Patents by Inventor Wang Yuanli

Wang Yuanli has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems, methods and solutions for chemical polishing of GaAs wafers
    Patent number: 8318042
    Abstract: Chemical polishing solutions and methods are disclosed for the chemical polishing of GaAs wafers. An exemplary chemical polishing solution consistent with the innovations herein may comprise dichloroisocyanurate, sulfonate, acid pyrophosphate, bicarbonate and carbonate. An exemplary chemical polishing method may comprise polishing a wafer in a chemical polishing apparatus in the presence of such a chemical polishing solution. Chemical polishing solutions and methods herein make it possible, for example, to improve wafer quality, decrease costs, and/or reduce environmental pollution.
    Type: Grant
    Filed: September 29, 2009
    Date of Patent: November 27, 2012
    Assignee: AXT Inc.
    Inventors: Tan Kaixie, Gu Yan, Wang Yuanli
  • Systems, methods and solutions for chemical polishing of GaAs wafers
    Publication number: 20100176336
    Abstract: Chemical polishing solutions and methods are disclosed for the chemical polishing of GaAs wafers. An exemplary chemical polishing solution consistent with the innovations herein may comprise dichloroisocyanurate, sulfonate, acid pyrophosphate, bicarbonate and carbonate. An exemplary chemical polishing method may comprise polishing a wafer in a chemical polishing apparatus in the presence of such a chemical polishing solution. Chemical polishing solutions and methods herein make it possible, for example, to improve wafer quality, decrease costs, and/or reduce environmental pollution.
    Type: Application
    Filed: September 29, 2009
    Publication date: July 15, 2010
    Applicant: AXT, INC.
    Inventors: Tan Kaixie, Gu Yan, Wang Yuanli