Patents by Inventor Wayne H. Choe

Wayne H. Choe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9052425
    Abstract: A silicon solar cell is provided, including a first silicon layer that absorbing sunlight, a first layer of a structure of photonic crystals formed on the first silicon layer, and a second silicon layer formed on the first layer of a structure of photonic crystals and absorbing sunlight, wherein the first silicon layer and the second silicon layer absorb sunlight at different wavelengths and the first layer of structure of photonic crystals selectively reflects light of a wavelength absorbed by the second silicon layer.
    Type: Grant
    Filed: November 28, 2011
    Date of Patent: June 9, 2015
    Assignee: SAMWON FA CO., LTD.
    Inventors: Kyung-Wook Lee, Kyung-Yul Lee, Bong-Yul Lee, Wayne H. Choe
  • Patent number: 8422848
    Abstract: Provided are a structure color of photonic crystals in which a new structure of a structure color of photonic crystals is provided so that a nanoimprint process can be performed and mass productivity is improved, a method of manufacturing thereof, and a manufacturing apparatus thereof. The method of manufacturing a structure color of photonic crystals includes: forming a plurality of basic element layers by using nanoimprinting, the plurality of basic element layers comprising a plurality of basic unit bodies each having a symmetrical cross-section and thin film connecting portions connecting the basic unit bodies! sequentially stacking the basic element layers! removing the thin film connecting portions by using etching; and determining whether the structure color of photonic crystals is completed, wherein, when it is determined that the structure color of photonic crystals is not completed, the forming, the stacking, and the removing are repeatedly performed.
    Type: Grant
    Filed: July 9, 2008
    Date of Patent: April 16, 2013
    Assignee: Emot Co., Ltd
    Inventors: Kyung Wook Lee, Kyung Yul Lee, Bong Yul Lee, Wayne H. Choe
  • Publication number: 20120118373
    Abstract: A silicon solar cell is provided, including a first silicon layer that absorbing sunlight, a first layer of a structure of photonic crystals formed on the first silicon layer, and a second silicon layer formed on the first layer of a structure of photonic crystals and absorbing sunlight, wherein the first silicon layer and the second silicon layer absorb sunlight at different wavelengths and the first layer of structure of photonic crystals selectively reflects light of a wavelength absorbed by the second silicon layer.
    Type: Application
    Filed: November 28, 2011
    Publication date: May 17, 2012
    Applicant: EMOT Co., LTD.
    Inventors: Kyung-Wook LEE, Kyung-Yul Lee, Bong-Yul Lee, Wayne H. Choe
  • Publication number: 20100296787
    Abstract: Provided are a structure colour of photonic crystals in which a new structure of a structure colour of photonic crystals is provided so that a nanoimprint process can be performed and mass productivity is improved, a method of manufacturing thereof, and a manufacturing apparatus thereof. The method of manufacturing a structure colour of photonic crystals includes: forming a plurality of basic element layers by using nanoimprinting, the plurality of basic element layers comprising a plurality of basic unit bodies each having a symmetrical cross-section and thin film connecting portions connecting the basic unit bodies! sequentially stacking the basic element layers! removing the thin film connecting portions by using etching; and determining whether the structure colour of photonic crystals is completed, wherein, when it is determined that the structure colour of photonic crystals is not completed, the forming, the stacking, and the removing are repeatedly performed.
    Type: Application
    Filed: July 9, 2008
    Publication date: November 25, 2010
    Inventors: Kyung Wook Lee, Kyung Yul Lee, Bong Yul Lee, Wayne H. Choe
  • Patent number: 7171919
    Abstract: Disclosed herewith is a diamond film depositing apparatus using microwaves and plasma. The apparatus comprises a rectangular wave guide (125), a mode transition coupler (120), an antenna rod (130), a quartz bell jar (140), a workpiece holder (116), a microwave cavity resonator (112), a source gas inflow ring (160), a mechanical support cylinder (164), a cooling jacket (165), gas inflow and outflow conduits (172 and 174) and a vacuum seal (190). The microwave cavity resonator (112) has a cylindrical shape the diameter of which is decreased in a downward direction. The microwave cavity resonator (112) may have a hemispherical shape, the flat surface of which is oriented upward.
    Type: Grant
    Filed: March 27, 2001
    Date of Patent: February 6, 2007
    Assignee: Small Business Corporation
    Inventors: Hee-Sik Sohn, Wayne H. Choe
  • Publication number: 20040134431
    Abstract: Disclosed herewith is a diamond film depositing apparatus using microwaves and plasma. The apparatus comprises a rectangular wave guide (125), a mode transition coupler (120), an antenna rod (130), a quartz bell jar (140), a workpiece holder (116), a microwave cavity resonator (112), a source gas inflow ring (160), a mechanical support cylinder (164), a cooling jacket (165), gas inflow and outflow conduits (172 and 174) and a vacuum seal (190). The microwave cavity resonator (112) has a cylindrical shape the diameter of which is decreased in a downward direction. The microwave cavity resonator (112) may have a hemispherical shape, the flat surface of which is oriented upward.
    Type: Application
    Filed: March 3, 2004
    Publication date: July 15, 2004
    Inventors: Hee-Sik Sohn, Wayne H Choe