Patents by Inventor WEI CHEN HUNG

WEI CHEN HUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PLASMA-ASSISTED ANNEALING SYSTEM AND METHOD
    Publication number: 20240079230
    Abstract: A plasma-assisted annealing system includes a high temperature furnace, a plasma-induced dissociator and a connecting duct. The plasma-induced dissociator is provided to dissociate a working gas and exhaust the dissociated working gas from its working gas outlet. Both ends of the connecting duct are connected to the working gas outlet of the plasma-induced dissociator and a gas inlet of the high temperature furnace, respectively. The working gas dissociated in the plasma-induced dissociator is introduced into the high temperature furnace via the connecting duct.
    Type: Application
    Filed: December 12, 2022
    Publication date: March 7, 2024
    Inventors: Wei-Chen Tien, Cheng-Yuan Hung, Chang-Sin Ye, Chun-Kai Huang, Yii-Der Wu