Patents by Inventor Wei-Ching Wu

Wei-Ching Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12020905
    Abstract: A method of making a semiconductor device includes comparing a thickness profile of a surface of a wafer with a reference value using a control unit. The method further includes transmitting a control signal to an adjustable nozzle based on the comparison of the thickness profile and the reference value. The method further includes rotating the adjustable nozzle about a longitudinal axis of the adjustable nozzle in response to the control signal.
    Type: Grant
    Filed: May 9, 2022
    Date of Patent: June 25, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Wei-Ching Wu, Ding-I Liu, Wen-Long Lee
  • Publication number: 20220270855
    Abstract: A method of making a semiconductor device includes comparing a thickness profile of a surface of a wafer with a reference value using a control unit. The method further includes transmitting a control signal to an adjustable nozzle based on the comparison of the thickness profile and the reference value. The method further includes rotating the adjustable nozzle about a longitudinal axis of the adjustable nozzle in response to the control signal.
    Type: Application
    Filed: May 9, 2022
    Publication date: August 25, 2022
    Inventors: Wei-Ching WU, Ding-I LIU, Wen-Long LEE
  • Patent number: 11342164
    Abstract: A high density plasma chemical vapor deposition (HDP CVD) chamber includes a nozzle including a base having a hollow center portion for conducting gas; a tip coupled to the base and having an opening formed therein for conducting gas from the base to the exterior of the nozzle. The HDP CVD chamber further includes a baffle positioned in a top portion of the HDP CVD chamber, wherein the baffle is equipped with an adjustable baffle nozzle.
    Type: Grant
    Filed: January 5, 2021
    Date of Patent: May 24, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Wei-Ching Wu, Ding-I Liu, Wen-Long Lee
  • Publication number: 20210125811
    Abstract: A high density plasma chemical vapor deposition (HDP CVD) chamber includes a nozzle including a base having a hollow center portion for conducting gas; a tip coupled to the base and having an opening formed therein for conducting gas from the base to the exterior of the nozzle. The HDP CVD chamber further includes a baffle positioned in a top portion of the HDP CVD chamber, wherein the baffle is equipped with an adjustable baffle nozzle.
    Type: Application
    Filed: January 5, 2021
    Publication date: April 29, 2021
    Inventors: Wei-Ching WU, Ding-I LIU, Wen-Long LEE
  • Patent number: 10910199
    Abstract: A method of controlling a position of an adjustable nozzle includes depositing a film on a surface of a wafer. The method includes measuring a thickness profile of the surface of the wafer. The method includes comparing the measurement of the thickness profile with a reference value using a control unit. The method includes transmitting a control signal to the adjustable nozzle to alter the position of the adjustable nozzle based on the result of the comparison. The adjustable nozzle includes a base having a hollow center portion for conducting gas, the base configured for connection to a gas source. The adjust nozzle includes a tip coupled to the base and having an opening for conducting gas from the base to the exterior of the nozzle, wherein the base is configured for pivoting about a longitudinal axis of the base in response to the control signal.
    Type: Grant
    Filed: April 9, 2018
    Date of Patent: February 2, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Wei-Ching Wu, Wen-Long Lee, Ding-I Liu
  • Patent number: 10386565
    Abstract: A backlight module includes a plurality of surface light source assembly. Each surface light source assembly includes a light source with a plurality of light emitting surfaces having a light emission angle range each; a light guide plate with a bottom surface having a groove for receiving the light source, a light exit surface opposite to the bottom surface, and at least one side surface between the bottom surface and the light exit surface; and a plurality of groove structures configured to reflect a portion of a light emitted from the light emitting surfaces to outside their light emission angle range.
    Type: Grant
    Filed: January 26, 2018
    Date of Patent: August 20, 2019
    Assignee: Coretronic Corporation
    Inventors: Hua Chen, Chun-Hsiang Hsu, Wei-Ching Wu, Fan-Chun Lin, Chung-Hung Fang
  • Publication number: 20180314110
    Abstract: A surface light source assembly includes at least one light emitting element and a light guide plate. Each light emitting element has an annular light emitting side surface. The light guide plate has a bottom surface and a light emission surface opposite to each other. The bottom surface has at least one accommodation groove to accommodate the at least one light emitting element. The accommodation groove has a light incident surface. The light incident surface surrounds the annular light emitting side surface of the light emitting element located in the accommodation groove. The light emission surface of the light guide plate is a convex surface. A backlight module having a plurality of above light source assemblies is also provided. The surface light source assembly and the backlight module of the invention can enhance the luminance uniformity and suppress the light leakage at the edge of the light guide plate.
    Type: Application
    Filed: April 18, 2018
    Publication date: November 1, 2018
    Inventors: Hua Chen, Ching-Hung Chen, Chung-Hung Fang, Wei-Ching Wu
  • Publication number: 20180239076
    Abstract: A surface light source assembly includes a light source and a light guide plate. The light source has a plurality of light emitting surfaces. Each of the light emitting surfaces has a light emission angle range. The light guide plate has a bottom surface, a light exit surface opposite to the bottom surface, and at least one side surface connected between the bottom surface and the light exit surface. The bottom surface has an accommodation groove for accommodating the light source. The light emitting surfaces face the at least one side surface. The light guide plate further has a plurality of groove structures located within the light emission angle range of the light emitting surfaces to reflect a portion of a light emitted from the light emitting surfaces to outside the light emission angle range. A backlight module including a plurality of aforementioned surface light source assemblies is also provided.
    Type: Application
    Filed: January 26, 2018
    Publication date: August 23, 2018
    Inventors: Hua Chen, Chun-Hsiang Hsu, Wei-Ching Wu, Fan-Chun Lin, Chung-Hung Fang
  • Publication number: 20180226224
    Abstract: A method of controlling a position of an adjustable nozzle includes depositing a film on a surface of a wafer. The method includes measuring a thickness profile of the surface of the wafer. The method includes comparing the measurement of the thickness profile with a reference value using a control unit. The method includes transmitting a control signal to the adjustable nozzle to alter the position of the adjustable nozzle based on the result of the comparison. The adjustable nozzle includes a base having a hollow center portion for conducting gas, the base configured for connection to a gas source. The adjust nozzle includes a tip coupled to the base and having an opening for conducting gas from the base to the exterior of the nozzle, wherein the base is configured for pivoting about a longitudinal axis of the base in response to the control signal.
    Type: Application
    Filed: April 9, 2018
    Publication date: August 9, 2018
    Inventors: Wei-Ching WU, Wen-Long LEE, Ding-I LIU
  • Patent number: 10043892
    Abstract: A method for manufacturing a semiconductor device is provided, including forming a fin field effect transistor (FinFET) structure on a semiconductor substrate. The FinFET structure includes at least one fin, and a gate electrode structure and source/drain regions on the at least one fin. A dielectric film is formed over the at least on fin. The dielectric film is irradiated with ultra violet (UV) radiation from a single UV source.
    Type: Grant
    Filed: June 13, 2016
    Date of Patent: August 7, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chia-Ying Li, Ming-Shiou Kuo, Wei-Ching Wu, Zong-Han Li, Ching-Lun Lai
  • Patent number: 9941100
    Abstract: The description relates to an adjustable nozzle capable of pivoting about an axis of the nozzle and translating along the axis of the nozzle. A high density plasma chemical vapor deposition (HDP CVD) chamber houses a plurality of adjustable nozzles. A feedback control system includes a control unit coupled to the adjustable nozzle and the HDP CVD chamber to form a more uniform thickness profile of films deposited on a wafer in the HDP CVD chamber.
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: April 10, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Wei-Ching Wu, Wen-Long Lee, Ding-I Liu
  • Publication number: 20170358663
    Abstract: A method for manufacturing a semiconductor device is provided, including forming a fin field effect transistor (FinFET) structure on a semiconductor substrate. The FinFET structure includes at least one fin, and a gate electrode structure and source/drain regions on the at least one fin. A dielectric film is formed over the at least on fin. The dielectric film is irradiated with ultra violet (UV) radiation from a single UV source.
    Type: Application
    Filed: June 13, 2016
    Publication date: December 14, 2017
    Inventors: Chia-Ying LI, Ming-Shiou KUO, Wei-Ching WU, Zong-Han LI, Ching-Lun LAI
  • Patent number: 9557470
    Abstract: A light source module including a light guide plate, at least one light emitting device, a light-controlling pattern element, and an absorbing pattern element is provided. The light guide plate has a light emitting surface, a first surface opposite the light emitting surface, and at least one opening. The opening passes through the first surface and extends from the first surface toward the light emitting surface. The at least one light emitting device is disposed in the opening and arranged along an arranging direction. The light-controlling pattern element is disposed on the light emitting surface and covers the opening and the light emitting device. The opening faces towards the absorbing pattern element. The absorbing pattern element is disposed besides one of the at least one light emitting device and extends toward a side wall of the opening. Moreover, another two light source modules are also provided.
    Type: Grant
    Filed: March 21, 2013
    Date of Patent: January 31, 2017
    Assignee: Young Lighting Technology Inc.
    Inventors: Hsin-Hung Lee, Chiao-Chih Yang, Wei-Ching Wu, Hung-Sen Lin
  • Patent number: 8915637
    Abstract: A light source module including a light guide plate, a plurality of light emitting devices, and a plurality of first reflective devices is provided. The light guide plate has a plurality of through holes and a light emitting surface. The through holes pass through the light emitting surface. Each of the through holes has a first side wall and a second side wall opposite the first side wall. At least one of the light emitting devices is disposed in each of the through holes. Each of the light emitting devices is capable emitting a light beam. The light beam enters the light guide plate from the first side wall of the through hole which the light emitting device is disposed in and leaves the light guide plate from the light emitting surface. The first reflective devices are disposed on the second side walls of the through holes.
    Type: Grant
    Filed: March 20, 2013
    Date of Patent: December 23, 2014
    Assignee: Young Lighting Technology Inc.
    Inventors: Chiao-Chih Yang, Chao-Chun Cheng, Hsin-Hung Lee, Wei-Ching Wu, Yen-Hao Chen
  • Publication number: 20130286685
    Abstract: A light source module including a light guide plate, a plurality of light emitting devices, and a plurality of first reflective devices is provided. The light guide plate has a plurality of through holes and a light emitting surface. The through holes pass through the light emitting surface. Each of the through holes has a first side wall and a second side wall opposite the first side wall. At least one of the light emitting devices is disposed in each of the through holes. Each of the light emitting devices is capable emitting a light beam. The light beam enters the light guide plate from the first side wall of the through hole which the light emitting device is disposed in and leaves the light guide plate from the light emitting surface. The first reflective devices are disposed on the second side walls of the through holes.
    Type: Application
    Filed: March 20, 2013
    Publication date: October 31, 2013
    Applicant: YOUNG LIGHTING TECHNOLOGY INC.
    Inventors: Chiao-Chih Yang, Chao-Chun Cheng, Hsin-Hung Lee, Wei-Ching Wu, Yen-Hao Chen
  • Publication number: 20130250611
    Abstract: A light source module including a light guide plate, at least one light emitting device, a light-controlling pattern element, and an absorbing pattern element is provided. The light guide plate has a light emitting surface, a first surface opposite the light emitting surface, and at least one opening. The opening passes through the first surface and extends from the first surface toward the light emitting surface. The at least one light emitting device is disposed in the opening and arranged along an arranging direction. The light-controlling pattern element is disposed on the light emitting surface and covers the opening and the light emitting device. The opening faces towards the absorbing pattern element. The absorbing pattern element is disposed besides one of the at least one light emitting device and extends toward a side wall of the opening. Moreover, another two light source modules are also provided.
    Type: Application
    Filed: March 21, 2013
    Publication date: September 26, 2013
    Applicant: Young Lighting Technology Inc.
    Inventors: Hsin-Hung Lee, Chiao-Chih Yang, Wei-Ching Wu, Hung-Sen Lin
  • Publication number: 20130156940
    Abstract: The description relates to an adjustable nozzle capable of pivoting about an axis of the nozzle and translating along the axis of the nozzle. A high density plasma chemical vapor deposition (HDP CVD) chamber houses a plurality of adjustable nozzles. A feedback control system includes a control unit coupled to the adjustable nozzle and the HDP CVD chamber to form a more uniform thickness profile of films deposited on a wafer in the HDP CVD chamber.
    Type: Application
    Filed: December 16, 2011
    Publication date: June 20, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Wei-Ching WU, Wen-Long LEE, Ding-I LIU
  • Publication number: 20090174851
    Abstract: An optically self-compensated birefringence liquid crystal display (OCB-LCD) panel including a first substrate, a first splay aligned layer, a second substrate and an OCB liquid crystal layer is provided. A first alignment layer is disposed on a surface of the first substrate. The first splay aligned layer is disposed on a surface of the first alignment layer, and the material of the first splay aligned layer includes a polymer polymerized by a first reactive mesogen (RM) monomer. The second substrate is disposed opposite to the first substrate, and a second alignment layer is disposed on a surface of the second substrate. The OCB liquid crystal layer is interposed between the first substrate and the second substrate.
    Type: Application
    Filed: July 4, 2008
    Publication date: July 9, 2009
    Applicant: CHUNGHWA PICTURE TUBES, LTD.
    Inventors: Szu-Fen Chen, Huang-Ming Chen, Wei-Ching Wu, Han-Ping D. Shieh
  • Patent number: 6884525
    Abstract: This invention features a compound having the formula: X is O or NR1; and each of Y and Z, independently, is in which each of R1, R2, R3, and R4, independently, is alkyl, cyclyl, heterocyclyl, aralkyl, aryl, or heteroaryl; Ar1 is aralkyl, aryl, or heteroaryl; and Ar2 is cyclyl, heterocyclyl, aralkyl, aryl, or heteroaryl; or Ar1 and Ar2 taken together is heterocyclyl, aralkyl, or heteroaryl. This compound can be used as a red light emitting material in an electro-luminescence device.
    Type: Grant
    Filed: July 9, 2002
    Date of Patent: April 26, 2005
    Assignee: Academia Sinica
    Inventors: Chin-Ti Chen, Hsiu-Chih Yeh, Wei-Ching Wu, Li-Hsin Chan
  • Publication number: 20040013902
    Abstract: This invention features a compound having the formula: 1
    Type: Application
    Filed: July 9, 2002
    Publication date: January 22, 2004
    Inventors: Chin-Ti Chen, Hsiu-Chih Yeh, Wei-Ching Wu, Li-Hsin Chan