Abstract: Semiconductor structures and method of forming the same are provided. A method according to the present disclosure includes providing an intermediate structure that includes an opening, conformally depositing a metal liner over the opening, depositing a dummy fill material over the metal liner, recessing the dummy fill material such that a portion of the metal liner is exposed, removing the exposed portion of the metal liner, removing the recessed dummy fill material, and after the removing of the recessed dummy fill material, depositing a metal fill layer over the opening.

Abstract: A method includes forming a dielectric layer over an epitaxial source/drain region. An opening is formed in the dielectric layer. The opening exposes a portion of the epitaxial source/drain region. A barrier layer is formed on a sidewall and a bottom of the opening. An oxidation process is performing on the sidewall and the bottom of the opening. The oxidation process transforms a portion of the barrier layer into an oxidized barrier layer and transforms a portion of the dielectric layer adjacent to the oxidized barrier layer into a liner layer. The oxidized barrier layer is removed. The opening is filled with a conductive material in a bottom-up manner. The conductive material is in physical contact with the liner layer.

Abstract: A method of forming a semiconductor device includes depositing a target metal layer in an opening. Depositing the target metal layer comprises performing a plurality of deposition cycles. An initial deposition cycle of the plurality of deposition cycles comprises: flowing a first precursor in the opening, flowing a second precursor in the opening after flowing the first precursor, and flowing a reactant in the opening. The first precursor attaches to upper surfaces in the opening, and the second precursor attaches to remaining surfaces in the opening. The first precursor does not react with the second precursor, and the reactant reacts with the second precursor at a greater rate than the reactant reacts with the first precursor.

Abstract: An occupancy sensing device comprises an ROI readout unit, configured to excerpt an ROI image from a plurality of consecutive images in response to an ROI request; an object tracking unit, coupled to the ROI readout unit, configured to perform object tracking to obtain a moving object list according to motion data of the plurality of consecutive images, determine to send the ROI request according to a first policy, and determine an object tracking result according to the moving object list and an object recognition result; an object recognition unit, coupled to the ROI readout unit, configured to perform object recognition to obtain the object recognition result according to the ROI image; and an occupancy determination unit, coupled to the object tracking unit, configured to determine an occupancy status according to the object tracking result; wherein the first policy comprises an appearance and a disappearance of an object.

Abstract: A method of controlling a lighting fixture based on motion detection includes: receiving a plurality of captured image frames; obtaining a plurality of resampled image frames by resampling the captured image frames according to regional characteristics of the resampled image frames; dynamically adjusting a sensitivity for motion detection according to the regional characteristics of the resampled image frames; performing motion detection on the resampled image frames according to the sensitivity; and controlling the lighting fixture according to a result of the motion detection.

Abstract: A presence detection system includes a camera that captures an image; an appearance-based detector that detects appearance of an object according to the image, thereby outputting an appearance-detection signal that is asserted when the appearance is detected; a proximity detector that detects motion of the object on a predetermined detection window on the image, thereby outputting a proximity-detection signal that is asserted when the motion is detected; and a fusion unit that receives the appearance-detection signal and the proximity-detection signal, thereby outputting an object-presence signal that is asserted when the appearance-detection signal or the proximity-detection signal is asserted.

Abstract: A method of controlling a lighting fixture based on motion detection includes: receiving a plurality of captured image frames; obtaining a plurality of resampled image frames by resampling the captured image frames according to regional characteristics of the resampled image frames; dynamically adjusting a sensitivity for motion detection according to the regional characteristics of the resampled image frames; performing motion detection on the resampled image frames according to the sensitivity; and controlling the lighting fixture according to a result of the motion detection.

Abstract: A motion detection system with flicker compensation includes an image sensor that captures a first image for motion detection and a second image for flicker detection, the second image having a resolution lower than the first image; a controller that controls the image sensor to output either the first image or the second image; a motion detection device that receives first images and performs motion detection on the first images; and a flicker detection device that receives second images and performs flicker detection on the second images to generate a time offset, which is fed to the controller to update a wakeup cycle for coordinating the image sensor.

Abstract: A method for controlling an image capturing device that is operated according to a startup signal includes: configuring an image sensor array of the image capturing device by a first context to output a high-resolution image with a relatively long exposure time to a post-device; switching the first context to a second context based on the high-resolution image and a wide convergence zone; configuring the image sensor array by the second context to output one or more low-resolution images with relatively short exposure times in order to update an exposure value based on the low-resolution images; and updating the exposure value based on a narrow convergence zone to configure the image sensor array.

Abstract: A presence detection system includes a camera that captures an image; an appearance-based detector that detects appearance of an object according to the image, thereby outputting an appearance-detection signal that is asserted when the appearance is detected; a proximity detector that detects motion of the object on a predetermined detection window on the image, thereby outputting a proximity-detection signal that is asserted when the motion is detected; and a fusion unit that receives the appearance-detection signal and the proximity-detection signal, thereby outputting an object-presence signal that is asserted when the appearance-detection signal or the proximity-detection signal is asserted.

Abstract: An auto exposure control system includes a mean statistics unit that generates a weighted mean brightness value for an image array; a target control unit that determines a target brightness value according to an ambient status that is determined in accordance with an ambient light value, wherein, in one embodiment, the weighted mean brightness value is used as the ambient light value; a stabilization unit that generates stabilization control signals for the target control unit according to the ambient light value and ambient status information provided by the target control unit; and an exposure value control unit that computes a desired exposure value by comparing the target brightness value with the weighted mean brightness value and determines an exposure command according to the desired exposure value.

Abstract: An auto exposure control system includes a mean statistics unit that generates a weighted mean brightness value for an image array; a target control unit that determines a target brightness value according to an ambient status that is determined in accordance with an ambient light value, wherein, in one embodiment, the weighted mean brightness value is used as the ambient light value; a stabilization unit that generates stabilization control signals for the target control unit according to the ambient light value and ambient status information provided by the target control unit; and an exposure value control unit that computes a desired exposure value by comparing the target brightness value with the weighted mean brightness value and determines an exposure command according to the desired exposure value.

Abstract: A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivsation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.

Abstract: A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivsation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.

Abstract: A display panel includes a first substrate, a second substrate and a sealant. The first substrate has a display region and a sealant coating region, the sealant coating region surrounds the display region. The second substrate is disposed above the first substrate. The sealant is disposed between the first substrate and the second substrate and is located in the sealant coating region. The sealant includes at least one corner portion and a plurality of strip-shaped portions. The adjacent strip-shaped portions intersect at the corner portion, and a maximum width of the corner portion is larger than widths of the strip-shaped portions. A manufacturing method of the display panel is also provided.

Abstract: A liquid crystal display (LCD) panel including a first substrate, a second substrate, a liquid crystal layer, a photo-curable sealant, and a first light-shielding pattern is provided. The liquid crystal layer is disposed between the first substrate and the second substrate. The photo-curable sealant is disposed between the first substrate and the second substrate, wherein the photo-curable sealant surrounds and is in contact with the liquid crystal layer. The first light-shielding pattern is disposed on the first substrate, wherein a portion of the sidewall of the first light-shielding pattern is substantially aligned with a portion of the sidewall of the first substrate, and the first light-shielding pattern is only overlapped with an outer edge of the photo-curable sealant or is not overlapped with the photo-curable sealant.

Abstract: A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.

Abstract: A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.