Patents by Inventor Wataru Nakajima

Wataru Nakajima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250044692
    Abstract: A silicon-containing resist underlayer film forming composition for forming a resist underlayer film which is able to be removed not only by a conventional dry etching method but also by a wet etching method that uses a chemical agent, and which has excellent lithography characteristics, while enabling the achievement of a high etching rate during wet etching. A silicon-containing resist underlayer film forming composition which contains (A) a polysiloxane, (B) nitric acid, (C) a bisphenol compound and (D) a solvent.
    Type: Application
    Filed: November 26, 2021
    Publication date: February 6, 2025
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Wataru SHIBAYAMA, Satoshi TAKEDA, Shuhei SHIGAKI, Ken ISHIBASHI, Kodai KATO, Makoto NAKAJIMA
  • Publication number: 20250044697
    Abstract: A method for producing a semiconductor device includes applying a composition for forming a silicon-containing resist underlayer film, wherein the composition comprises a polysiloxane having a unit structure including a carbonyl group-containing functional group, wherein the silicon-containing resist underlayer film is used as a mask layer in a step of removing the mask layer with hydrogen peroxide-containing chemical after transfer of a pattern to an underlayer by lithography process onto a semiconductor substrate, followed by baking the composition, to thereby form a resist underlayer film, applying a resist composition onto resist underlayer film to thereby form a resist film, exposing the resist film to light, developing the resist after the light exposure to thereby form a resist pattern, etching the resist underlayer film with the resist pattern, processing the semiconductor substrate with the patterned resist and resist underlayer film, and removing the mask layer with a hydrogen peroxide-containing ch
    Type: Application
    Filed: October 9, 2024
    Publication date: February 6, 2025
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Wataru Shibayama, Satoshi Takeda, Makoto Nakajima
  • Patent number: 11383378
    Abstract: A grasping apparatus 1 includes: an image data acquisition unit 16; a robot arm 11; a control unit 12; and a grasping position determination unit 18 configured to determine, using the image data of photographed flexible objects in a folded and stacked state that is acquired by the image data acquisition unit 16, whether or not a part of the flexible objects in that image data is suitable for being grasped. The control unit 12 controls the robot arm 11 so as to deform ends of a top surface of the flexible object at the top of the stacked flexible objects. The grasping position determination unit 18 determines whether or not a part is suitable for being grasped using the image data of the photographed flexible object the ends of the top surface of which have been deformed.
    Type: Grant
    Filed: December 10, 2018
    Date of Patent: July 12, 2022
    Assignees: SHINSHU UNIVERSITY, TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Kimitoshi Yamazaki, Kazuki Sano, Satonori Demura, Wataru Nakajima, Keisuke Takeshita
  • Patent number: 11114319
    Abstract: A heat treatment apparatus includes a heating unit provided around a processing container accommodating a substrate; a plurality of blowing units configured to blow a cooling medium into a space between the processing container and the heating unit; and a shutter configured to simultaneously opens/closes at least two of the plurality of blowing units and including a slit formed corresponding to each of the blowing units.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: September 7, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tatsuya Yamaguchi, Yasuaki Kikuchi, Koji Yoshii, Wataru Nakajima, Norio Baba
  • Publication number: 20200168486
    Abstract: A heat treatment apparatus includes a heating unit provided around a processing container accommodating a substrate; a plurality of blowing units configured to blow a cooling medium into a space between the processing container and the heating unit; and a shutter configured to simultaneously opens/closes at least two of the plurality of blowing units and including a slit formed corresponding to each of the blowing units.
    Type: Application
    Filed: November 21, 2019
    Publication date: May 28, 2020
    Inventors: Tatsuya Yamaguchi, Yasuaki Kikuchi, Koji Yoshii, Wataru Nakajima, Norio Baba
  • Publication number: 20190184554
    Abstract: A grasping apparatus 1 includes: an image data acquisition unit 16; a robot arm 11; a control unit 12; and a grasping position determination unit 18 configured to determine, using the image data of photographed flexible objects in a folded and stacked state that is acquired by the image data acquisition unit 16, whether or not a part of the flexible objects in that image data is suitable for being grasped. The control unit 12 controls the robot arm 11 so as to deform ends of a top surface of the flexible object at the top of the stacked flexible objects. The grasping position determination unit 18 determines whether or not a part is suitable for being grasped using the image data of the photographed flexible object the ends of the top surface of which have been deformed.
    Type: Application
    Filed: December 10, 2018
    Publication date: June 20, 2019
    Applicants: SHINSHU UNIVERSITY, TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Kimitoshi YAMAZAKI, Kazuki SANO, Satonori DEMURA, Wataru NAKAJIMA, Keisuke TAKESHITA
  • Patent number: 7935188
    Abstract: The invention is a vertical thermal processing apparatus including: a processing container that contains an object to be processed; a main heater provided so as to surround the processing container, the main heater being capable of heating the processing container and having a rapid cooling function; a gas-discharging part formed at an upper portion of the processing container, the gas-discharging part being bent; an auxiliary heater provided so as to heat the gas-discharging part; a moving mechanism for evacuating the auxiliary heater away from the gas-discharging part during a rapid cooling process of the main heater; and a forcibly gas-discharging mechanism for forcibly discharging an atmospheric gas in a vicinity of the gas-discharging part.
    Type: Grant
    Filed: August 24, 2005
    Date of Patent: May 3, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Wataru Nakajima, Takuya Oikawa, Hisashi Inoue
  • Publication number: 20080187652
    Abstract: The invention is a vertical thermal processing apparatus including: a processing container that contains an object to be processed; a main heater provided so as to surround the processing container, the main heater being capable of heating the processing container and having a rapid cooling function; a gas-discharging part formed at an upper portion of the processing container, the gas-discharging part being bent; an auxiliary heater provided so as to heat the gas-discharging part; a moving mechanism for evacuating the auxiliary heater away from the gas-discharging part during a rapid cooling process of the main heater; and a forcibly gas-discharging mechanism for forcibly discharging an atmospheric gas in a vicinity of the gas-discharging part.
    Type: Application
    Filed: August 24, 2005
    Publication date: August 7, 2008
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Wataru Nakajima, Takuya Oikawa, Hisashi Inoue