Patents by Inventor Wataru Sakai
Wataru Sakai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11839893Abstract: A holding mechanism holds a substrate horizontally. A rotation mechanism rotates the holding mechanism holding the substrate. A nozzle supplies a processing liquid to the substrate. A nozzle arm holds the nozzle. An arm actuation mechanism moves the nozzle arm between a processing position overlapping the substrate in plan view and a retracted position displaced from the substrate in plan view. A cup portion is disposed around the holding mechanism, and receives the processing liquid from the substrate. A cup actuation mechanism moves the cup portion up and down between an upper position and a lower position. A first container is fixed to the cup portion to be movable up and down integrally with the cup portion, and can accommodate the nozzle at the retracted position.Type: GrantFiled: December 16, 2020Date of Patent: December 12, 2023Assignee: SCREEN Holdings Co., Ltd.Inventors: Yosuke Yasutake, Hiroaki Ishii, Wataru Sakai, Yutaka Ikegami
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Publication number: 20220415697Abstract: The substrate processing apparatus includes a suction holding mechanism, a rotation mechanism, a plurality of lift pins, a vertical movement mechanism, and a horizontal movement mechanism. The suction holding mechanism sucks and holds a substrate. The rotation mechanism rotates the suction holding mechanism holding the substrate about the rotation axis. The vertical movement mechanism moves the plurality of lift pins in the vertical direction. A sensor measures the eccentric state of the substrate W held by the suction holding mechanism. The vertical movement mechanism supports the substrate from the suction holding mechanism by moving the plurality of lift pins and the horizontal movement mechanism moves the plurality of lift pins based on the eccentric state of the substrate measured by the sensor in a state where the substrate is supported.Type: ApplicationFiled: November 5, 2020Publication date: December 29, 2022Inventors: Yosuke YASUTAKE, Hiroaki ISHII, Wataru SAKAI, Yutaka IKEGAMI
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Publication number: 20220388020Abstract: A holding mechanism holds a substrate horizontally. A rotation mechanism rotates the holding mechanism holding the substrate. A nozzle supplies a processing liquid to the substrate. A nozzle arm holds the nozzle. An arm actuation mechanism moves the nozzle arm between a processing position overlapping the substrate in plan view and a retracted position displaced from the substrate in plan view. A cup portion is disposed around the holding mechanism, and receives the processing liquid from the substrate. A cup actuation mechanism moves the cup portion up and down between an upper position and a lower position. A first container is fixed to the cup portion to be movable up and down integrally with the cup portion, and can accommodate the nozzle at the retracted position.Type: ApplicationFiled: December 16, 2020Publication date: December 8, 2022Inventors: Yosuke YASUTAKE, Hiroaki ISHII, Wataru SAKAI, Yutaka IKEGAMI
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Patent number: 11077711Abstract: A rubber composition of the present technology is a rubber composition including a diene rubber and a filler; the diene rubber containing at least a styrene-butadiene copolymer; a radical generation index of the styrene-butadiene copolymer being not greater than 1.0 and being smaller than a value Y calculated by Equation (1): Y=?0.0186×(SV mass %+vinyl unit mol %)+1.5.Type: GrantFiled: April 22, 2016Date of Patent: August 3, 2021Inventors: Wataru Sakai, Takuma Arikawa, Ryosuke Sakai, Yu Shinke, Yuko Sekine, Fumito Yatsuyanagi
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Publication number: 20210197224Abstract: A substrate processing method includes a liquid film forming step of forming a liquid film, a liquid film heat retaining step of keeping the liquid film warm, a gas phase layer forming step of forming a gas phase layer which holds the processing liquid on a center portion of the liquid film, an opening forming step of forming an opening in the center portion of the liquid film by excluding the processing liquid held by the gas phase layer, a substrate rotating step of rotating the substrate around a rotation axis, and an opening expanding step of expanding the opening, while a state in which the gas phase layer is formed on an inner circumferential edge of the liquid film is maintained, by moving the irradiation region toward a circumferential edge portion of the substrate while the liquid film heat retaining step and the substrate rotating step are performed.Type: ApplicationFiled: December 24, 2020Publication date: July 1, 2021Applicant: SCREEN Holdings Co., Ltd.Inventors: Hiroshi ABE, Takashi OTA, Takaaki ISHIZU, Kenji KOBAYASHI, Ryo MURAMOTO, Sei NEGORO, Manabu OKUTANI, Wataru SAKAI
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Patent number: 10727090Abstract: A substrate processing apparatus includes a spin chuck, rotating a disk-shaped substrate around a rotational axis while holding it horizontally, a cylindrical guard, receiving a processing liquid scattered outward from the substrate held by the spin chuck, and a centering unit, which brings a center of the substrate close to the rotational axis. The centering unit includes a pusher, contacting the substrate on the spin chuck, and a linear motor, moving the pusher horizontally to move the substrate horizontally with respect to the spin chuck. At least a portion of the linear motor is disposed above the guard such as to overlap with the guard in plan view.Type: GrantFiled: May 30, 2018Date of Patent: July 28, 2020Assignee: SCREEN Holdings Co., Ltd.Inventors: Noriyuki Kikumoto, Toyohide Hayashi, Naoto Fujita, Michinori Iwao, Wataru Sakai
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Publication number: 20180350632Abstract: A substrate processing apparatus includes a spin chuck, rotating a disk-shaped substrate around a rotational axis while holding it horizontally, a cylindrical guard, receiving a processing liquid scattered outward from the substrate held by the spin chuck, and a centering unit, which brings a center of the substrate close to the rotational axis. The centering unit includes a pusher, contacting the substrate on the spin chuck, and a linear motor, moving the pusher horizontally to move the substrate horizontally with respect to the spin chuck. At least a portion of the linear motor is disposed above the guard such as to overlap with the guard in plan view.Type: ApplicationFiled: May 30, 2018Publication date: December 6, 2018Inventors: Noriyuki KIKUMOTO, Toyohide HAYASHI, Naoto FUJITA, Michinori IWAO, Wataru SAKAI
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Publication number: 20180134078Abstract: A rubber composition of the present technology is a rubber composition including a diene rubber and a filler; the diene rubber containing at least a styrene-butadiene copolymer; a radical generation index of the styrene-butadiene copolymer being not greater than 1.0 and being smaller than a value Y calculated by Equation (1): Y=?0.0186×(SV mass %+vinyl unit mol %)+1.5.Type: ApplicationFiled: April 22, 2016Publication date: May 17, 2018Inventors: Wataru Sakai, Takuma Arikawa, Ryosuke Sakai, Yu Shinke, Yuko Sekine, Fumito Yatsuyanagi
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Publication number: 20100068458Abstract: An unhardened inorganic board is shaped by press clamping the surface of an unhardened inorganic mat having a colored surface layer using an embossing template. A semi-hardened inorganic board is obtained by performing primary curing of the unhardened inorganic board, and coating the surface of the semi-hardened inorganic board with a primary sealer. The semi-hardened inorganic board coated with the primary sealer is autoclave cured to obtain a hardened inorganic board. The surface of the hardened inorganic board is coated with a powdery or granular material fixing sealer and, thereafter, an ornamental powdery or granular material is dispersed onto the surface of the hardened inorganic board. The surface of the hardened inorganic board on which the ornamental powdery or granular material has been dispersed is coated with a finishing transparent paint.Type: ApplicationFiled: August 21, 2009Publication date: March 18, 2010Inventor: Wataru SAKAI
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Patent number: 6432164Abstract: A method for refining molten steel by immersing the lower opening end of a cylindrical immersion tube equipped with a lance into the molten steel contained in a ladle, controlling the pressure in the cylindrical immersion tube to a prescribed pressure range to suck up the molten steel, injecting an agitation gas from the bottom of the ladle towards the surface of the sucked-up molten steel, and decarburizing and refining the molten steel under a reduced pressure, characterized in that the method comprising the steps of; controlling the pressure Pt (Torr) in the cylindrical immersion tube so as to satisfy the following formulae (1) and (2), blowing oxygen gas to the surface of the molten steel through the lance, and decarburizing and refining the molten steel under a reduced pressure; Pt>760−1.297×107/Dc2 (1) K=1.71×Dl0.211×Dc0.438×Wm−1.124×Qg0.519×Pt−0.410>0.Type: GrantFiled: February 15, 2001Date of Patent: August 13, 2002Assignee: Nippon Steel CorporationInventors: Okitomo Kunitake, Norio Omura, Wataru Sakai, Susumu Mukawa, Tadashi Imai