Patents by Inventor Wanjun DENG

Wanjun DENG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Special cell general database and method for establishing the same and pattern correction method
    Patent number: 12748910
    Abstract: The present disclosure discloses a special cell general database, a method for establishing the special cell general database and a pattern correction method. The pattern correction method includes: providing a to-be-corrected layout including a to-be-corrected region and a to-be-corrected special cell structure region; acquiring a to-be-corrected minimum repeating cell pattern in the to-be-corrected special cell structure region; providing a special cell general database; acquiring an information of a cell correction pattern corresponding to the to-be-corrected minimum repeating cell pattern in the special cell general database; performing an optical proximity correction on the to-be-corrected region to acquire an information of a second correction pattern; acquiring a correction layout according to the information of the second correction pattern and the information of the cell correction pattern. The present disclosure can improve a correction efficiency of the pattern correction method.
    Type: Grant
    Filed: July 28, 2023
    Date of Patent: September 29, 2026
    Assignees: Hua Hong Semiconductor (Wuxi) Limited, Shanghai Huahong Grace Semiconductor Manufacturing Corporation
    Inventors: Wanjun Deng, Xiaoliang Jin, Jiaji Feng
  • Special Cell General Database and Method for Establishing the Same and Pattern Correction Method
    Publication number: 20240054275
    Abstract: The present disclosure discloses a special cell general database, a method for establishing the special cell general database and a pattern correction method. The pattern correction method includes: providing a to-be-corrected layout including a to-be-corrected region and a to-be-corrected special cell structure region; acquiring a to-be-corrected minimum repeating cell pattern in the to-be-corrected special cell structure region; providing a special cell general database; acquiring an information of a cell correction pattern corresponding to the to-be-corrected minimum repeating cell pattern in the special cell general database; performing an optical proximity correction on the to-be-corrected region to acquire an information of a second correction pattern; acquiring a correction layout according to the information of the second correction pattern and the information of the cell correction pattern. The present disclosure can improve a correction efficiency of the pattern correction method.
    Type: Application
    Filed: July 28, 2023
    Publication date: February 15, 2024
    Inventors: Wanjun DENG, Xiaoliang Jin, Jiaji Feng