Publication number: 20240249941
Abstract: Method of manufacturing semiconductor device, includes forming protective layer over substrate having plurality of protrusions and recesses. The protective layer includes polymer composition including polymer having repeating units of one or more of: Wherein a, b, c, d, e, f, g, h, and i are each independently H, —OH, —ROH, —R(OH)2, —NH2, —NHR, —NR2, —SH, —RSH, or —R(SH)2, wherein at least one of a, b, c, d, e, f, g, h, and i on each repeating unit is not H. R, R1, and R2 are each independently a C1-C10 alkyl group, a C3-C10 cycloalkyl group, a C1-C10 hydroxyalkyl group, a C2-C10 alkoxy group, a C2-C10 alkoxy alkyl group, a C2-C10 acetyl group, a C3-C10 acetylalkyl group, a C1-C10 carboxyl group, a C2-C10 alkyl carboxyl group, or a C4-C10 cycloalkyl carboxyl group, and n is 2-1000. A resist layer is formed over protective layer, and resist layer is patterned.
Type:
Application
Filed:
March 6, 2024
Publication date:
July 25, 2024
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventors:
Jing Hong HUANG, Wei-Han LAI, Ching-Yu CHANG
Publication number: 20240245694
Abstract: The present invention provides a compound, or a pharmaceutically acceptable salt thereof, of formula (I): wherein R1, R2, R3, x, R4, R5, y, R, M, W, L, V, T, Y, J, K and A are as described herein, therapeutic uses of said compounds, uses of said compounds as research chemicals, a pharmaceutical composition and combinations comprising said compounds, and methods for manufacturing the compounds of the invention.
Type:
Application
Filed:
October 10, 2023
Publication date:
July 25, 2024
Inventors:
Vincent BORDAS, Markus FUREGATI, Jacques HAMON, Jürgen Hans-Hermann HINRICHS, Ziyue HONG, Fabio LIMA, Fatma LIMAM, Henrik MOEBITZ, Sandro NOCITO, Niko SCHMIEDEBERG, Joseph SCHOEPFER, Ross Sinclair STRANG, Frédéric ZECRI, Huangchao YU, Yong ZHANG, Xinkan YANG, Sisi ZHANG, Wei LI