Abstract: Disclosed is a gas barrier film exhibiting excellent oxygen and water vapor blocking performance, while having resistance to heat sterilization treatments such as a boiling/retorting treatment. A gas barrier film as a first embodiment of the present invention is characterized by having a structure wherein a deposition layer of an inorganic compound is formed on one side of a base film, a gas barrier layer of a polyepoxy cured product having a skeleton represented by the formula (1) below is formed on the deposition layer, and an overcoat layer made of at least one resin selected from the group consisting of polyepoxy resins, polyester resins and polyacrylic resins is formed on the gas barrier layer.