Abstract: A VLSI chemical reactor includes a fluid flow guide spaced from the corresponding substrate in the form of a wafer for significantly reducing contamination in the processing of semiconductor wafers. Processing chemicals are introduced in a continuous process through a central tube and through the fluid flow guide which is substantially planar and which is parallel to the surface of the wafer. A predetermined gap is maintained between the guide and the wafer such that fluid is maintained in the gap at all times critical in the processing of the wafer. In one embodiment, the guide is optically transparent at predetermined portions to permit monitoring of the chemical reaction taking place on the surface of the wafer to permit control of fluid flow to the wafer. Because of the uniform gap, the fluid guide insures a constant thickness and composition of the opticalpath, and thus more accurate measurements.

Abstract: A mechanical support for rifle shooting providing two open top cradles to receive a rifle with the forward cradle providing compound vertical adjustment for optimum elevational positioning. The rifle support provides three point contact upon an underlying supporting surface with two support points swivelly mounted to allow simple and proper use on uneven or sloping terrain. The support is readily portable for use primarily in field shooting.