Patents by Inventor Wei-Chung Ma

Wei-Chung Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Single photoresist approach for high challenge photo process
    Patent number: 8778602
    Abstract: A method of lithography patterning includes coating a resist layer on a substrate; performing an exposing process to the resist layer using a lithography tool with a numerical aperture tuned between about 0.5 and about 0.6; baking the resist layer; thereafter performing a first developing process to the resist layer for a first period of time; and performing a second developing process to the resist layer for a second period of time.
    Type: Grant
    Filed: September 18, 2009
    Date of Patent: July 15, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hung-Ting Pan, Jing-Huan Chen, Wei-Chung Ma, Hsin-Chun Chiang, Po-Chung Cheng, Szu-An Wu
  • SINGLE PHOTORESIST APPROACH FOR HIGH CHALLENGE PHOTO PROCESS
    Publication number: 20110070546
    Abstract: A method of lithography patterning includes coating a resist layer on a substrate; performing an exposing process to the resist layer using a lithography tool with a numerical aperture tuned between about 0.5 and about 0.6; baking the resist layer; thereafter performing a first developing process to the resist layer for a first period of time; and performing a second developing process to the resist layer for a second period of time.
    Type: Application
    Filed: September 18, 2009
    Publication date: March 24, 2011
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hung-Ting Pan, Jing-Huan Chen, Wei-Chung Ma, Hsin-Chun Chiang, Po-Chung Cheng, Szu-An Wu