Patents by Inventor WEI CHIEN

WEI CHIEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100022848
    Abstract: A physiological status monitoring/positioning system is disclosed, which comprises: a physiological status sensing device, being configured with at least a sensing unit and a signal transmitting unit to be used for detecting and transmitting a physiological attribute of a living entity; a positioning device, being configured with a second signal transceiving unit to be used for transmitting a second signal to a positioning system where the location of the living entity is identified; a calculation device, being configured with a first signal transceiving unit for receiving the physiological attribute while converting the same into a bio index to be transmitted; a signal transceiver, for transmitting/receiving the bio index; and a display device, for displaying the identified location of the living entity as well as the bio index.
    Type: Application
    Filed: August 27, 2008
    Publication date: January 28, 2010
    Applicant: IMRISS TECHNOLOGY CORPORATION
    Inventors: YANG-HAN LEE, WEI CHIEN, WEI-CHEN LEE
  • Publication number: 20080020565
    Abstract: A method for creating a dual damascene structure while using only one lithography and masking step. Conventional dual damascene structures utilize two lithography steps: one to mask and expose the via, and a second step to mask and expose the trench interconnection. The novel method for creating a dual damascene structure allows for a smaller number of processing steps, thus reducing the processing time needed to complete the dual damascene structure. In addition, a lower number of masks may be needed. The exemplary mask or reticle used within the process incorporates different regions possessing different transmission rates. During the exposing step, light from an exposing source passes through the mask to expose a portion of the photoresist layer on top of the wafer.
    Type: Application
    Filed: October 6, 2006
    Publication date: January 24, 2008
    Applicant: Semiconductor Manufacturing International (Shanghai) Corporation
    Inventors: Fan Tseng, Chi Wu, Wei Chien