Patents by Inventor Wei Beng Ng

Wei Beng Ng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9735464
    Abstract: A tracking system comprising: a transmitter configured to steer an RF beam across a detection range, a passive RFID tag configured to be enabled for locating substantially when located in the center of the RF beam of the transmitter, and an RFID reader configured to detect the tag 104 once enable.
    Type: Grant
    Filed: October 31, 2013
    Date of Patent: August 15, 2017
    Assignee: SONY CORPORATION
    Inventors: Meysam Sabahialshoara, Wei Beng Ng, Hisashi Masuda
  • Publication number: 20140125459
    Abstract: A tracking system comprising: a transmitter configured to steer an RF beam across a detection range, a passive RFID tag configured to be enabled for locating substantially when located in the centre of the RF beam of the transmitter, and an RFID reader configured to detect the tag 104 once enable.
    Type: Application
    Filed: October 31, 2013
    Publication date: May 8, 2014
    Inventors: Meysam Sabahialshoara, Wei Beng Ng, Hisashi Masuda
  • Patent number: 8507330
    Abstract: A method is proposed for producing a thin-film transistor (TFT), the method comprising forming a substrate, applying a ZnO-based precursor solution onto the substrate to form a ZnO-based channel layer, annealing the channel layer, forming a source electrode and a drain electrode on the channel layer, forming a dielectric layer on the channel layer and forming a gate electrode on the dielectric layer.
    Type: Grant
    Filed: July 28, 2010
    Date of Patent: August 13, 2013
    Assignee: Sony Corporation
    Inventors: Chunmei Wang, Wei Beng Ng, Takehisa Ishida
  • Patent number: 8303794
    Abstract: A magnetic material comprises 50-80 wt % of Cobalt, 9-15 wt % of Nickel, 10-25 wt % of Rhenium, 0.1 to 2.0 wt % of Phosphorus, and 5-10 wt % of Tungsten or Platinum. It can be formed as a layer having good vertical magnetic properties (e.g. when magnetised it can provide a high magnetic field strength in the direction perpendicular to the plane of the layer). The layer preferably has a thickness of above 1 ?m. It can be formed by electroplating. The layer is useful for inclusion in a MEMS device.
    Type: Grant
    Filed: August 29, 2008
    Date of Patent: November 6, 2012
    Assignee: Sony Corporation
    Inventors: Wei Beng Ng, Akio Takada
  • Patent number: 8159121
    Abstract: A field effect electron emitting apparatus comprising a substrate, a plurality of wires embedded in the substrate, at least a portion of each wire being exposed from the substrate and extending generally perpendicularly therefrom and including magnetic material, wherein the average wire spacing is less than 30 ?m, the average spacing height ratio is between 1 and 3 and the average wire aspect ratio is greater than 3. Also a method of manufacturing an electron emitting apparatus, a field effect display having such a field effect electron emitting apparatus, an illumination apparatus having such a field effect electron emitting apparatus, and a backlight apparatus for a liquid crystal display having such a field effect electron emitting apparatus.
    Type: Grant
    Filed: November 19, 2008
    Date of Patent: April 17, 2012
    Assignee: Sony Corporation
    Inventors: Wei Beng Ng, Takehisa Ishida
  • Patent number: 8004167
    Abstract: A field effect electron emitting apparatus using nano-wire electron emitters is disclosed where each nano-wire electron emitter may be grown in a pore of an insulating layer and/or may have at least a portion exposed from the pore. A method of manufacturing a field effect electron emitting apparatus is also disclosed. The field effect electron emitting apparatus may be used in a display.
    Type: Grant
    Filed: August 21, 2007
    Date of Patent: August 23, 2011
    Assignee: Sony Corporation
    Inventors: Takehisa Ishida, Wei Beng Ng
  • Publication number: 20110031490
    Abstract: A method is proposed for producing a thin-film transistor (TFT), the method comprising forming a substrate, applying a ZnO-based precursor solution onto the substrate to form a ZnO-based channel layer, annealing the channel layer, forming a source electrode and a drain electrode on the channel layer, forming a dielectric layer on the channel layer and forming a gate electrode on the dielectric layer.
    Type: Application
    Filed: July 28, 2010
    Publication date: February 10, 2011
    Applicant: SONY CORPORATION
    Inventors: CHUNMEI WANG, WEI BENG NG, TAKEHISA ISHIDA
  • Patent number: 7847475
    Abstract: A field effect electron emitting apparatus is prepared by depositing a plurality of nano-wires 216 onto a substrate 200 having a cathode layer 214. The deposition occurs by suspending the nano-wires 216 in a plating solution, and plating the substrate with a metal layer 202, thereby entrapping the nano-wires. The nano-wires 216 are composed of an electrically-conductive magnetic material, and the deposition process is carried out in the presence of a magnetic field perpendicular to the substrate 200 so that the nano-wires 216 are aligned by the field.
    Type: Grant
    Filed: February 26, 2008
    Date of Patent: December 7, 2010
    Assignee: Sony Corporation
    Inventors: Takehisa Ishida, Wei Beng Ng
  • Patent number: 7771650
    Abstract: A material comprising cobalt (Co), platinum (Pt) and phosphorus (P) having a composition of 94-98 wt % Co, 0-1 wt % Pt and 2-4 wt % P. The material may be subjected to annealing at a temperature between 100 and 500 degrees Celsius. The material is formed by electroplating a substrate in a suitable electrochemical bath. The electroplated CoPtP material forms a layer on the substrate. The CoPtP material has enhanced perpendicular magnetic properties and may be advantageous for use in microelectromechanical system (MEMS) devices.
    Type: Grant
    Filed: January 24, 2006
    Date of Patent: August 10, 2010
    Assignee: Sony Corporation
    Inventors: Wei Beng Ng, Akio Takada
  • Publication number: 20090225532
    Abstract: A field effect electron emitting apparatus comprising a substrate, a plurality of wires embedded in the substrate, at least a portion of each wire being exposed from the substrate and extending generally perpendicularly therefrom and including magnetic material, wherein the average wire spacing is less than 30 ?m, the average spacing height ratio is between 1 and 3 and the average wire aspect ratio is greater than 3. Also a method of manufacturing an electron emitting apparatus, a field effect display having such a field effect electron emitting apparatus, an illumination apparatus having such a field effect electron emitting apparatus, and a backlight apparatus for a liquid crystal display having such a field effect electron emitting apparatus.
    Type: Application
    Filed: November 19, 2008
    Publication date: September 10, 2009
    Applicant: Sony Corporation
    Inventors: Wei Beng NG, Takehisa Ishida
  • Publication number: 20090065366
    Abstract: A magnetic material comprises 50-80 wt % of Cobalt, 9-15 wt % of Nickel, 10-25 wt % of Rhenium, 0.1 to 2.0 wt % of Phosphorus, and 5-10 wt % of Tungsten or Platinum. It can be formed as a layer having good vertical magnetic properties (e.g. when magnetised it can provide a high magnetic field strength in the direction perpendicular to the plane of the layer). The layer preferably has a thickness of above 1 ?m. It can be formed by electroplating. The layer is useful for inclusion in a MEMS device.
    Type: Application
    Filed: August 29, 2008
    Publication date: March 12, 2009
    Inventors: Wei Beng NG, Akio Takada
  • Publication number: 20080291366
    Abstract: A field effect electron emitting apparatus is prepared by depositing a plurality of nano-wires 216 onto a substrate 200 having a cathode layer 214. The deposition occurs by suspending the nano-wires 216 in a plating solution, and plating the substrate with a metal layer 202, thereby entrapping the nano-wires. The nano-wires 216 are composed of an electrically-conductive magnetic material, and the deposition process is carried out in the presence of a magnetic field perpendicular to the substrate 200 so that the nano-wires 216 are aligned by the field.
    Type: Application
    Filed: February 26, 2008
    Publication date: November 27, 2008
    Applicant: Sony Corporation
    Inventors: Takehisa ISHIDA, Wei Beng Ng
  • Patent number: 7435485
    Abstract: A magnetic material comprises 50-80 wt % of Cobalt, 9-15 wt% of Nickel, 10-25 wt% of Rhenium, 0.1 to 2.0 wt% of Phosphorus, and 5-10 wt % of Tungsten or Platinum. It can be formed as a layer having good vertical magnetic properties (e.g. when magnetised it can provide a high magnetic field strength in the direction perpendicular to the plane of the layer). The layer preferably has a thickness of above 1 ?m. It can be formed by electroplating. The layer is useful for inclusion in a MEMS device.
    Type: Grant
    Filed: June 27, 2005
    Date of Patent: October 14, 2008
    Assignee: Sony Corporation
    Inventors: Wei Beng Ng, Akio Takada
  • Publication number: 20080182100
    Abstract: A magnetic anodized aluminium oxide has a layer of anodized aluminium oxide forming a housing for an array of nanowires of a magnetic material formed in nanopores in the layer of anodized aluminium oxide. The nanowires have their side walls embedded in the nanopores in the layer of anodized aluminium oxide for preventing oxidation of the side walls. A corresponding method is also disclosed.
    Type: Application
    Filed: June 12, 2007
    Publication date: July 31, 2008
    Applicant: SONY CORPORATION
    Inventors: Wei Beng Ng, Hiroyuki Okita