Patents by Inventor Wataru Ando
Wataru Ando has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9694107Abstract: The present invention can be used for actual implantation surgery without a scaffold. The present invention provides a synthetic tissue or complex which can be produced by culture and has a high level of differentiation ability. The present invention also provides a therapy and medicament for repairing and/or regenerating tissue using replacement and covering. By culturing cells under specific culture conditions such that medium contains an extracellular matrix synthesis promoting agent, the cells are organized and are easily detached from a culture dish. The present invention was achieved by finding such a phenomenon. In addition, the self contraction of the tissue can be regulated by culturing the tissue in a suspended manner. Therefore, it is possible to regulate the three-dimensional shape of the tissue.Type: GrantFiled: May 26, 2016Date of Patent: July 4, 2017Assignee: Two Cells, Co., Ltd.Inventors: Norimasa Nakamura, Hideki Yoshikawa, Wataru Ando
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Publication number: 20160256608Abstract: The present invention can be used for actual implantation surgery without a scaffold. The present invention provides a synthetic tissue or complex which can be produced by culture and has a high level of differentiation ability. The present invention also provides a therapy and medicament for repairing and/or regenerating tissue using replacement and covering. By culturing cells under specific culture conditions such that medium contains an extracellular matrix synthesis promoting agent, the cells are organized and are easily detached from a culture dish. The present invention was achieved by finding such a phenomenon. In addition, the self contraction of the tissue can be regulated by culturing the tissue in a suspended manner. Therefore, it is possible to regulate the three-dimensional shape of the tissue.Type: ApplicationFiled: May 26, 2016Publication date: September 8, 2016Inventors: Norimasa Nakamura, Hideki Yoshikawa, Wataru Ando
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Patent number: 9370606Abstract: The present invention can be used for actual implantation surgery without a scaffold. The present invention provides a synthetic tissue or complex which can be produced by culture and has a high level of differentiation ability. The present invention also provides a therapy and medicament for repairing and/or regenerating tissue using replacement and covering. By culturing cells under specific culture conditions such that medium contains an extracellular matrix synthesis promoting agent, the cells are organized and are easily detached from a culture dish. The present invention was achieved by finding such a phenomenon. In addition, the self contraction of the tissue can be regulated by culturing the tissue in a suspended manner. Therefore, it is possible to regulate the three-dimensional shape of the tissue.Type: GrantFiled: February 16, 2007Date of Patent: June 21, 2016Assignee: Two Cells, Co., Ltd.Inventors: Norimasa Nakamura, Hideki Yoshikawa, Wataru Ando
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Publication number: 20090263840Abstract: The present invention provides an antibody capable of specifically recognizing the same amino acid sequence as an antigenic determinant of mouse monoclonal antibody MAB-ME-16F4.3 (FERM BP-10329), and an antibody of capable of specifically recognizing the same amino acid sequence as an antigenic determinant of mouse monoclonal antibody MAB-ME-12C9.2 (FERM BP-10328), and methods of risk prediction of bone fracture and/or diagnosis of osteoporosis by detecting a MEPE-derived molecule in a biological sample using the above-mentioned two kinds of antibodies.Type: ApplicationFiled: September 14, 2006Publication date: October 22, 2009Inventors: Jun Hashimoto, Akihide Nampei, Wataru Ando, Tomofumi Kurokawa, Tsutomu Oshima
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Publication number: 20080004713Abstract: The present invention can be used for actual implantation surgery without a scaffold. The present invention provides a synthetic tissue or complex which can be produced by culture and has a high level of differentiation ability. The present invention also provides a therapy and medicament for repairing and/or regenerating tissue using replacement and covering. By culturing cells under specific culture conditions such that medium contains an extracellular matrix synthesis promoting agent, the cells are organized and are easily detached from a culture dish. The present invention was achieved by finding such a phenomenon. In addition, the self contraction of the tissue can be regulated by culturing the tissue in a suspended manner. Therefore, it is possible to regulate the three-dimensional shape of the tissue.Type: ApplicationFiled: February 16, 2007Publication date: January 3, 2008Inventors: Norimasa Nakamura, Hideki Yoshikawa, Wataru Ando
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Patent number: 5622800Abstract: A photosensitive member having stable electrophotographic characteristics can be constituted by an electroconductive support and a photosensitive layer disposed thereon and containing a novel fullerene compound having an organosilicon group as a charge-transporting substance. The fullerene compound may preferably have a polyhedral structure, particularly that of Buckminsterfullerene (C.sub.60) and be represented by the formula: C.sub.60 (A).sub.n . . . (2), wherein A denotes an organosilicon group represented by the formula: ##STR1## (wherein R.sub.1-1 and R.sub.1-2 independently denote a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted silyl group, a substituted or unsubstituted germyl group, a halogen atom, or a group constituting a substituted or unsubstituted ring by a mutual combination of R.sub.1-1 and R.sub.Type: GrantFiled: September 14, 1995Date of Patent: April 22, 1997Assignee: Canon Kabushiki KaishaInventors: Wataru Ando, Takeshi Akasaka, Hajime Miyazaki
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Patent number: 5621130Abstract: A photosensitive member having stable electrophotographic characteristics can be constituted by an electroconductive support and a photosensitive layer disposed thereon and containing a novel fullerene compound having an organosilicon group as a charge-transporting substance. The fullerene compound may preferably have a polyhedral structure, particularly that of Buckminsterfullerene (C.sub.60) and be represented by the formula: C.sub.60 (A).sub.n . . . (2), wherein A denotes an organosilicon group represented by the formula: ##STR1## (wherein R.sub.1-1 and R.sub.1-2 independently denote a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted silyl group, a substituted or unsubstituted germyl group, a halogen atom, or a group constituting a substituted or unsubstituted ring by a mutual combination of R.sub.1-1 and R.sub.Type: GrantFiled: October 27, 1993Date of Patent: April 15, 1997Assignee: Canon Kabushiki KaishaInventors: Wataru Ando, Takeshi Akasaka, Shigeru Nagase, Kaoru Kobayashi, Hajime Miyazaki
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Patent number: 4931371Abstract: An electrophotographic photosensitive member comprises a photosensitive layer on a conductive support, wherein said photosensitive layer contains a compound, having structures (A) and (B) together in its structural formula and wherein said photosensitive layer contains a thioether compound represented by Formula (VI).Type: GrantFiled: November 21, 1988Date of Patent: June 5, 1990Assignee: Canon Kabushiki KaishaInventors: Masakazu Matsumoto, Shozo Ishikawa, Wataru Ando, Toshihiro Kikuchi, Itaru Yamazaki
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Patent number: 4546008Abstract: A method for forming a deposition film comprises applying an excitation energy to a silane compound (SiOA) in a gaseous state having at least one substituent (OA) of the formula of --OC.sub.a H.sub.b X.sub.c where b+c=2a+1, a is a positive integer, b and c are zero or a positive integer, provided that b and c are not simultaneously zero and X is halogen atom to form a deposition film containing silicon atom on a substrate.A method for forming a deposition film comprises applying an excitation energy to a silane compound (SiA) in a gaseous state having 2-6 silicon atoms, having at least one substituent (A) of the formula of --C.sub.a H.sub.b X.sub.Type: GrantFiled: November 2, 1984Date of Patent: October 8, 1985Assignee: Canon Kabushiki KaishaInventors: Keishi Saitoh, Wataru Ando
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Patent number: 4259524Abstract: A method for the oxidation of alicyclic hydrocarbons having substituent groups by the use of liquid nitrogen dioxide (N.sub.2 O.sub.4).Type: GrantFiled: July 9, 1979Date of Patent: March 31, 1981Assignee: K.K. Pollution Preventing Research LaboratoryInventors: Wataru Ando, Ichiro Nakaoka
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Patent number: 4177121Abstract: This invention provides a method of producing N-formylamine by photosensitized oxygenation of aldehyde-amine mixture. According to this invention, N-formylamine can be produced directly by photosensitized oxygenation of an aldehyde-amine mixture without separating intermediate enamine. In this invention, enamine is not used as a reactant, i.e. starting material, but a mixture of the aldehyde and amine is used as a reactant.Type: GrantFiled: July 21, 1978Date of Patent: December 4, 1979Assignee: K. K. Pollution Preventing Research LaboratoryInventors: Wataru Ando, Kazuo Watanabe
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Patent number: 4105520Abstract: A method for producing adipic acid and precursor thereof which comprises oxidizing cyclohexane with nitrogen dioxide under irradiation of visible ray or ultraviolet ray in the presence of oxygen is incorporated with a method for producing adipic acid which comprises oxidizing said precursor with liquid nitrogen dioxide N.sub.2 O.sub.4 at a temperature below the boiling point thereof. It should be noted that the precursor means cyclohexanone, cyclohexanol, cyclohexylnitrite, cyclohexylnitrate or the mixture thereof.Type: GrantFiled: April 7, 1977Date of Patent: August 8, 1978Assignee: Kabushiki Kaisha Pollution Preventing Research LaboratoryInventors: Wataru Ando, Ichiro Nakaoka
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Patent number: 4104145Abstract: A method for the nitration of benzene by the use of nitrogen dioxide under irradiation of visible ray or ultraviolet ray in the presence of oxygen.Type: GrantFiled: March 28, 1977Date of Patent: August 1, 1978Assignee: Kabushiki Kaisha Pollution Preventing Research LaboratoryInventors: Wataru Ando, Ichiro Nakaoka