Abstract: Provided is an apparatus for manufacturing a glass molding which can manufacture a glass molding having a high precision optical surface. An apparatus for manufacturing a glass molding has a lower die which receives molten glass, and an upper die which conducts pressure molding of the molten glass supplied to the lower die in conjunction therewith, wherein the upper die has a first molding surface which transfers the optical surface, a second flat molding surface provided around the periphery of the first molding surface, and a third molding surface provided around the periphery of the second molding surface and tilting relative to the central axis of the upper die passing through the center of the first molding surface to spread in the direction of the lower die.

Abstract: X-rays are irradiated at the board 5 from the X-ray generator 11, the image of the standard marks 50, 51 are projected on the fluorescence screen 12, the resulted image is photographed simultaneously by one shot of the visible light CCD camera 13 and finally processed by the control device 9 to simultaneously determine the position of the standard marks 50 and 51. the alignment marks depicted on the photo masks 24 and 25 are imprinted on the dry film resist layers 55 respectively based on the positions of the standard marks 50 and 51 by irradiating X-rays through the sets of mirrors 22, 23 on the dry film resist layers 55.

Abstract: A projection exposure device which can perform high accurate alignment and separate exposures wherein the mask marks 20 overlap with the corresponding board marks 30 in exposure, the mask marks 20 are larger than the board marks 30 so as to shield the board marks 30 from the exposing light, and a diameter ØM of the circular mask mark 20 is larger than a diameter ØB of the circular board mark 30.

Abstract: A projection exposure apparatus and a method for producing a printed circuit board wherein, the whole pattern including pieces 10 and coupons 12 to be exposed on a print circuit board 2 is depicted on a photo mask 1 divided in six areas by divide line 19, the exposure will be made with respect to the each divided area of the photo mask 1 mounted on a movable photo mask stage 5 with using a masking device 3 masking other area than the exposing area.

Abstract: The invention is directed to a method for etching a solid state material to create a surface relief pattern. A resist layer is formed on the surface of the solid state material. The photoresist layer is holographically patterned to form a patterned mask. The pattern is then transferred into the solid state material by a dry etching process. The invention is especially useful for forming optical nanostructures. In preferred embodiments, a direct write process, such as ebeam lithography, is used to define defects and functional elements, such as waveguides and cavities.

Abstract: X-rays are irradiated at the board 5 from the X-ray generator 11, the image of the standard marks 50, 51 are projected on the fluorescence screen 12, the resulted image is photographed simultaneously by one shot of the visible light CCD camera 13 and finally processed by the control device 9 to simultaneously determine the position of the standard marks 50 and 51. the alignment marks depicted on the photo masks 24 and 25 are imprinted on the dry film resist layers 55 respectively based on the positions of the standard marks 50 and 51 by irradiating X-rays through the sets of mirrors 22, 23 on the dry film resist layers 55.

Abstract: A projection exposure apparatus and a method for producing a printed circuit board wherein, the whole pattern including pieces 10 and coupons 12 to be exposed on a print circuit board 2 is depicted on a photo mask 1 divided in six areas by divide line 19, the exposure will be made with respect to the each divided area of the photo mask 1 mounted on a movable photo mask stage 5 with using a masking device 3 masking other area than the exposing area.

Abstract: The invention is directed to a method for etching a solid state material to create a surface relief pattern. A resist layer is formed on the surface of the solid state material. The photoresist layer is holographically patterned to form a patterned mask. The pattern is then transferred into the solid state material by a dry etching process. The invention is especially useful for forming optical nanostructures. In preferred embodiments, a direct write process, such as ebeam lithography, is used to define defects and functional elements, such as waveguides and cavities.

Abstract: A marking apparatus for forming alignment marks, which improves the alignment accuracy of each layer in the production of multi-layered printed circuit boards. An X-ray generator 11 irradiates X-rays at a standard mark 50 in a core board 51 of a board 5, and projects the image of the standard mark 50 on a fluorescence screen 12. The image is captured by a visible light CCD camera 13, thereby the position of the standard mark 50 is detected. Using the detected position of the standard mark 50 as an alignment reference, the apparatus irradiates ultra-violet rays at dry film resist layers 55 via mirrors 22 and 23, and imprints the marks emerged on photo masks 24 and 25 on the dry film resist layers 55, respectively.

Abstract: A marking apparatus for forming alignment marks, which improves the alignment accuracy of each layer in the production of multi-layered printed circuit boards. An X-ray generator 11 irradiates X-rays at a standard mark 50 in a core board 51 of a board 5, and projects the image of the standard mark 50 on a fluorescence screen 12. The image is captured by a visible light CCD camera 13, thereby the position of the standard mark 50 is detected. Using the detected position of the standard mark 50 as an alignment reference, the apparatus irradiates ultra-violet rays at dry film resist layers 55 via mirrors 22 and 23, and imprints the marks emerged on photo masks 24 and 25 on the dry film resist layers 55, respectively.

Abstract: There is provided an aligner that improves contact between a glass mask and an object to be exposed. In one preferred mode, a pressure glass 3 is set at a rear side of a glass mask 1 to form a closed space 4. A pressurized air is introduced from a pressure source 5 into the closed space 4 to raise the pressure of the closed space 4 and expand the glass mask 1 toward the object to be exposed, i.e., a board 50, by which the closeness of the contact between the glass mask 1 and the board 50 improves.

Abstract: A second torsional vibrator having an outer frame and a second torsional spring is formed on the outer side of a first torsional vibrator having a pair of torsional springs and a plate member (reflection mirror), with a second torsional vibrator being fixed by the fixed part. The resonant frequency for the first torsional vibrator is set higher than that for the second torsional vibrator. The outer frame in the second torsional vibrator is driven substantially at the resonant frequency of the first torsional vibrator by an electromagnetic or electrostatic force. As a result, it becomes possible to obtain a stable and large scanning angle by using only a small driving force.

Abstract: An infrared gas analyzer, of compact and inexpensive design, has improved detection sensitivity. The infrared gas analyzer includes an infrared radiation source, a measuring cell, a reference cell, and a detector. The detector includes two detector cells in which the same species of gas, as the gas to be analyzed, is enclosed. A gas flow channel connects the detector cells to each other. Two thermal sensors are disposed in the gas flow channel, each of which further includes pairs of thermo-elements. The thermo-elements are arranged in such close proximity to each other, as to originate a thermal coupling between the pairing elements, and the thermo-element pairs are separated by a distance across which thermal coupling between the thermo-element pairs becomes insignificant. The detector detects, by the thermal sensors, a gas flow indicative of infrared absorption intensity difference between the measuring and reference cells.

Abstract: A Karman vortex flow meter for measuring the flow rate of a fluid under test in a pipeline having a base to be secured to the pipeline, and a vortex detector having an axis intended to intersect the pipeline. The vortex detector includes a post, a detector flange at least partially surrounding the post having a free surface, a columnar force receiving part extending from the post into the pipeline for producing a Karman vortex, and a strain detecting element coupled to the free surface for detecting the Karman vortex and producing an output signal corresponding the detected Karman vortex.

Abstract: A Karman vortex flow meter for measuring the flow rate of a fluid under test in a pipeline having a base to be secured to the pipeline, and a vortex detector having an axis intended to intersect the pipeline. The vortex detector includes a post, a detector flange at least partially surrounding the post having a free surface, a columnar force receiving part extending from the post into the pipeline for producing a Karman vortex, and a strain detecting element coupled to the free surface for detecting the Karman vortex and producing an output signal corresponding to the detected Karman vortex.

Abstract: In a Karman vortex flow meter, the variation of pressure caused near both sides of a Karman vortex forming unit inserted into the stream of fluid is applied to an oscillating member which is oscillating in a self-excited mode at a resonance frequency, so that the vortex frequency; i.e., the volume flow rate is detected from the modulation of the resonance frequency which is caused by variation of pressure or density attributing to the vortexes formed.

Abstract: The apparatus of the present invention detects the resonant frequency of a vibratory member in contact with the fluid in order to determine the density or pressure of the fluid. The vibratory member is disposed in a housing to form a cavity with no flow communication between the side of the vibratory member facing into the cavity and the other side of the vibratory member. The vibratory member is vibrated by an annular piezoelectric device which may be attached to one or both sides of the vibratory member. An amplifier and feedback circuit regulate the frequency of oscillation of the piezoelectric device to that of the resonant frequency. The piezoelectric device may be comprised of several separate sections or several sections with partial interruptions in the piezoelectric material. Instead of the vibratory member and the piezoelectric transducer combination, the vibratory member may be constructed from a single fixed piezoelectric device with another piezoelectric disc mounted thereon.

Abstract: A vibrating transducer for detecting the resonant frequency of a vibrating diaphragm and using that frequency to determine the pressure or density of a fluid contacting the diaphragm. The device includes a container having a diaphragm separating the cavity in the container into two chambers with the diaphragm preventing flow communication between the two chambers. A first fluid inlet in flow communication with the first chamber introduces fluid to the first chamber with that first chamber having an acoustic compliance less than the mechanical compliance of the diaphragm. The second fluid input is in flow communication with the second chamber and introduces fluid into the second chamber. By controlling the acoustic compliance of the chamber with respect to the diaphragm accurate measurements of the density or pressure of the fluid can be obtained.