Patents by Inventor Warren J. MoberlyChan

Warren J. MoberlyChan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers
    Patent number: 8221595
    Abstract: The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing an ion beam at the selected regions, exposing the structure at the selected regions. A material layer is then deposited on top of the solid condensate layer and the exposed structure at the selected regions. Then the solid condensate layer and regions of the material layer that were deposited on the solid condensate layer are removed, leaving a patterned material layer on the structure.
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: July 17, 2012
    Assignee: President and Fellows of Harvard College
    Inventors: Daniel Branton, Jene A Golovchenko, Gavin M King, Warren J MoberlyChan, Gregor M Schurmann
  • Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers
    Publication number: 20090173716
    Abstract: The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing an ion beam at the selected regions, exposing the structure at the selected regions. A material layer is then deposited on top of the solid condensate layer and the exposed structure at the selected regions. Then the solid condensate layer and regions of the material layer that were deposited on the solid condensate layer are removed, leaving a patterned material layer on the structure.
    Type: Application
    Filed: March 12, 2009
    Publication date: July 9, 2009
    Applicant: President and Fellows of Harvard College
    Inventors: Daniel Branton, Jene A. Golovchenko, Gavin M. King, Warren J. MoberlyChan, Gregor M. Schurmann
  • Lift-off patterning processing employing energetically-stimulated local removal of solid-condensed-gas layers
    Patent number: 7524431
    Abstract: The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing a beam of energy at the selected regions, exposing the structure at the selected regions. A material layer is then deposited on top of the solid condensate layer and the exposed structure at the selected regions. Then the solid condensate layer and regions of the material layer that were deposited on the solid condensate layer are removed, leaving a patterned material layer on the structure.
    Type: Grant
    Filed: December 9, 2004
    Date of Patent: April 28, 2009
    Assignee: President and Fellows of Harvard College
    Inventors: Daniel Branton, Jene A. Golovchenko, Gavin M. King, Warren J. MoberlyChan, Gregor M. Schürmann