieh
  • Publication number: 20220004241
    Abstract: A battery backup system includes a battery pack, a charger, a discharger, a voltage detection and control circuit, a first protection switch, a second protection switch and a third protection switch. The battery pack provides a backup power to a DC bus. The charger, connected to the battery pack, receives an external power. The discharger has an input end and an output end. The voltage detection and control circuit detects whether the voltage of the DC bus is greater than first or second voltage drop point. The first, the second and the third protection switches respectively are connected between the battery pack and the input end, between the DC bus and the output end, and between the charger and the input end. The first protection switch is turned on/off according to whether the voltage of the DC bus is less than or greater than the first voltage drop point.
    Type: Application
    Filed: November 3, 2020
    Publication date: January 6, 2022
    Inventors: Ming-Wang CHENG, Yi-Pin LEE, Ching HSIEH
  • Publication number: 20210255542
    Abstract: A method for forming a semiconductor device includes receiving a substrate having a first opening and a second opening formed thereon, wherein the first opening has a first width, and the second opening has a second width less than the first width; forming a protecting layer to cover the first opening and expose the second opening; performing a wet etching to widen the second opening with an etchant, wherein the second opening has a third width after the performing of the wet etching, and the third width of the second opening is substantially equal to the first width of the first opening; and performing a photolithography to transfer the first opening and the second opening to a target layer.
    Type: Application
    Filed: May 4, 2021
    Publication date: August 19, 2021
    Inventors: CHUNG-YANG HUANG, HAO-MING CHANG, MING CHE LI, YU-HSIN HSU, PO-CHENG LAI, KUAN-SHIEN LEE, WEI-HSIN LIN, YI-HSUAN LIN, WANG CHENG SHIH, CHENG-MING LIN
  • Publication number: 20210202287
    Abstract: The structure and methods of a reticle pod are provided. A reticle pod includes a base configured to support a reticle and a cover detachably coupled to the base. The cover includes a window that allows radiation at a wavelength between about 400 nm and about 700 nm to pass through with a transmittance of greater than 70%.
    Type: Application
    Filed: December 31, 2019
    Publication date: July 1, 2021
    Inventors: WANG CHENG SHIH, HAO-MING CHANG, CHUNG-YANG HUANG, CHENG-MING LIN
  • Patent number: 11036129
    Abstract: A method for forming a photomask includes receiving a substrate having a first layer formed thereon, wherein a patterned second layer exposing portions of the first layer is disposed over the substrate, removing the exposed portions of the first layer through the patterned second layer to form a plurality of openings in the first layer, removing the patterned second layer, and performing a wet etching to remove portions of the first layer to widen the plurality of openings with an etchant. The etchant is in contact with a top surface of the first layer and sidewalls of the plurality of openings. Each of the plurality of openings has a first width prior to the performing of the wet etching and a second width after the performing of the wet etching. The second width is greater than the first width.
    Type: Grant
    Filed: December 6, 2018
    Date of Patent: June 15, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chung-Yang Huang, Hao-Ming Chang, Ming Che Li, Yu-Hsin Hsu, Po-Cheng Lai, Kuan-Shien Lee, Wei-Hsin Lin, Yi-Hsuan Lin, Wang Cheng Shih, Cheng-Ming Lin
  • Patent number: 10683862
    Abstract: A housing for use in high-pressure fluid applications, and in particular a structure for the fluid end of a multi-cylinder reciprocating pump used in oilfield, wherein the structure includes features such as ruled surfaces and increased sidewall thickness to improve resistance to stress applied and has an extended the service life.
    Type: Grant
    Filed: May 29, 2018
    Date of Patent: June 16, 2020
    Assignee: SERVA GROUP LLC
    Inventors: Bill Ladd, Tang Jun, Wang Cheng Cai
  • Publication number: 20200041894
    Abstract: A method for forming a photomask includes receiving a substrate having a first layer formed thereon, wherein a patterned second layer exposing portions of the first layer is disposed over the substrate, removing the exposed portions of the first layer through the patterned second layer to form a plurality of openings in the first layer, removing the patterned second layer, and performing a wet etching to remove portions of the first layer to widen the plurality of openings with an etchant. The etchant is in contact with a top surface of the first layer and sidewalls of the plurality of openings. Each of the plurality of openings has a first width prior to the performing of the wet etching and a second width after the performing of the wet etching. The second width is greater than the first width.
    Type: Application
    Filed: December 6, 2018
    Publication date: February 6, 2020
    Inventors: CHUNG-YANG HUANG, HAO-MING CHANG, MING CHE LI, YU-HSIN HSU, PO-CHENG LAI, KUAN-SHIEN LEE, WEI-HSIN LIN, YI-HSUAN LIN, WANG CHENG SHIH, CHENG-MING LIN
  • Patent number: 10483285
    Abstract: An element substrate and a display device are provided. The element substrate includes a substrate and an element layer, and the element layer is disposed on the substrate, wherein the element layer includes a plurality of active elements, each of the active elements includes a gate, a gate insulating layer, a metal oxide semiconductor layer, a source and a drain. The gate is disposed on the substrate. The gate insulating layer is disposed on the substrate and overlaps the gate. The metal oxide semiconductor layer is disposed on the gate insulating layer. The source and the drain are disposed on the metal oxide semiconductor layer, wherein the source and the drain respectively include a first layer and a second layer, the first layer is between the second layer and the metal oxide semiconductor layer, and the material of the first layer includes titanium nitride.
    Type: Grant
    Filed: May 25, 2017
    Date of Patent: November 19, 2019
    Assignee: Innolux Corporation
    Inventor: Wang-Cheng Chung
  • Publication number: 20190325456
    Abstract: The present technology pertains to keeping track of a purchase status of a product and delivering pre-purchase product experiences prior to the purchase of the product and a post-purchase product experience after the purchase of the product. The present technology provides for a device to identify a product and to request a purchase experience that is both informative and useful based on the purchase status of the product.
    Type: Application
    Filed: April 19, 2018
    Publication date: October 24, 2019
    Inventors: Jamie Wang Cheng, Christopher Matthew Webb, Trevor Jordan Sheridan, Ken Tunkhian Loh
  • Patent number: 10348034
    Abstract: An electrical connector assembly includes a first connector and a second connector inserted to a front of the first connector. The second connector has a casing. A latch portion is protrudingly provided above the casing. The first connector includes a shell. A locking arm is pivoted to the shell by a pivoting portion, and is provided with a buckling portion for buckling the latch portion. The locking arm includes at least one first position limiting portion and a second position limiting portion in front of the buckling portion. In a separation process of the first and second connectors, the locking arm is actuated, the buckling portion is detached from the latch portion and moves backward, and the latch portion firstly stops the first position limiting portion. After the latch portion is detached from the first position limiting portion, the latch portion stops the second position limiting portion from moving backward.
    Type: Grant
    Filed: August 31, 2018
    Date of Patent: July 9, 2019
    Assignee: LOTES CO., LTD
    Inventors: Wen Chang Chang, Si Nai Peng, Hua Yin Dai, Wang Cheng Shen