Abstract: A bonding structure that may be used to form 3D-IC devices is formed using first oblong bonding pads on a first substrate and second oblong bonding pads one a second substrate. The first and second oblong bonding pads are laid crosswise, and the bond is formed. Viewed in a first cross-section, the first bonding pad is wider than the second bonding pad. Viewed in a second cross-section at a right angle to the first, the second bonding pad is wider than the first bonding pad. Making the bonding pads oblong and angling them relative to one another reduces variations in bonding area due to shifts in alignment between the first substrate and the second substrate. The oblong shape in a suitable orientation may also be used to reduce capacitive coupling between one of the bonding pads and nearby wires.

Abstract: A display panel including a circuit board, a plurality of bonding pads, a plurality of light emitting devices, and a plurality of solder patterns is provided. The bonding pads are disposed on the circuit board, and each includes a first metal layer and a second metal layer. The second metal layer is located between the first metal layer and the circuit board. The first metal layer includes an opening overlapping the second metal layer. A material of the first metal layer is different from a material of the second metal layer. The light emitting devices are electrically bonded to the bonding pads. Each of the solder patterns electrically connects one of the light emitting devices and one of the bonding pads. The solder patterns each contact the second metal layer through the opening of the first metal layer of one of the bonding pads to form a eutectic bonding.

Abstract: A device structure according to the present disclosure may include a first die having a first substrate and a first interconnect structure, a second die having a second substrate and a second interconnect structure, and a third die having a third interconnect structure and a third substrate. The first interconnect structure is bonded to the second substrate via a first plurality of bonding layers. The second interconnect structure is bonded to the third interconnect structure via a second plurality of bonding layers. The third substrate includes a plurality of photodiodes and a first transistor. The second die includes a second transistor having a source connected to a drain of the first transistor, a third transistor having a gate connected to drain of the first transistor and the source of the second transistor, and a fourth transistor having a drain connected to the source of the third transistor.

Abstract: Various embodiments of the present disclosure are directed towards an image sensor including first chip and a second chip. The first chip includes a first substrate, a plurality of photodetectors disposed in the first substrate, a first interconnect structure disposed on a front side of the first substrate, and a first bond structure disposed on the first interconnect structure. The second chip underlies the first chip. The second chip includes a second substrate, a plurality of semiconductor devices disposed on the second substrate, a second interconnect structure disposed on a front side of the second substrate, and a second bond structure disposed on the second interconnect structure. A first bonding interface is disposed between the second bond structure and the first bond structure. The second interconnect structure is electrically coupled to the first interconnect structure by way of the first and second bond structures.

Abstract: A ferroelectric memory device and a semiconductor die are provided. The ferroelectric memory device includes a gate electrode; a channel layer, overlapped with the gate electrode; source/drain contacts, in contact with separate ends of the channel layer; a ferroelectric layer, lying between the gate electrode and the channel layer; and a first insertion layer, extending in between the ferroelectric layer and the channel layer, and comprising a metal carbonitride or a metal nitride.

Abstract: A method includes forming a gate stack, which includes a gate dielectric and a metal gate electrode over the gate dielectric. An inter-layer dielectric is formed on opposite sides of the gate stack. The gate stack and the inter-layer dielectric are planarized. The method further includes forming an inhibitor film on the gate stack, with at least a portion of the inter-layer dielectric exposed, selectively depositing a dielectric hard mask on the inter-layer dielectric, with the inhibitor film preventing the dielectric hard mask from being formed thereon, and etching to remove a portion of the gate stack, with the dielectric hard mask acting as a portion of a corresponding etching mask.

Abstract: A method of controlling a lighting fixture based on motion detection includes: receiving a plurality of captured image frames; obtaining a plurality of resampled image frames by resampling the captured image frames according to regional characteristics of the resampled image frames; dynamically adjusting a sensitivity for motion detection according to the regional characteristics of the resampled image frames; performing motion detection on the resampled image frames according to the sensitivity; and controlling the lighting fixture according to a result of the motion detection.

Abstract: A presence detection system includes a camera that captures an image; an appearance-based detector that detects appearance of an object according to the image, thereby outputting an appearance-detection signal that is asserted when the appearance is detected; a proximity detector that detects motion of the object on a predetermined detection window on the image, thereby outputting a proximity-detection signal that is asserted when the motion is detected; and a fusion unit that receives the appearance-detection signal and the proximity-detection signal, thereby outputting an object-presence signal that is asserted when the appearance-detection signal or the proximity-detection signal is asserted.

Abstract: A method of controlling a lighting fixture based on motion detection includes: receiving a plurality of captured image frames; obtaining a plurality of resampled image frames by resampling the captured image frames according to regional characteristics of the resampled image frames; dynamically adjusting a sensitivity for motion detection according to the regional characteristics of the resampled image frames; performing motion detection on the resampled image frames according to the sensitivity; and controlling the lighting fixture according to a result of the motion detection.

Abstract: A motion detection system with flicker compensation includes an image sensor that captures a first image for motion detection and a second image for flicker detection, the second image having a resolution lower than the first image; a controller that controls the image sensor to output either the first image or the second image; a motion detection device that receives first images and performs motion detection on the first images; and a flicker detection device that receives second images and performs flicker detection on the second images to generate a time offset, which is fed to the controller to update a wakeup cycle for coordinating the image sensor.

Abstract: A method for controlling an image capturing device that is operated according to a startup signal includes: configuring an image sensor array of the image capturing device by a first context to output a high-resolution image with a relatively long exposure time to a post-device; switching the first context to a second context based on the high-resolution image and a wide convergence zone; configuring the image sensor array by the second context to output one or more low-resolution images with relatively short exposure times in order to update an exposure value based on the low-resolution images; and updating the exposure value based on a narrow convergence zone to configure the image sensor array.

Abstract: A presence detection system includes a camera that captures an image; an appearance-based detector that detects appearance of an object according to the image, thereby outputting an appearance-detection signal that is asserted when the appearance is detected; a proximity detector that detects motion of the object on a predetermined detection window on the image, thereby outputting a proximity-detection signal that is asserted when the motion is detected; and a fusion unit that receives the appearance-detection signal and the proximity-detection signal, thereby outputting an object-presence signal that is asserted when the appearance-detection signal or the proximity-detection signal is asserted.

Abstract: An auto exposure control system includes a mean statistics unit that generates a weighted mean brightness value for an image array; a target control unit that determines a target brightness value according to an ambient status that is determined in accordance with an ambient light value, wherein, in one embodiment, the weighted mean brightness value is used as the ambient light value; a stabilization unit that generates stabilization control signals for the target control unit according to the ambient light value and ambient status information provided by the target control unit; and an exposure value control unit that computes a desired exposure value by comparing the target brightness value with the weighted mean brightness value and determines an exposure command according to the desired exposure value.

Abstract: An auto exposure control system includes a mean statistics unit that generates a weighted mean brightness value for an image array; a target control unit that determines a target brightness value according to an ambient status that is determined in accordance with an ambient light value, wherein, in one embodiment, the weighted mean brightness value is used as the ambient light value; a stabilization unit that generates stabilization control signals for the target control unit according to the ambient light value and ambient status information provided by the target control unit; and an exposure value control unit that computes a desired exposure value by comparing the target brightness value with the weighted mean brightness value and determines an exposure command according to the desired exposure value.

Abstract: A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivsation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.

Abstract: A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivsation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.

Abstract: A display panel includes a first substrate, a second substrate and a sealant. The first substrate has a display region and a sealant coating region, the sealant coating region surrounds the display region. The second substrate is disposed above the first substrate. The sealant is disposed between the first substrate and the second substrate and is located in the sealant coating region. The sealant includes at least one corner portion and a plurality of strip-shaped portions. The adjacent strip-shaped portions intersect at the corner portion, and a maximum width of the corner portion is larger than widths of the strip-shaped portions. A manufacturing method of the display panel is also provided.

Abstract: A liquid crystal display (LCD) panel including a first substrate, a second substrate, a liquid crystal layer, a photo-curable sealant, and a first light-shielding pattern is provided. The liquid crystal layer is disposed between the first substrate and the second substrate. The photo-curable sealant is disposed between the first substrate and the second substrate, wherein the photo-curable sealant surrounds and is in contact with the liquid crystal layer. The first light-shielding pattern is disposed on the first substrate, wherein a portion of the sidewall of the first light-shielding pattern is substantially aligned with a portion of the sidewall of the first substrate, and the first light-shielding pattern is only overlapped with an outer edge of the photo-curable sealant or is not overlapped with the photo-curable sealant.

Abstract: A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.

Abstract: A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.