Patents by Inventor Wayne R. Messer

Wayne R. Messer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma developable photoresist compositions containing perylene coumarin photosensitizer
    Patent number: 4698286
    Abstract: Disclosed are plasma developable photoresist compositions that possess photosensitivity to 436 n.m. light and maintain this photosensitivity for suitable periods of time after coating are obtainable. These compositions comprise perylene, certain perylene derivatives, or certain coumarin derivatives as photosensitizers in combination with N-vinyl monomers, haloalkene photoinitiators, and suitable polymeric binders in a suitable solvent.
    Type: Grant
    Filed: June 3, 1985
    Date of Patent: October 6, 1987
    Assignee: Hercules Incorporated
    Inventor: Wayne R. Messer
  • Photopolymer process and composition employing a photooxidizable component capable of forming endoperoxides
    Patent number: 4666824
    Abstract: The photosensitive composition of this invention contains (1) an ethylenically unsaturated component capable of forming a high polymer by addition polymerization or crosslinking, (2) a cyclic cisoid conjugated diene as a photooxidizable component capable of reacting with singlet oxygen to form an endoperoxide, and (3) a photooxygenation sensitizer. A process for preparing a photosensitive element, such as a relief printing plate, embodying a layer of such a composition is described.
    Type: Grant
    Filed: March 15, 1985
    Date of Patent: May 19, 1987
    Assignee: Hercules Incorporated
    Inventor: Wayne R. Messer
  • Photopolymer process and composition employing a photooxidizable component capable of forming endoperoxides
    Patent number: 4563413
    Abstract: The photosensitive composition of this invention contains (1) an ethylenically unsaturated component capable of forming a high polymer by addition polymerization or crosslinking, (2) a cyclic cisoid conjugated diene as a photooxidizable component capable of reacting with singlet oxygen to form an endoperoxide, and (3) a photooxygenation sensitizer. A process for preparing a photosensitive element, such as a relief printing plate, embodying a layer of such a composition is described.
    Type: Grant
    Filed: April 23, 1984
    Date of Patent: January 7, 1986
    Assignee: Hercules Incorporated
    Inventor: Wayne R. Messer