Patents by Inventor Wantinee VIRATYAPORN

Wantinee VIRATYAPORN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11193013
    Abstract: The present invention relates to polymer composition comprising 100 parts by weight of halogen containing polymer, 10 to 70 parts by weight of plasticizer, 2 to 10 parts by weight of stabilizer, 1-15 parts by weight of a layered double hydroxide (LDH) having the formula (I) wherein M and M? are different and each is at least one metal cation, z=1 or 2; y=3 or 4, 0<x<0.9, b=0 to 10, c=0 to 10, X is an anion, n is the charge on the anion, and a=z(1?x)+xy?2; solvent is organic solvent with a hydrogen bond donor or acceptor function; as well as an article comprising the polymer composition. [Mz+1?xM?y+x(OH)2]a+(Xn?)a/n.bH2O.
    Type: Grant
    Filed: October 19, 2017
    Date of Patent: December 7, 2021
    Assignee: SCG Chemicals Co., Ltd.
    Inventors: Renuka Teansawang, Wantinee Viratyaporn, Anchalee Wongariyakawee
  • Publication number: 20190300692
    Abstract: The present invention relates to polymer composition comprising 100 parts by weight of halogen containing polymer, 10 to 70 parts by weight of plasticizer, 2 to 10 parts by weight of stabilizer, 1-15 parts by weight of a layered double hydroxide (LDH) having the formula (I) wherein M and M? are different and each is at least one metal cation, z=1 or 2; y=3 or 4, 0<x<0.9, b=0 to 10, c=0 to 10, X is an anion, n is the charge on the anion, and a=z(1?x)+xy?2; solvent is organic solvent with a hydrogen bond donor or acceptor function; as well as an article comprising the polymer composition. [Mz+1?xM?)+x(OH)2]a+(Xn?)a/n.bH2O.
    Type: Application
    Filed: October 19, 2017
    Publication date: October 3, 2019
    Applicant: SCG Chemicals Co., Ltd.
    Inventors: Renuka TEANSAWANG, Wantinee VIRATYAPORN, Anchalee WONGARIYAKAWEE