Patents by Inventor Wayne Vereb

Wayne Vereb has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060084283
    Abstract: A silicon nitride layer is deposited on a substrate within a processing region by introducing a silicon containing precursor into the processing region, exhausting gases in the processing region including the silicon containing precursor while uniformly, gradually reducing a pressure of the processing region, introducing a nitrogen containing precursor into the processing region, and exhausting gases in the processing region including the nitrogen containing precursor while uniformly, gradually reducing a pressure of the processing region. During the steps of exhausting, the slope of the pressure decrease with respect to time is substantially constant.
    Type: Application
    Filed: October 20, 2004
    Publication date: April 20, 2006
    Inventors: Ajit Paranjpe, Kangzhan Zhang, Brendan McDougall, Wayne Vereb, Michael Patten, Alan Goldman, Somnath Nag