Abstract: A display substrate, manufacturing method thereof, and a display device. The display substrate includes a base substrate and a semiconductor layer and a conductive layer on the base substrate. The semiconductor layer includes a channel region and a doped region pattern of a transistor; the conductive layer includes a data line, and a first electrode and a second electrode of the transistor. An extension direction of an overlapping portion of the semiconductor layer with the data line is the same as an extension direction of the data line, and the semiconductor layer includes a first protrusion portion, and a size of an interval between an edge of the first protrusion portion away from the data line and the edge of the data line is greater than 0 and smaller than 3.0 microns.

Abstract: A method for manufacturing a thin film transistor is provided. The method includes: sequentially forming a semiconductor thin film, a patterned source-drain layer and a conductive thin film on a base substrate, performing a patterning process on the semiconductor thin film and the conductive thin film simultaneously to acquire an active layer and a protective electrode layer, and processing the protective electrode layer such that a portion of the protective electrode layer covering the source is insulated from a portion of the protective electrode layer covering the drain.