Abstract: A method of and apparatus for identifying the presence of thin photocatalytic (PCAT) coatings on glass surfaces. An apparatus is disclosed that can determine whether a PCAT coating (which may comprise titanium dioxide, for example) having a thickness of less than about 100 ? is present on the surface of a substrate such as glass. The apparatus may measure the reflectance of electromagnetic energy (such as light energy) at the surface of a substrate using energy at selected wavelengths or wavelength ranges. The apparatus may determine reflectance values for PCAT coated surfaces of any thickness, as well as for uncoated surfaces.

Abstract: A method of and apparatus for identifying the presence of thin photocatalytic (PCAT) coatings on glass surfaces. An apparatus is disclosed that can determine whether a PCAT coating (which may comprise titanium dioxide, for example) having a thickness of less than about 100 ? is present on the surface of a substrate such as glass. The apparatus may measure the reflectance of electromagnetic energy (such as light energy) at the surface of a substrate using energy at selected wavelengths or wavelength ranges. The apparatus may determine reflectance values for PCAT coated surfaces of any thickness, as well as for uncoated surfaces.

Abstract: The invention provides high shading performance, low-emissivity coatings. The invention provides a monolithic pane bearing a high shading performance, low-emissivity coating. The invention also provides an insulating glass unit bearing a high shading performance, low-emissivity coating. Finally, the invention provides methods of producing coated substrates by depositing high shading performance, low-emissivity coatings.

Abstract: The invention provides low solar reflectance, low-emissivity coatings. The invention provides a monolithic pane bearing a low solar reflectance, low-emissivity coating. Further, the invention provides an insulating glass unit bearing a low solar reflectance, low-emissivity coating. Finally, the invention provides methods of producing coated substrates by depositing low solar reflectance, low-emissivity coatings.

Abstract: The invention provides low solar reflectance, low-emissivity coatings. The invention also provides a pane bearing a low solar reflectance, low-emissivity coating. Further, the invention provides an insulating glass unit comprising first and second panes held in a spaced-apart configuration, wherein the panes have confronting inner surfaces oriented toward a between-pane space and opposed outer surfaces oriented away from the between-pane space, and wherein one of these inner surfaces bears a low solar reflectance, low-emissivity coating. Also provided are methods of producing coated substrates.

Abstract: Transparent articles comprising transparent, nonmetallic substrate and a transparent film stack is sputter deposited on the substrate. The film stack is characterized by including at least one infrared reflective metal film, a dielectric film over the metal film, and a protective silicon nitride film of 10 ? to 150 ? in thickness over the said dielectric film. The dielectric film desirably has substantially the same index of refraction as does silicon nitride and is contiguous with the silicon nitride film.

Abstract: Transparent articles comprising transparent, nonmetallic substrate and a transparent film stack is sputter deposited on the substrate. The film stack is characterized by including at least one infrared reflective metal film, a dielectric film over the metal film, and a protective silicon nitride film of 10 ? to 150 ? in thickness over the said dielectric film. The dielectric film desirably has substantially the same index of refraction as does silicon nitride and is contiguous with the silicon nitride film.

Abstract: Transparent articles comprising transparent, nonmetallic substrate and a transparent film stack is sputter deposited on the substrate. The film stack is characterized by including at least one infrared reflective metal film, a dielectric film over the metal film, and a protective silicon nitride film of 10 Å to 150 Å in thickness over the said dielectric film. The dielectric film desirably has substantially the same index of refraction as does silicon nitride and is contiguous with the silicon nitride film.

Abstract: Transparent articles comprising transparent, nonmetallic substrate and a transparent film stack is sputter deposited on the substrate. The film stack is characterized by including at least one infrared reflective metal film, a dielectric film over the metal film, and a protective silicon nitride film of 10 Å to 150 Å in thickness over the said dielectric film. The dielectric film desirably has substantially the same index of refraction as does silicon nitride and is contiguous with the silicon nitride film.

Abstract: Transparent articles comprising transparent, nonmetallic substrate and a transparent film stack is sputter deposited on the substrate. The film stack is characterized by including at least one infrared reflective metal film, a dielectric film over the metal film, and a protective silicon nitride film of 10 .ANG. to 150 .ANG. in thickness over the said dielectric film. The dielectric film desirably has substantially the same index of refraction as does silicon nitride and is contiguous with the silicon nitride film.