Patents by Inventor Wayne A. Mitchell
Wayne A. Mitchell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6010639Abstract: A controlled-release supplement coolant additive for use in diesel engine coolant systems comprising a core containing at least one supplemental coolant additive (SCA) active component and a polymeric coating material encapsulating said core. The controlled released supplement coolant additive slowly releases the SCA active components to a diesel engine coolant system, thereby delivering an effective concentration level of SCA active components over an extended period. The controlled-release supplement coolant additive maintains a minimum concentration level of active SCA components in the coolant system. Additionally, the controlled-release supplemental coolant additive prevents overdosing the coolant system with particular SCA active components such as nitrates.Type: GrantFiled: November 19, 1997Date of Patent: January 4, 2000Assignee: BetzDearborn Inc.Inventors: Wayne A. Mitchell, Kurt D. Heinz, Clifford Alvin Ferrin, Jr., Narender Pal Luthra
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Patent number: 5741433Abstract: A controlled-release supplement coolant additive for use in diesel engine coolant systems comprising a core containing at least one supplemental coolant additive (SCA) active component and a polymeric coating material encapsulating said core. The controlled released supplement coolant additive slowly releases the SCA active components to a diesel engine coolant system, thereby delivering an effective concentration level of SCA active components over an extended period. The controlled-release supplement coolant additive maintains a minimum concentration level of active SCA components in the coolant system. Additionally, the controlled-release supplemental coolant additive prevents overdosing the coolant system with particular SCA active components such as nitrates.Type: GrantFiled: June 21, 1996Date of Patent: April 21, 1998Assignee: BetzDearborn Inc.Inventors: Wayne A. Mitchell, Kurt D. Heinz, Clifford Alvin Ferrin, Jr., Narender Pal Luthra
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Patent number: 5565303Abstract: A method for producing a press-ready lithographic printing plate which comprises:(A) providing an uncoated lithographic substrate;(B) coating a photosensitive layer on one side of the lithographic substrate;(C) providing a flexible substrate;(D) coating an adhesive layer directly on the flexible substrate;(E) laminating the coated lithographic substrate to the coated flexible substrate;(F) imagewise exposing the laminated element of (E) to radiation to which the photosensitive layer is sensitive; and(G) peeling off the flexible substrate along with the nonimage areas of the photosensitive layer, leaving the press-ready image areas of the colored photosensitive layer and the adhesive layer on the lithographic substrate.Type: GrantFiled: May 4, 1992Date of Patent: October 15, 1996Inventors: Sonya Y. Shaw, Wayne A. Mitchell, David R. Beresford
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Patent number: 5066568Abstract: The invention is a method for preparing a photographic element which comprises imagewise exposing a photographic element, and removing the non-image areas thereof by contacting said element with a composition consisting essentially of in admixture:a) from at least about 5% to about 30% by weight of the developer of benzyl alcohol; andb) from about 1% to about 20% by weight of the developer of one of more compound selected from the group consisting of sodium xylene sulfonate and sodium cumene sulfonate; andc) from about 5% to about 40% by weight of the developer of potassium toluene sulfonate; andd) water in sufficient amount of formulate effective developer for imagewise exposed photographic elements.Type: GrantFiled: September 24, 1990Date of Patent: November 19, 1991Assignee: Hoehst Celanese CorporationInventors: Shane Hsieh, Wayne A. Mitchell
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Patent number: 4980271Abstract: A composition capable of removing the non-image areas of an imagewise exposed photographic element, consisting essentially of in admixture:(a) from at least about 5% to about 30% by weight benzyl alcohol; and(b) from about 1% to about 20% by weight of one or more compounds selected from the group consisting of sodium xylene sulfonate and sodium cumene sulfonate; and(c) from about 5% to about 40% by weight potassium toluene sulfonate; and(d) water.Type: GrantFiled: August 5, 1985Date of Patent: December 25, 1990Assignee: Hoechst Celanese CorporationInventors: Shane Hsieh, Wayne A. Mitchell
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Patent number: 4786580Abstract: The invention provides a method for developing negative working photographic elements using an aqueous developer comprising(a) a solvent composition consisting essentially of(i) n-propanol or isopropanol; and(ii) a glycol ether or acetate(b) a salt which is preferably magnesium sulfate; and(c) an ethoxylated alkyl phenol type non-ionic surfactant.Type: GrantFiled: December 27, 1983Date of Patent: November 22, 1988Assignee: Hoechst Celanese CorporationInventors: Shane Hsieh, Wayne A. Mitchell
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Patent number: 4783395Abstract: The invention provides an organic solvent free, phosphate free, lithographic desensitizing composition which comprises:(a) from about 0.1% to about 20.0% by weight of the composition of a copolymer of polymethyl vinyl ether and maleic acid having the formula ##STR1## which has a molecular weight in an amount of from about 20,000 to about 70,000; and(b) from about 0.1% to about 20.0% by weight of the composition of a desensitizing component comprising one or more hydroxy carboxylic acids or salts; and(c) sufficient water to formulate a desensitizing composition; and(d) sufficient base to adjust the pH of the composition into the range of from about 6.5 to about 7.5.Type: GrantFiled: November 5, 1987Date of Patent: November 8, 1988Assignee: Hoechst Celanese CorporationInventors: Shane Hsieh, Wayne A. Mitchell
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Patent number: 4780396Abstract: An organic solvent free developer composition having a pH in the range of from about 6.5 to about 7.5 comprising in admixture:(a) from about 0.1% to about 20% by weight of the developer of one or more compounds selected from the group consisting of sodium octyl sulfate, sodium tetradecyl sulfate, sodium 2-ethyl hexyl sulfate and ammonium lauryl sulfate; and(b) from about 0.1% to about 30% by weight of the developer of one or more components selected from the group consisting of lithium salts of hydroxy, aryl and alkyl carboxylic acids; and(c) from about 0.1% to about 30% by weight of the developer of one or more compounds selected from the group consisting of potassium salts of hydroxy, aryl and alkyl carboxylic acids; and(d) an optional compatible organic or inorganic acid or base in an amount sufficient to adjust the pH of the developer composition into the range of from about 6.5 to about 7.5; and(e) an optional anti-foam component in an amount of from about 0.02 to about 0.Type: GrantFiled: February 17, 1987Date of Patent: October 25, 1988Assignee: Hoechst Celanese CorporationInventors: Shane Hsieh, Wayne A. Mitchell
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Patent number: 4728597Abstract: The invention provides an organic solvent free, phosphate free, lithographic desensitizing composition which comprises:(a) from about 0.1% to about 20.0% by weight of the composition of a copolymer of polymethyl vinyl ether and maleic acid having the formula ##STR1## which has a molecular weight in an amount of from about 20,000 to about 70,000; and(b) from about 0.1% to about 20.0% by weight of the composition of a desensitizing component comprising one or more hydroxy carboxylic acids or salts; and(c) sufficient water to formulate a desensitizing composition; and(d) sufficient base to adjust the pH of the composition into the range of from about 6.5 to about 7.5.Type: GrantFiled: February 17, 1987Date of Patent: March 1, 1988Assignee: Hoechst Celanese CorporationInventors: Shane Hsieh, Wayne A. Mitchell
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Patent number: 4721532Abstract: Removing iron fouling from heat transfer surfaces of cooling water systems with an aqueous solution of certain alkylene amine carboxyl polyacids, or water soluble salts thereof, at a pH of 5-9.Type: GrantFiled: July 22, 1986Date of Patent: January 26, 1988Assignee: W. R. Grace & Co.Inventors: Vincent R. Kuhn, Philip R. Engelhardt, Wayne A. Mitchell
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Patent number: 4717542Abstract: A process and composition using hydroxyphosphonoacetic acid or its water-soluble salts in combination with certain copolymers, such as water-soluble 1-acrylamido-2-methylpropane sulfonic acid copolymers with acrylic acid or methacrylic acid, provide improved corrosion protection for iron based metal in contact with the system water of aqueous systems.Type: GrantFiled: January 23, 1987Date of Patent: January 5, 1988Assignee: W. R. Grace & Co.Inventor: Wayne A. Mitchell
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Patent number: 4649025Abstract: Composition for inhibition of ferrous metal corrosion consisting essentially of (a) HEDPA compound and (b) HPAA compound. Optionally the composition may also include (c) an azole.Type: GrantFiled: September 16, 1985Date of Patent: March 10, 1987Assignee: W. R. Grace & Co.Inventors: Chih M. Hwa, Wayne A. Mitchell
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Patent number: 4592992Abstract: The invention provides a method for developing negative working photographic elements using an aqueous developer comprising(a) .alpha.-hydroxy toluene; and(b) C.sub.12 sodium alkyl ether sulfate.Type: GrantFiled: April 11, 1985Date of Patent: June 3, 1986Assignee: American Hoechst CorporationInventors: Shane Hsieh, Wayne A. Mitchell