Patents by Inventor Wei-Chih Ma

Wei-Chih Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050208435
    Abstract: First, a substrate is provided and a photoresist layer is coated thereon. Then, a film having a pattern is used as a mask to perform an exposing and developing process for patterning the photoresist layer. Following that, LIGA technology is employed to form a thin film having a pattern corresponding to the pattern of the film.
    Type: Application
    Filed: March 19, 2004
    Publication date: September 22, 2005
    Inventors: Irene Chen, Jyh-Huei Lay, Tien-Yu Chou, Yih-Far Chen, Yuan-Hung Wang, Jo-Wen Wu, Kuo-Hsiung Yen, Chin-Chen Yang, Chuan-Lun Hsu, Wei-Chih Ma, Hung-Lung Chuang