Abstract: A method for wireless communication performed by a user equipment (UE) is provided. The method includes receiving, from a base station (BS), a Radio Resource Control (RRC) configuration to configure a first semi-persistent scheduling (SPS) physical downlink shared channel (PDSCH) and generating first uplink control information (UCI) in response to the first SPS PDSCH, where the RRC configuration includes a first parameter that indicates a priority of the first UCI.

Abstract: The present invention includes an apparatus having a container (30) for storing liquid and holding a semiconductor wafer (32). The apparatus also includes a transducer (36) and a sonic generator (34). The transducer is attached to the container to transfer megasonic waves generated by the sonic generator into the container. A drain (38) releases the liquid from the container. At least one outlet opening (40) is set at the bottom of the container. Liquid inlets (42) provide the liquid to the container. Nozzles (44), connected to the liquid inlets, spray the liquid on the surface of the wafer. A liquid supply element (46) provides liquid to the container. Drive means (54), connected to the outlet opening of the container, circulates the liquid. A filter (56) is connected between the drive means and the liquid supply element to filter out residue in the liquid.

Abstract: A system for cleaning and etching a wafer. The system includes few buffer tanks to complete the cleaning and etching process. The system further includes a loader for loading the wafer, each buffer tank storing a unique chemical solution. At least one process tank is provided for retaining the loaded wafer, and is coupled to the buffer tank to receive the chemical solution from said buffer tank and to perform the cleaning and etching of the wafer.