Patents by Inventor Wayne Lo

Wayne Lo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160350699
    Abstract: A system includes a contact center to provide an interaction between a customer and agent. A forms manager of the contact center generates a question for an evaluation form. A workforce management server connects with the forms manager, the workforce management server to schedule a work time for the agent. The workforce management server to schedule the forms manager to generate the evaluation form when the agent is working.
    Type: Application
    Filed: May 30, 2015
    Publication date: December 1, 2016
    Inventors: Leon Vymenets, Cayley MacArthur, Yochai Konig, Wayne Lo, Praphul Kumar, Herbert Ristock
  • Patent number: 7262418
    Abstract: A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.
    Type: Grant
    Filed: April 15, 2004
    Date of Patent: August 28, 2007
    Assignee: Applied Materials, Inc.
    Inventors: Chiwoei Wayne Lo, Xinrong Jiang
  • Patent number: 7253645
    Abstract: A method of detecting defects in a patterned substrate includes positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle-beam optical column having a field of view (FOV) with a substantially uniform resolution over the FOV; operating the charged-particle-beam optical column to acquire images of a region of the patterned substrate lying within the FOV by scanning the charged-particle beam over the patterned substrate; and comparing the acquired images to a reference to identify defects in the patterned substrate.
    Type: Grant
    Filed: February 28, 2005
    Date of Patent: August 7, 2007
    Assignee: Applied Materials, Inc.
    Inventors: Christopher G. Talbot, Chiwoei Wayne Lo
  • Publication number: 20060195461
    Abstract: A system and a method for organizing and retrieving information are provided. The system is running on a computer system accessible for interactive communication with users. The computer system runs a crosslink database stored therein. The crosslink database includes a crosslink data structure comprising at least a connecting node and at least a first element and a second element connected to the connecting node by a link; and a browser for interactively communicating with the users for organizing and retrieving/revising information in the cross link database. The first element is related to the second element and can be traced via the connecting node. The second element is related to the first element and can be traced via the connecting node. The connecting node may correspond to a context of information, and wherein the first element and the second element constitute different topics of information related to the context of information.
    Type: Application
    Filed: January 24, 2006
    Publication date: August 31, 2006
    Applicant: InfoMato
    Inventors: Wayne Lo, Ru Luo-Hsu
  • Publication number: 20060184566
    Abstract: A system and a method for organizing and retrieving information are provided. The system is running on a computer system accessible for interactive communication with users. The computer system runs a crosslink database stored therein. The crosslink database includes a crosslink data structure comprising at least a connecting node and at least a first element and a second element connected to the connecting node by a link; and a browser for interactively communicating with the users for organizing and retrieving/revising information in the cross link database. The first element is related to the second element and can be traced via the connecting node. The second element is related to the first element and can be traced via the connecting node. The connecting node may correspond to a context of information, and wherein the first element and the second element constitute different topics of information related to the context of information.
    Type: Application
    Filed: December 5, 2005
    Publication date: August 17, 2006
    Applicant: infoMato
    Inventors: Wayne Lo, Ru Luo-Hsu
  • Patent number: 7067809
    Abstract: A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.
    Type: Grant
    Filed: April 15, 2004
    Date of Patent: June 27, 2006
    Assignee: Applied Materials, Inc.
    Inventors: Chiwoei Wayne Lo, Xinrong Jiang
  • Patent number: 6914441
    Abstract: One embodiment of the present invention is a method of detecting defects in a patterned substrate, including: (a) positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle-beam optical column having a field of view (FOV) with a substantially uniform resolution over the FOV; (b) operating the charged-particle-beam optical column to acquire images of a region of the patterned substrate lying within the FOV by scanning the charged-particle beam over the patterned substrate; and (c) comparing the acquired images to a reference to identify defects in the patterned substrate.
    Type: Grant
    Filed: April 29, 2002
    Date of Patent: July 5, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Christopher G. Talbot, Chiwoei Wayne Lo
  • Patent number: 6750455
    Abstract: A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.
    Type: Grant
    Filed: July 2, 2001
    Date of Patent: June 15, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Chiwoe Wayne Lo, Xinrong Jiang
  • Patent number: 6566897
    Abstract: Defects in a patterned substrate are detected by inspection with a charged particle beam inspection tool which generates an image of a portion of the patterned substrate and compares the image with a reference in order to identify any defects in the patterned substrate. Parameters of the tool are optimized to improve image uniformity and contrast, particularly voltage contrast. Prior to imaging an area of the substrate, the tool charges an area surrounding the image area to eliminate or reduce the effects caused by asymmetrical charging in the surrounding area. The tool alternates between charging the surrounding area and imaging the image area to produce a plurality of images of the image area, which are then averaged. The result is a highly uniform image with improved contrast for accurate defect detection.
    Type: Grant
    Filed: December 27, 2001
    Date of Patent: May 20, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Chiwoei Wayne Lo, Kenichi Kanai
  • Patent number: 6539106
    Abstract: Methods and apparatus are provided for inspecting a patterned substrate, comprising: preparing a reference image and a test image, extracting features from the reference image and extracting features from the test image, matching features of the reference image and features of the test image; and comparing features of the reference image and of the test image to identify defects. Embodiments include apparatus for inspecting patterned substrates, computer-readable media containing instructions for controlling a system having a processor for inspecting patterned substrates, and computer program products comprising a computer usable media having computer-readable program code embodied therein for controlling a system for inspecting patterned substrates. The images can be electron-beam voltage-contrast images.
    Type: Grant
    Filed: January 8, 1999
    Date of Patent: March 25, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Harry S. Gallarda, Chiwoei Wayne Lo, Adam Rhoads, Christopher G. Talbot
  • Patent number: 6509750
    Abstract: Defects in a patterned substrate are detected by positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle imaging system having a field of view (FOV) with a substantially uniform resolution over the FOV; operating the charged-particle-beam optical column to acquire images over multiple subareas of the patterned substrate lying within the FOV by scanning a charged-particle beam over the patterned substrate while maintaining the charged-particle-beam optical column fixed relative to the patterned substrate; and comparing the acquired images to a reference to identify defects in the patterned substrate. The use of a large-FOV imaging system with substantially uniform resolution over the FOV allows acquisition of images over a wide area of the patterned substrate without requiring mechanical stage moves, thereby reducing the time overhead associated with mechanical stage moves. Multiple columns can be ganged together to further improve throughput.
    Type: Grant
    Filed: April 30, 2001
    Date of Patent: January 21, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Christopher G. Talbot, Chiwoei Wayne Lo
  • Patent number: 6504393
    Abstract: A method of testing a semiconductor structure such as a finished or part-finished semiconductor wafer, a die on such a wafer, part of such a die, or even one functional element (e.g. a transistor or memory cell) of such a die. The method includes the steps of charging at least a part of the semiconductor structure; applying an electric field perpendicular to a surface of the structure while charging so as to determine charging potential and polarity (i.e. charging either positively or negatively); interrogating the structure including the charged part with a charged particle beam, such as an electron beam, so as to obtain voltage contrast data for the structure; and analyzing the data to determine the functionality of the element.
    Type: Grant
    Filed: July 15, 1997
    Date of Patent: January 7, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Chiwoei Wayne Lo, Mariel Stoops, Christopher Graham Talbot
  • Publication number: 20030001095
    Abstract: A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.
    Type: Application
    Filed: July 2, 2001
    Publication date: January 2, 2003
    Applicant: Schlumberger Technologies, Inc.
    Inventors: Chiwoe Wayne Lo, Xinrong Jiang
  • Publication number: 20020166964
    Abstract: Abstract of the Disclosure One embodiment of the present invention is a method of detecting defects in a patterned substrate, including: (a) positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle-beam optical column having a field of view (FOV) with a substantially uniform resolution over the FOV;. (b) operating the charged-particle-beam optical column to acquire images of a region of the patterned substrate lying within the FOV by scanning the charged-particle beam over the patterned substrate; and (c) comparing the acquired images to a reference to identify defects in the patterned substrate.
    Type: Application
    Filed: April 29, 2002
    Publication date: November 14, 2002
    Inventors: Christopher G. Talbot, Chiwoei Wayne Lo
  • Publication number: 20020149381
    Abstract: Defects in a patterned substrate are detected by inspection with a charged particle beam inspection tool which generates an image of a portion of the patterned substrate and compares the image with a reference in order to identify any defects in the patterned substrate. Parameters of the tool are optimized to improve image uniformity and contrast, particularly voltage contrast. Prior to imaging an area of the substrate, the tool charges an area surrounding the image area to eliminate or reduce the effects caused by asymmetrical charging in the surrounding area. The tool alternates between charging the surrounding area and imaging the image area to produce a plurality of images of the image area, which are then averaged. The result is a highly uniform image with improved contrast for accurate defect detection.
    Type: Application
    Filed: December 27, 2001
    Publication date: October 17, 2002
    Inventors: Chiwoei Wayne Lo, Kenichi Kanai
  • Patent number: 6344750
    Abstract: Defects in a patterned substrate are detected by inspection with a charged particle beam inspection tool which generates an image of a portion of the patterned substrate and compares the image with a reference in order to identify any defects in the patterned substrate. Parameters of the tool are optimized to improve image uniformity and contrast, particularly voltage contrast. Prior to imaging an area of the substrate, the tool charges an area surrounding the image area to eliminate or reduce the effects caused by asymmetrical charging in the surrounding area. The tool alternates between charging the surrounding area and imaging the image area to produce a plurality of images of the image area, which are then averaged. The result is a highly uniform image with improved contrast for accurate defect detection.
    Type: Grant
    Filed: January 8, 1999
    Date of Patent: February 5, 2002
    Assignee: Schlumberger Technologies, Inc.
    Inventors: Chiwoei Wayne Lo, Kenichi Kanai
  • Patent number: 6252705
    Abstract: A stage assembly for holding a work-piece in a charged particle microscopy system includes a magnetic motor (e.g., brushless linear servo motor) for driving an X-platform riding on a base along the X axis, a non-magnetic linear motor (e.g., piezoelectric motor) for driving a Y-platform riding on the X-platform along the Y axis, and a non-magnetic rotary motor (e.g., piezoelectric motor) for rotating a rotary platform over the Y-platform, wherein the duty cycle of the magnetic motor is substantially greater than the duty cycle of the non-magnetic linear and rotary motors. This along with the particular arrangement of the motors and the platforms yields a compact, durable, and vacuum compatible stage which has minimal mechanical vibrations, minimal interference with the charged particle microscope, minimal particle generation, and high speed area coverage.
    Type: Grant
    Filed: May 25, 1999
    Date of Patent: June 26, 2001
    Assignee: Schlumberger Technologies, Inc.
    Inventors: Chiwoei Wayne Lo, Daniel N. Bui
  • Patent number: 6252412
    Abstract: Defects in a patterned substrate are detected by positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle imaging system having a field of view (FOV) with a substantially uniform resolution over the FOV; operating the charged-particle-beam optical column to acquire images over multiple subareas of the patterned substrate lying within the FOV by scanning a charged-particle beam over the patterned substrate while maintaining the charged-particle-beam optical column fixed relative to the patterned substrate; and comparing the acquired images to a reference to identify defects in the patterned substrate. The use of a large- FOV imaging system with substantially uniform resolution over the FOV allows acquisition of images over a wide area of the patterned substrate without requiring mechanical stage moves, thereby reducing the time overhead associated with mechanical stage moves. Multiple columns can be ganged together to further improve throughput.
    Type: Grant
    Filed: January 8, 1999
    Date of Patent: June 26, 2001
    Assignee: Schlumberger Technologies, Inc.
    Inventors: Christopher G. Talbot, Chiwoei Wayne Lo
  • Patent number: 6232787
    Abstract: Methods of inspecting a microstructure comprise: applying charged particles to the wafer to negatively charge up the wafer over a region having contact or via holes, scanning a charged-particle beam over the region while detecting secondary particles so as to produce a detector signal, determining from the detector signal an apparent dimension of a contact hole, and comparing the apparent dimension of the contact hole with reference information to identify a defect. The reference information can be a conventional voltage-contrast image or can be design data indicating expected physical size of the contact hole and expected electrical connectivity of material within or beneath the contact hole. The wafer can be charged up by directing a flood of electrons toward a surface of the wafer and/or by controlling potential of an energy filter so as to direct secondary electrons back to the wafer while directing a charged-particle beam at the wafer.
    Type: Grant
    Filed: January 8, 1999
    Date of Patent: May 15, 2001
    Assignee: Schlumberger Technologies, Inc.
    Inventors: Chiwoei Wayne Lo, Pierre Perez
  • Patent number: 6091249
    Abstract: A method for detecting electrical defects in a semiconductor wafer, includes the steps of: a) applying charge to the wafer such that electrically isolated structures are raised to a voltage relative to electrically grounded structures; b) obtaining voltage contrast data for at least a portion of the wafer containing such structures using an electron beam; and c) analyzing the voltage contrast data to detect structures at voltages different from predetermined voltages for such structures. Voltage contrast data can take one of a number of forms. In a simple form, data for a number of positions on a line scan of an electron beam can be taken and displayed or stored as a series of voltage levels and scan positions. Alternatively, the data from a series of scans can be displayed as a voltage contrast image.
    Type: Grant
    Filed: January 23, 1998
    Date of Patent: July 18, 2000
    Assignee: Schlumberger Technologies, Inc.
    Inventors: Christopher Graham Talbot, Chiwoei Wayne Lo, Luis Camilo Orjuela, Li Wang