Patents by Inventor Wang Chun-Chieh

Wang Chun-Chieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High-K metal gate process and device
    Patent number: 10629700
    Abstract: An embodiment is a method of semiconductor processing. The method includes depositing a high-k gate dielectric layer over a semiconductor fin. A barrier layer is deposited over the high-k gate dielectric layer. A silicon passivation layer is deposited over the barrier layer. A nitrogen treatment is performed on the silicon passivation layer. A capping layer is deposited over the silicon passivation layer. The capping layer is annealed.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: April 21, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chien-Shun Liao, Huai-Tei Yang, Wang Chun-Chieh, Yueh-Ching Pai, Chun-I Wu