Patents by Inventor Wang-Cheol Zin

Wang-Cheol Zin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Immersion photolithography monitoring
    Patent number: 7777894
    Abstract: A method and apparatus are provided for monitoring an immersion photolithography process, the method including supplying an immersion fluid having an initial refractive index, performing photolithography using the supplied immersion fluid, recovering the used immersion fluid; and the apparatus including a light source, one or more fluid passageways disposed relative to the light source, and a light detector disposed on an opposite side of the fluid passageways relative to the light source for measuring a refractive index of a fluid in the fluid passageways.
    Type: Grant
    Filed: March 1, 2007
    Date of Patent: August 17, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jae-Hyun Kim, Wang-Cheol Zin, Jung-Hoon Kim
  • IMMERSION PHOTOLITHOGRAPHY MONITORING
    Publication number: 20080030693
    Abstract: A method and apparatus are provided for monitoring an immersion photolithography process, the method including supplying an immersion fluid having an initial refractive index, performing photolithography using the supplied immersion fluid, recovering the used immersion fluid; and the apparatus including a light source, one or more fluid passageways disposed relative to the light source, and a light detector disposed on an opposite side of the fluid passageways relative to the light source for measuring a refractive index of a fluid in the fluid passageways.
    Type: Application
    Filed: March 1, 2007
    Publication date: February 7, 2008
    Inventors: Jae-Hyun KIM, Wang-Cheol Zin, Jung-Hoon Kim