Patents by Inventor Wayne M. Moreau
Wayne M. Moreau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8828143Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: GrantFiled: October 2, 2007Date of Patent: September 9, 2014Assignee: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
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Publication number: 20130210235Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: ApplicationFiled: October 2, 2007Publication date: August 15, 2013Applicant: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
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Patent number: 8388758Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: GrantFiled: October 2, 2007Date of Patent: March 5, 2013Assignee: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
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Patent number: 7960095Abstract: Resist compositions having good footing properties even on difficult substrates are obtained by using a combination of base additives including a room temperature solid base, and a liquid low vapor pressure base. The compositions are especially useful on metal substrates such as chromium-containing layers commonly used in mask-making.Type: GrantFiled: February 11, 2004Date of Patent: June 14, 2011Assignee: International Business Machines CorporationInventors: Wayne M. Moreau, Marie Angelopoulos, Wu-Song Huang, David R. Medeiros, Karen E. Petrillo
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Publication number: 20090235955Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: ApplicationFiled: October 2, 2007Publication date: September 24, 2009Applicant: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
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Publication number: 20080227030Abstract: Resist compositions having good footing properties even on difficult substrates are obtained by using a combination of base additives including a room temperature solid base, and a liquid low vapor pressure base. The compositions are especially useful on metal substrates such as chromium-containing layers commonly used in mask-making.Type: ApplicationFiled: February 11, 2004Publication date: September 18, 2008Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Wayne M. Moreau, Marie Angelopoulos, Wu-Song Huang, David R. Medeiros, Karen E. Petrillo
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Patent number: 7288155Abstract: A method for cleaning a semiconductor structure including providing a chamber for holding the semiconductor structure and a dense phase fluid, providing a thermal transfer device having a thermal transfer surface, connecting the thermal transfer device to the chamber, placing the semiconductor structure in the chamber in contact with the thermal transfer surface and thermally cycling the thermal transfer surface.Type: GrantFiled: May 12, 2005Date of Patent: October 30, 2007Assignee: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario Goldfarb
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Patent number: 7081208Abstract: Methods are provided for making microfilters by subtractive techniques which remove a component or part of a filter material to form pores in the filter material and additive techniques which deposit a filter material onto a porous underlying substrate. All the methods employ a supercritical fluid or mixture which have very high solvency properties and low viscosity and CO2 is the preferred supercritical fluid.Type: GrantFiled: December 16, 2002Date of Patent: July 25, 2006Assignee: International Business Machines CorporationInventors: Kenneth J McCullough, Wayne M Moreau, Keith R Pope, Robert J Purtell, John P Simons, William A Syverson, Charles J Taft
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Patent number: 6997197Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: GrantFiled: December 13, 2002Date of Patent: February 14, 2006Assignee: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
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Patent number: 6927393Abstract: A method and apparatus are provided for in situ monitoring and analyzing of process parameters for semiconductor fabrication processes including cleaning semiconductor wafers utilizing a supercritical fluid or a high pressure liquid such as CO2. The method and apparatus utilize a spectrometer having a reflective mirror proximate the vessel holding the high pressure fluid. NIR radiation transmitted into the vessel through a window and out of the vessel through an opposed window is reflected and detected and measured and the composition of the fluid in the pressure vessel is determined allowing the user to control process parameters based on the measured composition.Type: GrantFiled: December 16, 2002Date of Patent: August 9, 2005Assignee: International Business Machines CorporationInventors: John M. Cotte, Kenneth J. McCullough, Wayne M. Moreau, Keith R. Pope, Robert J. Purtell, John P. Simons, Charles J. Taft
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Patent number: 6875286Abstract: A method and apparatus are provided for removing solid and/or liquid residues from electronic components such as semiconductor wafers utilizing liquid or supercritical carbon dioxide which is solidified on the surface of the wafer and then vaporized and removed from the system. In a preferred embodiment the solidification and vaporizing steps are repeated (cycled) before removal of the CO2 from the vessel. The residues are carried away with the vaporized carbon dioxide.Type: GrantFiled: December 16, 2002Date of Patent: April 5, 2005Assignee: International Business Machines CorporationInventors: John M. Cotte, Catherine Ivers, Kenneth J. McCullough, Wayne M. Moreau, Robert J. Purtell, John P. Simons, William A. Syverson, Charles J. Taft
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Patent number: 6821488Abstract: A chuck assembly for holding a sample includes a shaft; a generally circular chuck member, the shaft extending from a first surface of the chuck member; and a sample holder associated with a second surface of the chuck member. The second surface is opposite the first surface. A sample receiving assembly holds the sample on the sample holder so that the sample remains fixed to the sample holder when the shaft rotates and causes the chuck member and the sample holder to rotate with the shaft. The chuck assembly may be used in a reactor assembly including a reactor chamber for receiving the chuck assembly; a spindle assembly for receiving an end of the shaft distal from the chuck member; and a motor for rotating the spindle assembly and the shaft so that fluid in the chamber flows generally along the shaft in a first direction and through the openings in the chuck member, around the sample holder, and then along a wall of the chamber in a second direction generally opposite to the first direction.Type: GrantFiled: May 30, 2000Date of Patent: November 23, 2004Assignee: International Business Machines CorporationInventors: Kenneth J McCullough, Wayne M Moreau, John P Simons, Charles J Taft
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Patent number: 6821718Abstract: A negative resist composition, comprising: (a) silicon-containing polymer with pendant fused moieties selected from the group consisting of fused aliphatic moieties, homocyclic fused aromatic moieties, and heterocyclic fused aromatic and sites for reaction with a crosslinking agent, (b) an acid-sensitive crosslinking agent, and (c) a radiation-sensitive acid generator is provided. The resist composition is used to form a patterned material layer in a substrate.Type: GrantFiled: September 9, 2003Date of Patent: November 23, 2004Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Robert N. Lang, Qinghuang Lin, Wayne M. Moreau
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Publication number: 20040112406Abstract: A method and apparatus are provided for removing solid and/or liquid residues from electronic components such as semiconductor wafers utilizing liquid or supercritical carbon dioxide which is solidified on the surface of the wafer and then vaporized and removed from the system. In a preferred embodiment the solidification and vaporizing steps are repeated (cycled) before removal of the CO2 from the vessel. The residues are carried away with the vaporized carbon dioxide.Type: ApplicationFiled: December 16, 2002Publication date: June 17, 2004Applicant: International Business Machines CorporationInventors: John M. Cotte, Catherine Ivers, Kenneth J. McCullough, Wayne M. Moreau, Robert J. Purtell, John P. Simons, William A. Syverson, Charles J. Taft
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Publication number: 20040112402Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: ApplicationFiled: December 13, 2002Publication date: June 17, 2004Inventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario Goldfarb
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Publication number: 20040112865Abstract: Methods are provided for making microfilters by subtractive techniques which remove a component or part of a filter material to form pores in the filter material and additive techniques which deposit a filter material onto a porous underlying substrate. All the methods employ a supercritical fluid or mixture which have very high solvency properties and low viscosity and CO2 is the preferred supercritical fluid.Type: ApplicationFiled: December 16, 2002Publication date: June 17, 2004Applicant: International Business Machines CorporationInventors: Kenneth J. McCullough, Wayne M. Moreau, Keith R. Pope, Robert J. Purtell, John P. Simons, William A. Syverson, Charles J. Taft
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Publication number: 20040113079Abstract: A method and apparatus are provided for in situ monitoring and analyzing of process parameters for semiconductor fabrication processes including cleaning semiconductor wafers utilizing a supercritical fluid or a high pressure liquid such as CO2. The method and apparatus utilize a spectrometer having a reflective mirror proximate the vessel holding the high pressure fluid. NIR radiation transmitted into the vessel through a window and out of the vessel through an opposed window is reflected and detected and measured and the composition of the fluid in the pressure vessel is determined allowing the user to control process parameters based on the measured composition.Type: ApplicationFiled: December 16, 2002Publication date: June 17, 2004Applicant: International Business Machines CorporationInventors: John M. Cotte, Kenneth J. McCullough, Wayne M. Moreau, Keith R. Pope, Robert J. Purtell, John P. Simons, Charles J. Taft
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Patent number: 6736906Abstract: A workpiece holder for processing a workpiece in a chamber of a liquified fluid. In one embodiment, the workpiece holder includes a cylindrically shaped rotator having an exterior wall and at least one fluid guide on the exterior wall. The rotator is adapted to rotate and provide fluid flow across a first end of the rotator, and is adapted to provide fluid flow and mixing perpendicular to a surface of the first end of the rotator. A fixture is coupled to the first end of the rotator for securing the workpiece to the first end of the rotator.Type: GrantFiled: April 10, 2002Date of Patent: May 18, 2004Assignee: International Business Machines CorporationInventors: John M. Cotte, Matteo Flotta, Kenneth J. McCullough, Wayne M. Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
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Publication number: 20040048204Abstract: A negative resist composition, comprising:Type: ApplicationFiled: September 9, 2003Publication date: March 11, 2004Applicant: International Business MachinesInventors: Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Robert N. Lang, Qinghuang Lin, Wayne M. Moreau
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Publication number: 20040038155Abstract: The invention relates generally to photolithographic techniques, and particularly, but not by way of limitation, to a method for preventing the collapse of the image pattern during the stage of drying the image. The invention also relates to structures fabricated using the inventive method.Type: ApplicationFiled: August 25, 2003Publication date: February 26, 2004Inventors: Jphn P. Simons, Kenneth J. McCullough, Wayne M. Moreau, Charles J. Taft