Patents by Inventor Wasaburo Kawai

Wasaburo Kawai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive high polymer, easily insolubilized when cross-linked by light, a method for preparation thereof, and a composition thereof
    Patent number: 4560640
    Abstract: A photosensitive high polymer which is a random copolymer comprising a structural unit represented by the formula ##STR1## wherein A is ##STR2## wherein R is hydrogen, methyl or methoxy and a structural unit represented by the formula ##STR3## the polymer containing about 5 to about 80 mole % of structural units of the formula (I) and having a polymerization degree of about 300 to about 3000, a process for preparing the photosensitive high polymer and a composition comprising the photosensitive high polymer and solvent.
    Type: Grant
    Filed: June 11, 1984
    Date of Patent: December 24, 1985
    Assignees: Director-General of Agency of Industrial Science & Technology, Sanbo Chemical Industries Co., Ltd.
    Inventors: Taichi Ichihashi, Wasaburo Kawai, Tadashi Naraoka, Takateru Asano
  • Photosensitive polyesters
    Patent number: 4108844
    Abstract: Polyesters having as the repeating unit thereof a unit of the generic formula: ##STR1## (wherein, X stands for a hydrogen atom, a lower alkyl group, a phenyl group or a cinnamoyl-oxymethyl group, Y for a hydrogen atom or a lower alkyl group and R for --CH.dbd.CH--, --CH.sub.2 --CH.sub.2 -- or O-phenylene group) are new polyesters possessed of photosensitivity. These photosensitive polyesters are produced by the reaction of acid anhydrides with glycidyl cinnamate.
    Type: Grant
    Filed: February 22, 1977
    Date of Patent: August 22, 1978
    Assignee: Agency of Industrial Science & Technology
    Inventor: Wasaburo Kawai