Abstract: An optical plate with protrusions, an optical structure, a backlight module and a display device are provided. The optical plate includes a main body and several protrusions. The main body has a first surface. The protrusions are formed on and projected from the first surface. An area ratio of the protrusions to the first surface is in a range of 0.03˜35%. The protrusions have a pitch in a range of 0.5˜10 mm, and a portion of the first surface other than the protrusions has a first center line mean roughness Ra in a range of 0.01˜0.1 ?m.

Abstract: An optical plate with protrusions, an optical structure, a backlight module and a display device are provided. The optical plate includes a main body and several protrusions. The main body has a first surface. The protrusions are formed on and projected from the first surface. An area ratio of the protrusions to the first surface is in a range of 0.03˜35%. The protrusions have a pitch in a range of 0.5˜10 mm, and a portion of the first surface other than the protrusions has a first center line mean roughness Ra in a range of 0.01˜0.1 ?m.

Abstract: A method for making an optical plate formed with a microstructure includes: extruding a substrate material and advancing the same to pass through a first nip formed between an embossing roller and a first pressing roller, the embossing roller having a micropatterned surface formed with a plurality of protrusions and a plurality of grooves, the protrusions and the grooves cooperatively defining a microstructure-forming space; applying a photosensitive resin to the micropatterned surface and filling the same into the microstructure-forming space upstream of the first nip to form a plurality of microelements respectively in the microstructure-forming space; allowing the photosensitive resin applied to the micropatterned surface to pass through the first nip together with the substrate material, thereby bonding the microelements to the substrate material; and irradiating and curing the photosensitive resin downstream of the first nip to form the optical plate.

Abstract: A method for making an optical plate formed with a microstructure includes: extruding a substrate material and advancing the same to pass through a first nip formed between an embossing roller and a first pressing roller, the embossing roller having a micropatterned surface formed with a plurality of protrusions and a plurality of grooves, the protrusions and the grooves cooperatively defining a microstructure-forming space; applying a photosensitive resin to the micropatterned surface and filling the same into the microstructure-forming space upstream of the first nip to form a plurality of microelements respectively in the microstructure-forming space; allowing the photosensitive resin applied to the micropatterned surface to pass through the first nip together with the substrate material, thereby bonding the microelements to the substrate material; and irradiating and curing the photosensitive resin downstream of the first nip to form the optical plate.

Abstract: This invention relates to a negative photoresist composition with multi-reaction models. When the photoresist composition according to the present invention is used in photolithography processes employing UV light to produce cross-link reactions and multi-reactions including radical polymerization and cationic polymerization also occur. The photoresist composition can be used to control light reaction efficiency and increase reaction thoroughness, thus obtaining a high resolution pattern.

Abstract: A positive photoresist with uniform reactivity for use in a thick film lithography process, includes thermal curing during soft-baking and photo dissociation through UV exposure. The positive photoresist comprises a phenolic resin, a resin with acid labile groups, a photoacid generator (PAG), and a reactive monomer with vinyl ether or epoxy group. First, the resins react with the reactive monomer to perform a thermal curing step by soft-baking to form network polymers. In the UV lithography process, the exposed network polymers perform both deprotection and depolymerization simultaneously and are rendered alkali-soluble. The resulting photoresist patterns have a high aspect ratio and resolution profile, due to the good alkali dissolution contrast and uniform reactivity.

Abstract: A positive photoresist WITHuniform reactivity for use in a thick film lithography process, includes thermal curing during soft-baking and photo dissociation through UV exposure. The positive photoresist comprises a phenolic resin, a resin with acid labile groups, a photoacid generator (PAG), and a reactive monomer with vinyl ether or epoxy group. First, the resins react with the reactive monomer to perform a thermal curing step by soft-baking to form network polymers. In the UV lithography process, the exposed network polymers perform both deprotection and depolymerization simultaneously and are rendered alkali-soluble. The resulting photoresist patterns have a high aspect ratio and resolution profile, due to the good alkali dissolution contrast and uniform reactivity.

Abstract: This invention relates to a negative photoresist composition with multi-reaction models. When the photoresist composition according to the present invention is used in photolithography processes employing UV light to produce cross-link reactions and multi-reactions including radical polymerization and cationic polymerization also occur. The photoresist composition can be used to control light reaction efficiency and increase reaction thoroughness, thus obtaining a high resolution pattern.