Abstract: A plasma cutting system includes a plasma torch having a head, and a housing. A power supply is disposed within the housing and is in communication with the plasma torch. The power supply is configured to provide an output current for generating and maintaining a plasma cutting arc by the plasma torch, and includes a control processor in communication with a plurality of autonomous switching circuits via a multi-node communications bus. Each of the autonomous switching circuits includes a microcontroller configured to control the generation of a portion of the output current based on messages received from the control processor, monitor operating parameters of the autonomous switching circuit, and modify a control parameter of the autonomous switching circuit independent of and asynchronous to the other autonomous switching circuits of the plurality of autonomous switching circuits when one or more of the operating parameters exceeds a predetermined threshold.

Abstract: A consumable component for a thermal processing torch is provided. The consumable component includes a consumable component body and a signal device located on or within the consumable component body for transmitting a signal associated with the consumable component. The signal can be independent of a detectable physical characteristic of the consumable component.

Abstract: A plasma cutting system includes a plasma torch having a head, and a housing. A power supply is disposed within the housing and is in communication with the plasma torch. The power supply is configured to provide an output current for generating and maintaining a plasma cutting arc by the plasma torch, and includes a control processor in communication with a plurality of autonomous switching circuits via a multi-node communications bus. Each of the autonomous switching circuits includes a microcontroller configured to control the generation of a portion of the output current based on messages received from the control processor, monitor operating parameters of the autonomous switching circuit, and modify a control parameter of the autonomous switching circuit independent of and asynchronous to the other autonomous switching circuits of the plurality of autonomous switching circuits when one or more of the operating parameters exceeds a predetermined threshold.

Abstract: Transformer flux is monitored to determine if an onset of flux saturation is detected. If flux saturation is not detected, the transformer drive signal is received to a switch that maintains the polarity of the transformer flux. If flux saturation is detected, the transformer drive signal is received by a switch that reverses the polarity of the transformer signal and the transformer flux. This reversal of flux polarity can occur multiple times, during the carrier cycle of the drive signal, without compromising the dynamics of the transformer main control loop or requiring the drive signal to be regenerated.

Abstract: Transformer flux is monitored to determine if an onset of flux saturation is detected. If flux saturation is not detected, the transformer drive signal is received to a switch that maintains the polarity of the transformer flux. If flux saturation is detected, the transformer drive signal is received by a switch that reverses the polarity of the transformer signal and the transformer flux. This reversal of flux polarity can occur multiple times, during the carrier cycle of the drive signal, without compromising the dynamics of the transformer main control loop or requiring the drive signal to be regenerated.

Abstract: A consumable component for a thermal processing torch is provided. The consumable component includes a consumable component body and a signal device located on or within the consumable component body for transmitting a signal associated with the consumable component. The signal can be independent of a detectable physical characteristic of the consumable component.

Abstract: Described are methods and systems for using a planar inductor that includes a magnetically conductive core, a first planar coil and a second planar coil. The first and second planar coils are attached to a first bridge, located about the core, and are composed of a conductive material. The first and second planar coils have at least one thermally conductive surface exposed to cooling fluid. The first planar coil, the first bridge and the second planar coil are formed from a first unitary section of conductive material. The second planar coil is positioned relative to the first planar coil in a spaced relationship, which is defined by a thickness of the first bridge. An upper surface of the first planar coil is oriented toward a lower surface of the second planar coil to define a first cooling channel between the first planar coil and the second planar coil.

Abstract: Described are computer-based methods and apparatuses for automated self test for a thermal processing system. A signal to execute the automated self test is received. The automated self test is executed. The execution includes executing one or more self test instructions for the one or more subsystems of the system. Data can be received from sensors associated with the subsystems. The data can be analyzed to determine the results of the automated self test for the thermal processing system.

Abstract: Described are computer-based methods and apparatuses for automated self test for a thermal processing system. A signal to execute the automated self test is received. The automated self test is executed. The execution includes executing one or more self test instructions for the one or more subsystems of the system. Data can be received from sensors associated with the subsystems. The data can be analyzed to determine the results of the automated self test for the thermal processing system.

Abstract: A system and method is featured for controlling a process parameter of a thermal processing system by estimating an arc voltage between a plasma arc torch tip and a metallic workpiece and controlling the process parameter based on the estimated arc voltage. Particular embodiments include adjusting the height of a plasma torch based on the estimated arc voltage. A system and method is also featured for estimating an arc voltage in a thermal processing system in which a switch mode power supply provides an arc current to generate a plasma arc between a plasma arc torch tip and a metallic workpiece.