Patents by Inventor Wataru NISHINO

Wataru NISHINO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240182618
    Abstract: A chloroprene polymer having a structural unit derived from chloroprene and a structural unit derived from an unsaturated nitrile, in which the chloroprene polymer has a peak top at 5.80 to 6.00 ppm in a 1H-NMR spectrum as measured in a deuterochloroform solvent, in the 1H-NMR spectrum, a peak area ratio A/B of a peak area A at 5.80 to 6.00 ppm and a peak area B at 4.05 to 6.20 ppm is more than 1.1/100 and 2.3/100 or less, and a content of the structural unit derived from an unsaturated nitrile is more than 0% by mass and 23% by mass or less.
    Type: Application
    Filed: March 7, 2022
    Publication date: June 6, 2024
    Applicant: Denka Company Limited
    Inventors: Wataru NISHINO, Suguru ONUKI, Ryotaro ANDO
  • Patent number: 11993671
    Abstract: A chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, in which the chloroprene-unsaturated nitrile copolymer has a peak at 5.80 to 6.00 ppm in a 1H-NMR spectrum as measured in a deuterochloroform solvent, and a ratio (A/B) of a peak area (A) at 5.80 to 6.00 ppm and a peak area (B) at 4.05 to 6.20 ppm is 0.6/100 to 1.1/100.
    Type: Grant
    Filed: November 6, 2019
    Date of Patent: May 28, 2024
    Assignee: Denka Company Limited
    Inventors: Wataru Nishino, Suguru Onuki, Atsunori Kondo, Yuhei Ishigaki, Naoki Kobayashi
  • Publication number: 20240158555
    Abstract: A chloroprene polymer having a structural unit derived from chloroprene and a structural unit derived from an unsaturated nitrile, in which the chloroprene polymer has peak tops at 5.80 to 6.00 ppm and 5.10 to 5.30 ppm in a 1H-NMR spectrum as measured in a deuterochloroform solvent, in the 1H-NMR spectrum, a peak area ratio A/B of a peak area A at 5.80 to 6.00 ppm and a peak area B at 4.05 to 6.20 ppm is 0.9/100 to 1.1/100, and the peak area A, the peak area B, and a peak area C at 5.10 to 5.30 ppm satisfy formula “(C?2A)/B?2.0/100”, and a content of the structural unit derived from an unsaturated nitrile is more than 0% by mass and 23% by mass or less.
    Type: Application
    Filed: March 7, 2022
    Publication date: May 16, 2024
    Applicant: Denka Company Limited
    Inventors: Wataru NISHINO, Suguru ONUKI, Ryotaro ANDO
  • Publication number: 20240132649
    Abstract: A (meth)acrylate-based block copolymer including a polymer block and a (meth)acrylate-based polymer block, wherein: the (meth)acrylate-based block copolymer contains 5 to 30% by mass of the polymeric block and 70 to 95% by mass of the (meth)acrylate-based polymer block with respect to 100% by mass of the (meth)acrylate-based block copolymer; the polymer block has a monomer unit derived from a monomer; when the monomer is polymerized alone, a polymer with a glass transition temperature of 80° C. or higher can be obtained; and a tensile strength at break measured in accordance with JIS K 6251 of a film obtained by immersion-molding a (meth)acrylate-based block copolymer latex containing the (meth)acrylate-based block copolymer and heat-treating at 130° C. for 30 minutes is 14 MPa or more.
    Type: Application
    Filed: March 16, 2022
    Publication date: April 25, 2024
    Applicant: DENKA COMPANY LIMITED
    Inventors: Wataru NISHINO, Yushi KUMAGAI, Ibuki SHIMOTOMAI, Yutaka SAITO
  • Patent number: 11965078
    Abstract: A chloroprene-unsaturated nitrile copolymer composition containing 100 parts by mass of a chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, and 0.05 to 2.0 parts by mass of a xanthogen compound.
    Type: Grant
    Filed: November 6, 2019
    Date of Patent: April 23, 2024
    Assignee: Denka Company Limited
    Inventors: Suguru Onuki, Wataru Nishino, Atsunori Kondo, Yuhei Ishigaki, Naoki Kobayashi
  • Publication number: 20240117083
    Abstract: A chloroprene-based polymer, wherein: a 1H-NMR spectrum of the chloroprene-based polymer measured in a deuterochloroform solvent has a peak at 5.80 to 6.00 ppm; when an area of the peak at 5.80 to 6.00 ppm is A and an area of a peak at 4.05 to 6.00 ppm is B, A/B is 1.20/100 or less; the 1H-NMR spectrum of the chloroprene-based polymer measured in a deuterochloroform solvent has a peak at 5.40 to 5.60 ppm; when an area of the peak at 5.40 to 5.60 ppm is D and the area of the peak at 4.05 to 6.00 ppm is B, D/B is 97.20/100 or less, is provided.
    Type: Application
    Filed: March 24, 2022
    Publication date: April 11, 2024
    Applicant: DENKA COMPANY LIMITED
    Inventors: Seiya TOMIZAWA, Wataru NISHINO, Misaki TADA
  • Publication number: 20240117161
    Abstract: A chloroprene-based polymer latex including a chloroprene-based polymer, wherein: an amount of substance of alkali metal cation per unit mass in the chloroprene-based polymer latex is 0.05 to 0.12 mmol/g, when the chloroprene-based polymer latex is freeze-dried to obtain a solid content containing the chloroprene-based polymer, and an ethanol-toluene azeotropic mixture soluble content specified in JIS K 6229 is extracted by refluxing from the solid content to obtain an extract, and the obtained extract is acid treated with hydrochloric acid, an amount of rosin acid of in the solid content measured by gas chromatography is 1.4 to 4.2% by mass with respect to 100% by mass of the chloroprene-based polymer in the solid content, is provided.
    Type: Application
    Filed: March 24, 2022
    Publication date: April 11, 2024
    Applicant: DENKA COMPANY LIMITED
    Inventors: Seiya TOMIZAWA, Wataru NISHINO, Misaki TADA
  • Publication number: 20230074040
    Abstract: A chloroprene-based block copolymer, a latex, a latex composition, and a rubber composition that can produce a product with excellent tensile properties and flexibility without the use of a vulcanizing agent or a vulcanizing accelerator having a chloroprene-based block copolymer, contains 5 to 30% by mass of a polymer block (A) and 70 to 95% by mass of a chloroprene-based polymer block (B), wherein the polymer block (A) is derived from a monomer, when the monomer is polymerized alone, a polymer with a glass transition temperature of 80° C. or higher can be obtained and the chloroprene-based polymer block (B) includes a chloroprene monomer unit and a polyfunctional monomer unit.
    Type: Application
    Filed: March 22, 2021
    Publication date: March 9, 2023
    Applicant: DENKA COMPANY LIMITED
    Inventors: Hideharu MORI, Wataru NISHINO, Yushi KUMAGAI, Yutaka SAITO, Naoki KOBAYASHI
  • Publication number: 20230055361
    Abstract: A chloroprene-based block copolymer, a latex, a latex composition, and a rubber composition that can produce a product with excellent flexibility and tensile properties without the use of a vulcanizing agent or a vulcanizing accelerator. A chloroprene-based block copolymer, includes 5 to 30% by mass of a polymer block (A) and 70 to 95% by mass of a chloroprene-based polymer block (B), wherein: the polymer block (A) is derived from a monomer; when the monomer is polymerized alone, a polymer with a glass transition temperature of 80° C. or higher can be obtained; the chloroprene-based polymer block (B) includes a chloroprene monomer; and the chloroprene-based block copolymer has a toluene insoluble content of 20 to 100% by mass with respect to 100% by mass of the chloroprene-based block copolymer.
    Type: Application
    Filed: March 22, 2021
    Publication date: February 23, 2023
    Applicant: DENKA COMPANY LIMITED
    Inventors: Yushi KUMAGAI, Wataru NISHINO, Yutaka SAITO, Naoki KOBAYASHI
  • Publication number: 20230050436
    Abstract: A chloroprene-based block copolymer latex, including a chloroprene-based block copolymer, wherein: the chloroprene-based block copolymer contains 5 to 30% by mass of a polymer block (A) and 70 to 95% by mass of a chloroprene-based polymer block (B); the polymer block (A) is derived from a monomer; when the monomer is polymerized alone, a polymer with a glass transition temperature of 80° C. or higher can be obtained; the chloroprene-based polymer block (B) includes a chloroprene monomer unit; and when the chloroprene-based block copolymer latex is molded by immersion molding to obtain a film and then the film is heat-treated at 130° C. for 30 minutes, a tensile strength at break measured in accordance with JIS K6251 of the film is 17 MPa or more is provided.
    Type: Application
    Filed: March 22, 2021
    Publication date: February 16, 2023
    Applicant: DENKA COMPANY LIMITED
    Inventors: Yushi KUMAGAI, Wataru NISHINO, Yutaka SAITO, Naoki KOBAYASHI
  • Patent number: 11566087
    Abstract: To provide a statistical copolymer containing a chloroprene monomer unit and an unsaturated nitrile monomer unit which has a satisfactory oil resistance. A method for producing a statistical copolymer containing a chloroprene monomer unit and an unsaturated nitrile monomer unit includes a step for conducting continuous addition or 10 cycles or more of intermittent portionwise addition of the chloroprene monomer after initiation of a polymerization reaction is provided. A rubber composition using a statistical copolymer according to the invention or a vulcanized molded article containing the rubber composition is excellent in terms of oil resistance, mechanical strength, compression set at a low temperature and flex fatigue resistance.
    Type: Grant
    Filed: May 11, 2018
    Date of Patent: January 31, 2023
    Assignee: DENKA COMPANY LIMITED
    Inventors: Wataru Nishino, Suguru Onuki, Kosuke Fujimoto, Yuhei Ishigaki, Shogo Hagiwara, Uichiro Yamagishi
  • Publication number: 20230025987
    Abstract: An immersion-molded body, wherein: the immersion-molded body is obtained using a latex; the latex comprises a chloroprene-based block copolymer; the chloroprene-based block copolymer contains 5 to 30% by mass of a polymer block (A) and 70 to 95% by mass of a chloroprene-based polymer block (B); the polymer block (A) is derived from a monomer; when the monomer is polymerized alone, a polymer with a glass transition temperature of 80° C. or higher can be obtained; the chloroprene-based polymer block (B) includes a chloroprene monomer unit; and when the immersion-molded body is heat-treated at 130° C. for 30 minutes, a tensile strength at break of the heat-treated immersion-molded body measured in accordance with JIS K6251 is 17 MPa or more.
    Type: Application
    Filed: March 22, 2021
    Publication date: January 26, 2023
    Applicant: DENKA COMPANY LIMITED
    Inventors: Yushi KUMAGAI, Wataru NISHINO, Yutaka SAITO, Naoki KOBAYASHI
  • Publication number: 20220325071
    Abstract: A rubber composition containing: 100 parts by mass of a chloroprene-based rubber; 0.50 to 4.0 parts by mass of a maleimide compound; and 0.10 to 2.0 parts by mass of an organic peroxide, a vulcanizate of this rubber composition, and a vulcanized molded article of this rubber composition.
    Type: Application
    Filed: August 12, 2020
    Publication date: October 13, 2022
    Inventors: Atsunori KONDO, Wataru NISHINO, Suguru ONUKI
  • Patent number: 11365276
    Abstract: To provide a block copolymer that includes an aromatic vinyl compound polymer and a chloroprene polymer, has a number average molecular weight of 100,000 or more, is preferred for a rubber composition and an adhesive composition, and is suitable for industrial production. A block copolymer includes at least one aromatic vinyl compound polymer block and at least one chloroprene polymer block, has a functional group with a structure represented by Chemical Formula (1) or (2), and has a number average molecular weight of 100,000 or more. The chloroprene polymer block has a number average molecular weight of 80,000 or more in total. (In Chemical Formula (1), R1 is hydrogen, chlorine, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclyl group.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: June 21, 2022
    Assignee: DENKA COMPANY LIMITED
    Inventors: Wataru Nishino, Yuhei Ishigaki, Takashi Aizawa, Shogo Hagiwara, Uichiro Yamagishi
  • Patent number: 11254807
    Abstract: Provided is a chloroprene-based polymer having an industrially applicable sufficient molecular weight and capable of obtaining a vulcanized rubber excellent in durability and fatigue endurance and an adhesive excellent in layer separation resistance. A chloroprene-based polymer having a number average molecular weight Mn of 150000 to 300000 and comprising a functional group of a structure represented by the general formula (1) or (2) below: (wherein in the general formula (1), R1 shows hydrogen, chlorine, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclyl group.
    Type: Grant
    Filed: July 20, 2018
    Date of Patent: February 22, 2022
    Assignee: Denka Company Limited
    Inventors: Yuhei Ishigaki, Shogo Hagiwara, Uichiro Yamagishi, Suguru Onuki, Kosuke Fujimoto, Wataru Nishino
  • Publication number: 20220010097
    Abstract: A chloroprene-unsaturated nitrile copolymer composition containing 100 parts by mass of a chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, and 0.05 to 2.0 parts by mass of a xanthogen compound.
    Type: Application
    Filed: November 6, 2019
    Publication date: January 13, 2022
    Applicant: DENKA COMPANY LIMITED
    Inventors: Suguru ONUKI, Wataru NISHINO, Atsunori KONDO, Yuhei ISHIGAKI, Naoki KOBAYASHI
  • Publication number: 20210395422
    Abstract: A chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, in which the chloroprene-unsaturated nitrile copolymer has a peak at 5.80 to 6.00 ppm in a 1H-NMR spectrum as measured in a deuterochloroform solvent, and a ratio (A/B) of a peak area (A) at 5.80 to 6.00 ppm and a peak area (B) at 4.05 to 6.20 ppm is 0.6/100 to 1.1/100.
    Type: Application
    Filed: November 6, 2019
    Publication date: December 23, 2021
    Applicant: DENKA COMPANY LIMITED
    Inventors: Wataru NISHINO, Suguru ONUKI, Atsunori KONDO, Yuhei ISHIGAKI, Naoki KOBAYASHI
  • Publication number: 20200199260
    Abstract: To provide a statistical copolymer containing a chloroprene monomer unit and an unsaturated nitrile monomer unit which has a satisfactory oil resistance. A method for producing a statistical copolymer containing a chloroprene monomer unit and an unsaturated nitrile monomer unit includes a step for conducting continuous addition or 10 cycles or more of intermittent portionwise addition of the chloroprene monomer after initiation of a polymerization reaction is provided. A rubber composition using a statistical copolymer according to the invention or a vulcanized molded article containing the rubber composition is excellent in terms of oil resistance, mechanical strength, compression set at a low temperature and flex fatigue resistance.
    Type: Application
    Filed: May 11, 2018
    Publication date: June 25, 2020
    Inventors: Wataru NISHINO, Suguru ONUKI, Kosuke FUJIMOTO, Yuhei ISHIGAKI, Shogo HAGIWARA, Uichiro YAMAGISHI
  • Publication number: 20200165421
    Abstract: Provided is a chloroprene-based polymer having an industrially applicable sufficient molecular weight and capable of obtaining a vulcanized rubber excellent in durability and fatigue endurance and an adhesive excellent in layer separation resistance. A chloroprene-based polymer having a number average molecular weight Mn of 150000 to 300000 and comprising a functional group of a structure represented by the general formula (1) or (2) below: (wherein in the general formula (1), R1 shows hydrogen, chlorine, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclyl group.
    Type: Application
    Filed: July 20, 2018
    Publication date: May 28, 2020
    Applicant: DENKA COMPANY LIMITED
    Inventors: Yuhei ISHIGAKI, Shogo HAGIWARA, Uichiro YAMAGISHI, Suguru ONUKI, Kosuke FUJIMOTO, Wataru NISHINO
  • Publication number: 20190389994
    Abstract: To provide a block copolymer that includes an aromatic vinyl compound polymer and a chloroprene polymer, has a number average molecular weight of 100,000 or more, is preferred for a rubber composition and an adhesive composition, and is suitable for industrial production. A block copolymer includes at least one aromatic vinyl compound polymer block and at least one chloroprene polymer block, has a functional group with a structure represented by Chemical Formula (1) or (2), and has a number average molecular weight of 100,000 or more. The chloroprene polymer block has a number average molecular weight of 80,000 or more in total.
    Type: Application
    Filed: March 29, 2018
    Publication date: December 26, 2019
    Inventors: Wataru NISHINO, Yuhei ISHIGAKI, Takashi AIZAWA, Shogo HAGIWARA, Uichiro YAMAGISHI