Patents by Inventor Wataru Kusaki

Wataru Kusaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9410951
    Abstract: There is disclosed a method for producing a substrate for making a microarray, the method comprising: at least, a step of forming a monomolecular film having orientated oxysilanyl groups toward an outmost surface on the substrate; and a step of forming a monomolecular film having orientated amino groups toward an outmost surface on the substrate by applying a solution containing a diamine compound to the oxysilanyl groups. There can be provided a method for producing a substrate for making a microarray in which density and orientation of amino groups orientated toward an outmost surface are controllable, and in addition, there is no delamination of a monomolecular film formed on the substrate.
    Type: Grant
    Filed: July 17, 2009
    Date of Patent: August 9, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Wataru Kusaki, Takeshi Kinsho, Toshinobu Ishihara
  • Patent number: 9034661
    Abstract: There is disclosed a method for producing a molecule immobilizing substrate, comprising at least the steps of: forming, on a substrate, a monomolecular film including hydroxyl groups, cyano groups, or oxiranyl groups, which are oriented toward an outmost surface of the monomolecular film; and chemically modifying the hydroxyl groups, cyano groups, or oxiranyl groups of the monomolecular film to transform them into carboxyl groups, to thereby form, on the substrate, the monomolecular film including the carboxyl groups, which are oriented toward an outmost surface of the monomolecular film. There can be provided: a method for producing a molecule immobilizing substrate which is free of occurrence of an immobilized-molecule peeling problem in the case of conducting an assay by immobilizing molecules on the substrate.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: May 19, 2015
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Wataru Kusaki, Toshinobu Ishihara, Takeshi Kinsho, Takeru Watanabe
  • Patent number: 8541158
    Abstract: A positive resist composition is provided comprising an acid generator, a resin component which generates resin-solubilizing groups under the action of acid so that the resin component becomes soluble in an alkaline developer, at least some resin-solubilizing groups being carboxyl groups, and a compound for activating or condensing a carboxyl group. When processed by the lithography, the resist composition forms a resist pattern having a very high resolution and good mask fidelity.
    Type: Grant
    Filed: January 25, 2011
    Date of Patent: September 24, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Wataru Kusaki, Takeshi Kinsho, Takeru Watanabe
  • Patent number: 8367311
    Abstract: Provided is a fabrication method with which a laminate having a hollow structure can be produced more easily, while enabling to produce a multilayer structure as well. That is, a method for producing a hollow structure, a fabrication method by stacking-up a structural material among fabrication methods of a hollow structure on a substrate, the method including; a step of forming a structural material layer on a substrate, a step of forming a pattern on the structural material layer, a step of forming a sacrificial material layer by burying between the patterns with a water-soluble or an alkaline-soluble polymer as the sacrificial material to be buried between the patterns, a step of further laminating a structural material layer and forming a pattern on the structural material layer laminated, and a step of finally removing the sacrificial material after all of lamination is completed.
    Type: Grant
    Filed: October 21, 2010
    Date of Patent: February 5, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Wataru Kusaki, Toshinobu Ishihara
  • Patent number: 8148053
    Abstract: To provide a method for manufacturing a substrate for making a microarray which will ensure the secure immobilization of a material in a site-selective manner at a low cost.
    Type: Grant
    Filed: March 12, 2008
    Date of Patent: April 3, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Wataru Kusaki, Takeshi Kinsho, Toshinobu Ishihara
  • Patent number: 8053179
    Abstract: A method for manufacturing a substrate for making a microarray wherein a monomolecular film for immobilizing a target molecule can be simply formed position-selectively in manufacture of the substrate for making the microarray is provided. A method for manufacturing a substrate for making a microarray, comprising, a step of forming a resist film on the substrate using a chemically amplified positive resist composition using a copolymer where a content of a monomer unit having a hydroxyl group is 5 mole % or less relative to total monomer units as a binder; a step of patterning the resist film; a step of forming a monomolecular film having a silicon oxide chain on the substrate having the patterned resist film; and subsequently a step of removing the resist film.
    Type: Grant
    Filed: February 27, 2008
    Date of Patent: November 8, 2011
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Wataru Kusaki, Takeshi Kinsho, Toshinobu Ishihara
  • Publication number: 20110183262
    Abstract: A positive resist composition is provided comprising an acid generator, a resin component which generates resin-solubilizing groups under the action of acid so that the resin component becomes soluble in an alkaline developer, at least some resin-solubilizing groups being carboxyl groups, and a compound for activating or condensing a carboxyl group. When processed by the lithography, the resist composition forms a resist pattern having a very high resolution and good mask fidelity.
    Type: Application
    Filed: January 25, 2011
    Publication date: July 28, 2011
    Inventors: Wataru Kusaki, Takeshi Kinsho, Takeru Watanabe
  • Publication number: 20110123935
    Abstract: Provided is a fabrication method with which a laminate having a hollow structure can be produced more easily, while enabling to produce a multilayer structure as well. That is, a method for producing a hollow structure, a fabrication method by stacking-up a structural material among fabrication methods of a hollow structure on a substrate, the method including a step of forming a structural material layer on a substrate, a step of forming a pattern on the structural material layer, a step of forming a sacrificial material layer by burying between the patterns with a water-soluble or an alkaline-soluble polymer as the sacrificial material to be buried between the patterns, a step of further laminating a structural material layer and forming a pattern on the structural material layer laminated, and a step of finally removing the sacrificial material after all of lamination is completed.
    Type: Application
    Filed: October 21, 2010
    Publication date: May 26, 2011
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Wataru Kusaki, Toshinobu Ishihara
  • Publication number: 20100233827
    Abstract: There is disclosed a method for producing a molecule immobilizing substrate, comprising at least the steps of: forming, on a substrate, a monomolecular film including hydroxyl groups, cyano groups, or oxiranyl groups, which are oriented toward an outmost surface of the monomolecular film; and chemically modifying the hydroxyl groups, cyano groups, or oxiranyl groups of the monomolecular film to transform them into carboxyl groups, to thereby form, on the substrate, the monomolecular film including the carboxyl groups, which are oriented toward an outmost surface of the monomolecular film. There can be provided: a method for producing a molecule immobilizing substrate which is free of occurrence of an immobilized-molecule peeling problem in the case of conducting an assay by immobilizing molecules on the substrate.
    Type: Application
    Filed: February 19, 2010
    Publication date: September 16, 2010
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Wataru KUSAKI, Toshinobu ISHIHARA, Takeshi KINSHO, Takeru WATANABE
  • Patent number: 7771914
    Abstract: A resist composition comprises a polymer comprising recurring units having formula (1) wherein R1, R4, R7, and R14 are H or methyl, R2, R3, R15, and R16 are H, alkyl or fluoroalkyl, R is F or H, R5 is alkylene, R6 is fluorinated alkyl, R8 is a single bond or alkylene, R10 and R11 are H, F, methyl or trifluoromethyl, R12 and R13 are a single bond, —O— or —CR18R19—, R9, R18, and R19 are H, F, methyl or trifluoromethyl, R17 is alkylene, X1, X2 and X3 are —C(?O)—O—, —O—, or —C(?O)—R20—C(?O)—O— wherein R20 is alkylene, 0?(a-1)<1, 0?(a-2)<1, 0?(a-3)<1, 0<(a-1)+(a-2)+(a-3)<1, 0<b<1, and 0<(a-1)+(a-2)+(a-3)+b?1.
    Type: Grant
    Filed: October 16, 2007
    Date of Patent: August 10, 2010
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takao Yoshihara, Yuji Harada, Wataru Kusaki
  • Publication number: 20100055337
    Abstract: There is disclosed a method for producing a substrate for making a microarray, the method comprising: at least, a step of forming a monomolecular film having orientated oxysilanyl groups toward an outmost surface on the substrate; and a step of forming a monomolecular film having orientated amino groups toward an outmost surface on the substrate by applying a solution containing a diamine compound to the oxysilanyl groups. There can be provided a method for producing a substrate for making a microarray in which density and orientation of amino groups orientated toward an outmost surface are controllable, and in addition, there is no delamination of a monomolecular film formed on the substrate.
    Type: Application
    Filed: July 17, 2009
    Publication date: March 4, 2010
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Wataru Kusaki, Takeshi Kinsho, Toshinobu Ishihara
  • Patent number: 7629108
    Abstract: A resist composition comprising as a quencher a nitrogen-containing organic compound bearing a nitrogen-containing heterocycle and having a molecular weight of at least 380 exhibits a high resolution and satisfactory mask coverage dependence and is useful in microfabrication using electron beam or deep-UV.
    Type: Grant
    Filed: October 24, 2007
    Date of Patent: December 8, 2009
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeru Watanabe, Youichi Ohsawa, Masaki Ohashi, Wataru Kusaki, Tomohiro Kobayashi
  • Patent number: 7537880
    Abstract: To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.
    Type: Grant
    Filed: October 3, 2007
    Date of Patent: May 26, 2009
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Harada, Jun Hatakeyama, Takao Yoshihara, Wataru Kusaki, Tomohiro Kobayashi, Koji Hasegawa
  • Patent number: 7514204
    Abstract: A resist composition comprises a polymer which increases its alkali solubility under the action of an acid as a base resin, and a copolymer comprising recurring units containing a sulfonic acid amine salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: April 7, 2009
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Wataru Kusaki, Yuji Harada, Takao Yoshihara
  • Publication number: 20080233292
    Abstract: To provide a method for manufacturing a substrate for microarray which will allow, when a monomolecular film with silicon oxide chains formed on a substrate is used for the immobilization of a target molecule, a chemically amplified type resist film to be directly applied onto the substrate so as to simplify the process and enable fine processing, without causing therewith any problems such as the degradation of resolution and detachment, through more simplified procedures than are possible with the conventional method.
    Type: Application
    Filed: March 14, 2008
    Publication date: September 25, 2008
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Wataru Kusaki, Takeshi Kinsho, Toshinobu Ishihara
  • Publication number: 20080233309
    Abstract: To provide a method for manufacturing a substrate for making a microarray which will ensure the secure immobilization of a material in a site-selective manner at a low cost.
    Type: Application
    Filed: March 12, 2008
    Publication date: September 25, 2008
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Wataru Kusaki, Takeshi Kinsho, Toshinobu Ishihara
  • Publication number: 20080233409
    Abstract: A method for manufacturing a substrate for making a microarray, in which a monomolecular film is not detached when a target molecule is immobilized on the substrate using the monomolecular film having a silicon oxide chain is provided. A method for manufacturing a substrate for making a microarray comprising; at least a step of forming a monomolecular film on the substrate using a silane compound, wherein the monomolecular film is formed using a solution comprising the silane compound and a nitrogen-containing organic base in the step.
    Type: Application
    Filed: February 27, 2008
    Publication date: September 25, 2008
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Wataru Kusaki, Takeshi Kinsho, Toshinobu Ishihara
  • Publication number: 20080233521
    Abstract: A method for manufacturing a substrate for making a microarray wherein a monomolecular film for immobilizing a target molecule can be simply formed position-selectively in manufacture of the substrate for making the microarray is provided. A method for manufacturing a substrate for making a microarray, comprising, a step of forming a resist film on the substrate using a chemically amplified positive resist composition using a copolymer where a content of a monomer unit having a hydroxyl group is 5 mole % or less relative to total monomer units as a binder; a step of patterning the resist film; a step of forming a monomolecular film having a silicon oxide chain on the substrate having the patterned resist film; and subsequently a step of removing the resist film.
    Type: Application
    Filed: February 27, 2008
    Publication date: September 25, 2008
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Wataru Kusaki, Takeshi Kinsho, Toshinobu Ishihara
  • Publication number: 20080118860
    Abstract: To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.
    Type: Application
    Filed: October 3, 2007
    Publication date: May 22, 2008
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Harada, Jun Hatakeyama, Takao Yoshihara, Wataru Kusaki, Tomohiro Kobayashi, Koji Hasegawa
  • Publication number: 20080102405
    Abstract: A resist composition comprising as a quencher a nitrogen-containing organic compound bearing a nitrogen-containing heterocycle and having a molecular weight of at least 380 exhibits a high resolution and satisfactory mask coverage dependence and is useful in microfabrication using electron beam or deep-UV.
    Type: Application
    Filed: October 24, 2007
    Publication date: May 1, 2008
    Inventors: Takeru Watanabe, Youichi Ohsawa, Masaki Ohashi, Wataru Kusaki, Tomohiro Kobayashi